Abstract: A compressed air introduction part (5) capable of introducing compressed air into an air passage (2a) of a cylinder body (2) is provided. The compressed air introduction part (5) has a compressed air exit port (5a) formed in the shape of a ring that extends circumferentially about a cylinder-center axis (C1) of the cylinder body (2). An annular protuberance surface portion (30) is formed on an inner circumferential surface forming the air passage (2a) on an air blowout port (2c) side of the compressed air exit port (5a), and a protuberance surface (30a) of the annular protuberance surface portion (30) is shaped so as to extend from a peripheral edge portion of the air blowout port (2c) side of the compressed air exit port (5a) along the radial direction of the cylinder body (2) and to then gradually curve and extend toward the air blowout port (2c) side.

Abstract: A method for dry cleaning a susceptor is performed after a substrate is removed from a processing chamber of a substrate processing apparatus. In the method, a cleaning gas for dry cleaning is supplied to a first region including a substrate receiving region in the susceptor. The cleaning gas is regionally supplied to a second region where the cleaning gas is difficult to reach when the cleaning gas is supplied to the first region.

Abstract: A method of cleaning a deposition apparatus is provided. The method includes cleaning, with a cleaning gas formed into a plasma, an interior of a processing vessel on which a silicon nitride film is deposited. The cleaning gas includes a fluorine-containing gas and oxygen gas.

Abstract: A cleaning device for use with an atomizer that applies paint to the surface of a component in a spray booth includes an external and internal surface in which a least a portion of one or more of the surfaces are coated with a conductive coating. This conductive coating comprises one or more fluoropolymers and may be static dissipative. The cleaning device further includes an exit port that has an aperture between about 2.54-7.62 cm located in the shroud of the device opposite the opening that receives the atomizer and near a bottom corner of the shroud. A kit used to retrofit existing paint spraying systems includes a fully assembled cleaning device and optionally, a regulator assembly capable of reducing the pressure of a cleaning fluid to about 80 psi. During installation, the regulator assembly is mounted external to the spray booth.

Abstract: A tank cleaning system for cleaning a space. The tank cleaning system can include a trailer having a support base transportable by a vehicle, and an arm movably mounted to the support base for movement relative to the support base. The arm can be operable to extend into the space to perform a cleaning operation inside the space.

Abstract: A method, system and composition decontaminate a vessel. In an embodiment, a solvent composition for decontamination includes an amine oxide, polydimethylsiloxane, and water.

Abstract: This invention provides a cleaning method that uses a cleaning gas composition for a semiconductor manufacturing device, including a monofluorohalogen compound represented by XF (in which X is Cl, Br or I) as the main component, and provides a method for removing unwanted film, such as a Si-containing deposit, attached to the interior of the processing room or processing vessel after a processing operation without damaging the interior of the processing room or processing vessel using such monofluorohalogen compound.

Abstract: Embodiments described herein generally relate to a processing chamber incorporating a small thermal mass which enable efficient temperature cycling for supercritical drying processes. The chamber generally includes a body, a liner, and an insulation element which enables the liner to exhibit a small thermal mass relative to the body. The chamber is also configured with suitable apparatus for generating and/or maintaining supercritical fluid within a processing volume of the chamber.

Abstract: A cleaning assembly for reusable filters comprises a housing and a pressurizing spraying assembly that receives a filter element to be cleaned. The pressurizing spraying assembly can be secured in position relative to the housing using a mount. The mount can pivot about a pivot axis between a storage position and a use position. The pivot axis can be aligned with a handle axis about which a handle is attached to the housing. The housing can collect runoff from a cleaning operation.

Abstract: A cleaning method of cleaning a film-forming device, which includes a processing container having a substrate holder provided in the processing container so as to hold a SiC substrate, and which supplies a source gas to the processing container, an interior of which is depressurized, and heats the SiC substrate so as to perform a film formation on the SiC substrate, includes: a reaction product removal process of removing a reaction product, which is formed during the film formation and attached to portions other than the SiC substrate, by supplying a ClF3 gas into the processing container after the film formation; and a residue removal process of removing a substance, which remains after the reaction product removal process and serves as an unnecessary impurity or causes a defect during a subsequent film formation, by supplying air into the processing container.

Abstract: A fastening device for holding a sensor has a cylindrical form limited by a proximal end and a distal end. The fastening device includes a tubular body extending along a median longitudinal axis (I-I) between a first end and a second end, and including a longitudinal through passage for receiving the sensor. At the second end of the tubular body there is a flared portion extending radially inwards and defining an orifice with a cross-section of smaller dimensions than the cross-section of the sensor. The fastening device also includes a device for axially immobilizing the sensor in the longitudinal through passage. The axial immobilization device is shaped so as to keep the distal end of the sensor at a longitudinal distance (E) from the flared portion. The fastening device is a device for bringing a fluid inside the tubular body and into the space between the flared portion and the distal end of the sensor.

