Patents Examined by Alua Powell
  • Pattern film repair using a focused particle beam system
    Patent number: 6042738
    Abstract: The present invention generally provides methods for employing a focused particle beam system in the removal of an excess portion from a workpiece having an opaque film patterned on a substrate and more particularly provides methods of gas-assisted etching using an etching gas including bromine.
    Type: Grant
    Filed: April 16, 1997
    Date of Patent: March 28, 2000
    Assignee: Micrion Corporation
    Inventors: J. David Casey, Jr., Andrew Doyle