Patents Assigned to ZHEJIANG KONITA NEW MATERIALS CO., LTD.
  • Publication number: 20220121119
    Abstract: Disclosed is a infrared radiation sensitive positive-working imageable element. The imageable element comprises: (a) a substrate, (b) an inner coating covering the substrate, and (c) an outer coating covering the inner coating. The inner coating comprises a repeating unit derived from a maleimide monomer and a (meth)acrylamide monomer, and a polymer hinder P that is soluble in an alkaline developing solution; and the outer coating comprises an infrared radiation absorbing compound and a polymer binder Q which is different from that in the inner coating. The imageable element is designed such that same is not only sensitive to radiation with a maximum wavelength of 700-1200 nm, but also has a good resistance to chemical solvents when used as a lithographic printing plate precursor, and same is not easily corroded and dissolved by printing chemicals during use, thus facilitating the prolonging of the service life of a lithographic printing plate.
    Type: Application
    Filed: January 22, 2021
    Publication date: April 21, 2022
    Applicant: ZHEJIANG KONITA NEW MATERIALS CO., LTD.
    Inventors: Yinqiao WENG, Ting TAO, Miao GAO, Nengping XU, Zuoting YING, Xianyao MA, Leze JIAO
  • Patent number: 11220098
    Abstract: The invention relates to an imageable coating layer, thermal negative-working lithography printing plate, and platemaking method. The coating layer includes constituents in parts by weight: a radically polymerizable compound 20-60 parts, a radiation-absorbing compound 0.5-12 parts, a free radical initiator 1-25 parts, a binding agent 10-70 parts, and a development accelerator 0.5-15 parts. The platemaking method includes the steps: S1, preparing a printing plate precursor that includes a substrate having a hydrophilic surface or is provided with a hydrophilic layer and imageable coating layer covering the substrate; S2, patternedly exposing the printing plate precursor, forming an exposed area and an unexposed area; and S3, removing the unexposed area via a development process.
    Type: Grant
    Filed: August 17, 2017
    Date of Patent: January 11, 2022
    Assignee: ZHEJIANG KONITA NEW MATERIALS CO., LTD.
    Inventors: Ting Tao, Nganhau Yung, Zuoting Ying, Ying Huang, Miao Gao, Nengping Xu, Chongshuang Liu