Abstract: A composition comprises from 0.1 to 30 wt-% of one or more amino acids, 0.1 to 30 wt-% of one or more surfactants, and optionally one or more hydrotropes. The amino acids may be selected from arginine (“ARG”), lysine (“LYS”), histidine (“HIS”), glycine (“GLY”), or combinations thereof. The composition can be formulated as a cleaning composition, such as a hard surface cleaner, a floor cleaner, or a degreaser. The composition can be used in a method for treating a surface, where the composition is applied to the surface and allowed to remain on the surface for a length of time, and the surface is then wiped.

Abstract: Disclosed herein are systems and methods for treating the surface of a microelectronic substrate, and in particular, relate to an apparatus and method for scanning the microelectronic substrate through a cryogenic fluid mixture used to treat an exposed surface of the microelectronic substrate. The fluid mixture may be expanded through a nozzle to form an aerosol spray or gas cluster jet (GCJ) spray and may impinge the microelectronic substrate and remove particles from the microelectronic substrate's surface. In one embodiment, a two-stage gas nozzle may be used to expand a fluid mixture with a liquid phase concentration of greater than 10% by weight.

Abstract: The invention relates to a method of automatic dishwashing in a dishwasher having a wash tank, comprising: in a first step, delivering a first composition to dishware in the tank in the form of a mist; and afterwards, in a second step, delivering a second composition to the dishware in the tank in the form of a jet; wherein the first and second compositions are different, the first composition comprises a bleach, and the second composition is alkaline and comprises a builder. The invention also provides a dishwasher adapted to carry out the inventive method.

Abstract: A cleaning material, device, and method for predictably cleaning the capillary tube for a wire bonding machine in which the cleaning pad has a predetermined configuration appropriate for the particular wire bonding machine and a substrate having a defined functionalized surface topology and geometry which can be introduced into the wire bonding machine during the normal wire bonding operations. The cleaning material has a predetermined topography with a plurality of functional 3-dimensional (3D) microstructures that provide performance characteristics which are not possible with a non-functionalized and flat surface.

Abstract: The present disclosure relates to a sub-frame cleaning and blow-drying device, comprising a rack, a water tank, a bottom lifting assembly, supporting assemblies, a top lifting assembly, a rotating assembly, an expanding and cleaning-off assembly and a blow-drying device. Expanding assemblies expand to be connected with vehicle body mounting holes, compressed air is blown into the vehicle body mounting holes by air outlets and is blown into a cavity of a sub-frame to clean off aluminum scraps and residual sand in the cavity of the sub-frame, the rotating assembly drives the expanding and cleaning-off assembly and the sub-frame to do rotation movement to perform secondary cleaning, so that the aluminum scraps and the sand remaining inside the cavity can be cleaned off, and the sub-frame cleaning and blow-drying device can be flexibly adjusted by a position adjusting assembly according to different types of sub-frames and is strong in universality.

Abstract: A method is for cleaning an edge ring. The edge ring includes an inner edge ring provided near a substrate mounted on an electrostatic chuck in a processing chamber, a central edge ring that is provided at an outer side of the inner edge ring and vertically movable by a moving mechanism, and an outer edge ring provided at an outer side of the central edge ring. The method includes applying a direct current voltage to the electrostatic chuck, and moving the central edge ring upward or downward.

Abstract: A process of using a chemical gel cleaning formulation to clean a cooling tower fill, comprising the steps of applying a pre-rinse fluid to the fill; applying the chemical gel cleaning formulation to the fill, wherein the chemical gel cleaning formulation includes glycerin, at least one polysaccharide, at least one corrosion inhibitor, at least one surfactant, and at least one acid; applying a descaling fluid to the fill; applying a neutralizer solution to the fill to neutralize the pH of residual fluid on the fill surface; and rinsing the fill with a rinsing fluid to remove residual chemical gel cleaning formulation and descaling fluid, residual neutralizer solution, and dissolved deposits from the fill.

Abstract: The invention relates to a method for cleaning a phosgene conducting apparatus, comprising: washing the apparatus with hot inert gas, followed by washing the apparatus with cold inert gas; conveying gaseous ammonia for breaking down phosgene residues with a continuous increase in temperature until a maximum temperature ranging between 30° C. to 120° C. is reached; once the maximum temperature is reached, shutting down the ammonia supply and the conveying of inert gas, optionally followed by washing the apparatus with an aqueous stream.

Abstract: A cleaning material, device, and method for predictably cleaning the contact elements and support hardware of a tester interface, such as a probe card and a test socket, in which the cleaning pad has a predetermined configuration appropriate for the particular pin contact elements and a substrate having a defined functionalized surface topology and geometry which can be introduced into the testing apparatus during the normal testing operations. The cleaning material has a predetermined topography with a plurality of functional 3-dimensional (3D) microstructures that provide performance characteristics which are not possible with a non-functionalized and flat surface.