Abstract: A structure includes a tensilely strained NFET region including a strained silicon layer of a silicon on insulator wafer. A relaxed NFET region includes one of an ion implanted silicon and an ion implanted silicon dioxide interface layer of a tensilely strained silicon layer of the silicon on insulator wafer. A compressively strained PFET region includes a SiGe layer which was converted from a tensilely strained silicon layer of the silicon on insulator wafer. A relaxed PFET region includes one of an ion implanted silicon and an ion implanted silicon dioxide interface layer of a tensilely strained silicon layer of the silicon on insulator wafer.

Abstract: In accordance with some embodiments of the present disclosure a method for constructing a clock network comprises receiving design specifications for a clock network. The method further comprises determining a topology of the clock network based on the design specifications. The topology indicates at least one of a plurality of levels of the clock network, a buffer type for each level and a buffer fanout for each level. The method additionally comprises determining design parameters for the clock network based on the determined topology and generating a clock network synthesis tool specification file that includes the design parameters. The method also comprises synthesizing the clock network using the specification file such that the clock network includes the determined topology and such that the clock network synchronously distributes a clock signal from a clock generator to endpoints of the clock network.

Abstract: A process for manufacturing integrated circuit devices includes providing a set of original color rules defining an original color rule space and defining a design space. The improvement involves applying a perturbed color rule space to the router processing engine to expose double pattern routing odd cycle decomposition errors, and reconfiguring the router processing engine in accordance with the exposed decomposition errors.

Abstract: Embodiments of the present invention are a system, a computer program product, and a method for implementing an integrated circuit design. The method for implementing an integrated circuit design includes accessing an original electronic representation of an integrated circuit layout from a first user file, and accessing a defined sensitivity index that characterizes an impact of the dummy pattern on the functional component. The impact of the dummy pattern on the functional component is analyzed and it is determined whether the impact is within a limit of the sensitivity index. One of a plurality of features of the dummy pattern is adjusted if the impact is not within the limit to form a generated electronic representation of a modified integrated circuit layout, and the generated electronic representation is output to a second user file. The integrated circuit layout includes a dummy pattern and a functional component.

Abstract: The present invention relates to lithographic apparatuses and processes, and more particularly to multiple patterning lithography for printing target patterns beyond the limits of resolution of the lithographic apparatus. A method of splitting a pattern to be imaged onto a substrate via a lithographic process into a plurality of sub-patterns is disclosed, wherein the method comprises a splitting step being configured to be aware of requirements of a co-optimization between at least one of the sub-patterns and an optical setting of the lithography apparatus used for the lithographic process. Device characteristic optimization techniques, including intelligent pattern selection based on diffraction signature analysis, may be integrated into the multiple patterning process flow.

Abstract: A method includes performing a place and route operation using an electronic design automation tool to generate a preliminary layout for a photomask to be used to form a circuit pattern of a semiconductor device. The place and route operation is constrained by a plurality of single patterning spacer technique (SPST) routing rules. Dummy conductive fill patterns are emulated within the EDA tool using an RC extraction tool to predict locations and sizes of dummy conductive fill patterns to be added to the preliminary layout of the photomask. An RC timing analysis of the circuit pattern is performed within the EDA tool, based on the preliminary layout and the emulated dummy conductive fill patterns.

Abstract: Disclosed is a method, system, and computer program product for automated implementation of pipeline flip-flops in an electronic design. Two operating modes can be used either together or separately to implement pipeline flip-flops. An analysis mode is employed to perform a determination of the number of stages of pipeline flip-flops needed for particular portions of an electronic design. A placement stage is used to place the pipeline flip-flops in the layout.

Abstract: A simulation system enables comparison of a realized physical implementation against the simulation models that produce them, thereby detecting differences between an initial, logical design and the resulting physical embodiment. Errors introduced by an initial design, faulty Intellectual Property blocks, faulty programmable logic device silicon, faulty synthesis algorithms and software, and/or faulty place and route algorithms and software may be detected. As a result, the simulation system reflects both the accuracy of the actual implemented device with the capacity and performance of a purpose built hardware-assisted solution.

Abstract: Some embodiments provide a method for automatically generating several design solutions that remedy a design rule violation committed by a set of shapes in an IC design layout. The method receives a marker that indicates the design rule violation and contains information about the violation. The marker in some embodiments can be rendered as a geometric shape in the IC design layout. Based on the marker, the method generates several solutions each of which will cause the set of shapes to meet the design rule when the solution is applied to the set. Each solution requires moving at least one edge of a shape in the set of shapes.

Abstract: A battery management system (BMS) is disclosed. In one embodiment, the BMS includes i) a first switching circuit electrically connected to a battery cell or a battery pack and configured to provide a voltage of the battery cell or the battery pack, ii) a capacitor electrically connected to the first switching circuit and configured to store the voltage provided from the first switching circuit and iii) a second switching circuit electrically connected to the capacitor and configured to provide the voltage stored in the capacitor, wherein the second switching circuit has first and second output terminals. The BMS may further include a pull-down circuit electrically connected to the second switching circuit, and configured to reduce impedance at the first output terminal of the second switching circuit.

