Abstract: There is a process for producing a semiconductor wafer having a front surface and a back surface and a polished edge, in which the semiconductor wafer is subjected to polishing on both sides.
Type:
Application
Filed:
January 30, 2001
Publication date:
August 16, 2001
Applicant:
WACKER SILTRONIC GESELLSCHAFT FOR HALBLEITERMATERIALIEN AG
Inventors:
Guido Wenski, Thomas Altmann, Gerhard Heier, Wolfgang Winkler