Patents Assigned to WF Systems, LLC
  • Patent number: 8128228
    Abstract: Axial distances between ocular structures can be measured by focusing an optical unit on focus planes corresponding to the ocular structures and using the distance between focus planes to determine the distance between the ocular structures. The method is particularly useful during eye surgery, e.g., cataract surgery, where the distance between ocular structures, particularly an aphakic pupil, can be used to more accurately predict the effective lens position for an intraocular lens.
    Type: Grant
    Filed: December 17, 2008
    Date of Patent: March 6, 2012
    Assignee: WF Systems LLC
    Inventor: Anthony Y. Van Heugten
  • Publication number: 20110001960
    Abstract: The present invention relates to a wavefront sensor using a pair of screens, each having a two-dimensional array of circular apertures, to achieve Moiré effects, and its use to measure the slope of a wavefront.
    Type: Application
    Filed: October 29, 2008
    Publication date: January 6, 2011
    Applicant: WF Systems, LLC
    Inventor: Anthony Y. Van Heugten
  • Patent number: 7594729
    Abstract: The present invention relates to a wavefront sensor using a pair of screens, each having a two-dimensional array of circular apertures, to achieve Moiré effects, and its use to measure the slope of a wavefront.
    Type: Grant
    Filed: November 26, 2007
    Date of Patent: September 29, 2009
    Assignee: WF Systems, LLC
    Inventor: Anthony Y. Van Heugten
  • Publication number: 20090164007
    Abstract: Devices and methods for measuring axial distances, particularly during eye surgery, are provided.
    Type: Application
    Filed: December 17, 2008
    Publication date: June 25, 2009
    Applicant: WF Systems LLC
    Inventor: Anthony Y. Van Heugten
  • Publication number: 20090109401
    Abstract: The present invention relates to a wavefront sensor using a pair of screens, each having a two-dimensional array of circular apertures, to achieve Moiré effects, and its use to measure the slope of a wavefront.
    Type: Application
    Filed: November 26, 2007
    Publication date: April 30, 2009
    Applicant: WF Systems, LLC
    Inventor: Anthony Y. Van Heugten