Abstract: A process for forming a fine resist pattern which comprises forming an organic thin film by coating a substrate with a resist comprising, as a base polymer, a polymer to which there is chemically bonded a functional group which is converted into amino group or sulfonic acid group responding to a first energy beam; forming a surface exposed patterned layer at the vicinity of the surface of the organic thin film by selectively exposing said surface to said first energy beam; selectively staining said surface exposed patterned layer with a substance which absorbs a second energy beam; exposing the entire surface of said organic thin film to said second energy beam and forming a resist pattern by developing the organic thin film exposed to said second energy beam. According to the process of the present invention, a fine resist pattern of a high resolution can be obtained using an exposure apparatus of a shallow focal depth without largely improving the conventional resist process technology.

Abstract: A novel naphthalocyanine based compound having Si atom as a central metal and groups selected from ##STR1## CN, and --CH.dbd.CH.sub.2 which is bonded to said Si atom via a specific hydrocarbon group, by which solubility in an organic solvent, compatibility with a polymeric substance and durability against an infrared ray are improved. The compound may be incorporated into a polymeric substance layer to form a recording layer of an optical recording medium.

Abstract: An article and method for its perparation is disclosed wherein the article comprises a substrate having at least one planar surface on which is disposed a thermally decomposable metallo-organic compound in active association with a photosensitive dye. The article can be easily processed with, for example, a source of energy such as a laser beam to encode information or produce electroconductive lines.

Abstract: An optical recording medium comprising at least one recording layer on a substrate and a protective layer overlying the recording layer, the protective layer comprising a UV cured resin composition containing a urethane acrylate, N-vinylpyrolidone, a trifunctional or higher functional acrylate, and a photoinitiator.

Abstract: Provided is a novel aromatic ether capped naphthalocyanine compound containing a central hetero atom having a siloxy group substituent off of said hetero atom, with said siloxy substituent having the formula--OSiR.sub.1 R.sub.2 --ZArwhereinR.sub.1 and R.sub.2 can be the same or different, and can be alkyl having from 1 to about 18 carbons; aryl having from 6 to 10 carbons; cycloalkyl having at least 4 carbons or alkoxy having at least 3 carbons,Z is O or S, andAr is an aromatic moiety.Also provided is a process for preparing a naphthalocyanine compound containing a central hetero atom having a siloxy group substituent off of said hetero atom, with said siloxy group containing a terminal ether function, which process comprises reacting in the presence of a nucleophile in a moisture free environment(i) a naphthalocyanine dihydroxy compound,(ii) a compound of the formula SiR.sub.1 R.sub.2 L.sub.2, wherein R.sub.1 and R.sub.

Abstract: An optical recording medium which comprises an organic thin film layer containing at least one of phthalocyanine compounds, due to which high light absorptivity to laser beams and high recording sensitivity can be obtained. The optical recording medium provided by the present invention has high chemical and physical stability. There is also disclosed a process for the production of the optical recording medium.