Abstract: A device such as a transparent solar cell or optical filter and method of its manufacture. The method includes steps of forming a first conductive layer overlying a substrate. The method also includes forming a first amorphous silicon layer overlying the first conductive layer. A step of annealing the first amorphous silicon layer is included. The annealing step may be performed using a laser. It may also be performed by maintaining the substrate at a temperature of less than 450 degrees Celsius. A second conductive layer may be formed overlying the second amorphous silicon layer.

Abstract: A device such as a transparent solar cell or optical filter and method of its manufacture. The method includes steps of forming a first conductive layer overlying a substrate. The method also includes forming a first amorphous silicon layer overlying the first conductive layer. A step of annealing the first amorphous silicon layer is included. The annealing step may be performed using a laser. It may also be performed by maintaining the substrate at a temperature of less than 450 degrees Celsius. A second conductive layer may be formed overlying the second amorphous silicon layer.

Abstract: A transparent solar cell and method of manufacture. The method includes steps of providing a transparent substrate. The method also includes forming a first conductive layer overlying the substrate. The method also includes forming a first amorphous silicon layer of a first dopant type overlying the first conductive layer. A step of annealing the first amorphous silicon layer is included. The method also forms a second amorphous silicon layer of a second dopant type, and also anneals the second amorphous silicon layer. A second conductive layer is formed overlying the second amorphous silicon layer. A combination of these steps forms a transparent solar cell structure.

Abstract: A transparent solar cell and method of manufacture. The method includes steps of providing a transparent substrate. The method also includes forming a first conductive layer overlying the substrate. The method also includes forming a first amorphous silicon layer of a first dopant type overlying the first conductive layer. A step of annealing the first amorphous silicon layer is included. The method also forms a second amorphous silicon layer of a second dopant type, and also anneals the second amorphous silicon layer. A second conductive layer is formed overlying the second amorphous silicon layer. A combination of these steps forms a transparent solar cell structure.