Abstract: Configuring the operational behavior of an integrated circuit. The integrated circuit (IC) comprises a plurality of configuration inputs for configuring the IC. The IC also has a memory which stores a plurality of sets of parameter values. Each parameter value of the respective set corresponds to a different operational parameter of a plurality of operational parameters. The IC includes logic which determines a first plurality of configuration values corresponding to the first plurality of configuration inputs. The logic then selects a set of parameter values from the stored plurality of sets of parameter values. The selection of parameter values is based on the first plurality of configuration values. The IC is then configured for operation according to one or more operational parameter values in the selected set of parameter values.

Abstract: A method for designing a system on a target device is disclosed. A partition in the system with a plurality of instances from an extraction netlist is identified. Synthesis optimizations are performed on the partition to generate a synthesis optimization solution. The synthesis optimization solution is applied to the plurality of instances in the system.

Abstract: In one aspect, a method for providing a circuit design includes defining an interconnect network comprising a plurality of wire connections, the defining performed after modification of the interconnect network and before completion of the interconnect network. An adjustment technique is applied to the wire connections of the defined interconnect network before completion of the interconnect network.

Abstract: The present disclosure relates to a computer-implemented method for routing in an electronic circuit design. The method may include assigning a plurality of rats interconnecting one or more terminals associated with a layout of the electronic circuit design to a bundle. The method may further include sequencing the plurality of rats within the assigned bundle to generate a defined sequence of rats within the assigned bundle. The method may also include routing the plurality of rats between the one or more terminals, based upon, at least in part, the defined sequence.

Abstract: A circuit for implementing a control voltage mirror is provided. A filter includes a filter capacitor connected to a control voltage and a distal side of the capacitor connected to a voltage reference. The control voltage mirror includes an operational amplifier having a positive input connected to the control voltage, and a negative input is connected to an output and coupled to the distal side of the capacitor. Voltage across the capacitor is held to be near or at zero volts, substantially eliminating capacitor leakage current.

Abstract: An adaptive patterning method and system for fabricating panel based package structures is described. A plurality of semiconductor die comprising a copper column disposed over the active surface of each semiconductor die is provided. An embedded die panel is formed by disposing an encapsulant around each of the plurality of semiconductor die. A true position and rotation of each semiconductor die within the embedded die panel is measured. A unit-specific pattern is formed to align with the true position of each semiconductor die in the embedded die panel. The unit-specific pattern as a fan-out structure disposed over the semiconductor die, over the encapsulant, and coupled to the copper columns. A fan-in redistribution layer (RDL) can extend over the active surface of each semiconductor die such that the copper columns formed over the fan-in RDLs. The unit-specific pattern can be directly coupled to the copper columns.

Abstract: Some embodiments of the present invention create a layout for a circuit design which includes one or more circuit modules. The system can receive a nominal implementation of a circuit module, and a user-defined module generator capable of generating one or more custom implementations of the circuit module from an existing implementation of the circuit module. Next, the system can create the layout for the circuit design by executing the user-defined module generator on at least one processor to generate one or more custom implementations of the circuit module from the nominal implementation. The system can then use the one or more custom implementations of the circuit module in the layout.

Abstract: A layout pattern generating apparatus and a layout pattern generating method for an element used for layout design of a semiconductor integrated circuit (LSI) provide a reduction in time for generating a layout pattern with high versatility. The layout pattern generating apparatus for generating a layout pattern of each of elements included in a semiconductor integrated circuit, includes, for example, a storage, a basic figure generator, an additional figure generator, a display unit and an operation input unit. The apparatus and method also utilize at least terminal figure relative position information, figure adjustment value information, and additional figure relative position information, the additional figure being a figure other than the basic figure. The basic figure generator generates the effective area figure and the terminal figure of the layout pattern generation target element, and the additional figure generator generates the additional figure of the layout pattern generation target element.

Abstract: Various embodiments identify a routing layer of an electronic design, create spacetile(s) by performing spacetile punches for the muting layer, identify an area probe from the spacetiles, and routes the electronic design by using the one or more area probes for performing area search for routing solutions. Some embodiments identify two routing layers of an electronic design, perform spacetile punches to form spacetiles for the routing layers, determine a via spacetile layer, identify spacetiles as one or more area probes based on the via spacetile layer, and routes the electronic design by using the one or more area probes for performing area search for routing solutions while transitioning between the two muting layers. One of the two routing layers may be a tracked muting layer, and the other may be a trackless routing layer. The tracked muting may be gridded or gridless.

Abstract: Some embodiments of the present invention provide techniques and systems for performing aggressive and dynamic scenario reduction during different phases of optimization. Specifically, essential scenarios at gates and timing end-points can be identified and then used during the dynamic scenario reduction process. In some embodiments, margin values associated with various constraints can be used to determine the set of essential scenarios to account for constrained objects that are near critical in addition to the constrained objects that are the worst violators. In some embodiments, at any point during the optimization process, only the set of essential scenarios are kept active, thereby substantially reducing runtime and memory requirements without compromising on the quality of results.