Abstract: A seal is provided between the door apron and the lip of the container in a dishwasher, enabling a high sealing performance to be obtained during the entire service life of the dishwasher and providing an esthetic design. The seal can be mounted in a reliable manner without any considerable expenditure of force, recycling of a used seal is possible via appropriate selection of materials and the seal can withstand the dynamic strain put upon the door seal of a dishwasher. The dishwasher is provided with a door seal which is made of an elastic synthetic material, consisting of a fixing area for connection to the edge of a rinsing container, a sealing element for arrangement on the underside of a dishwasher and which is arranged between the fixing area, and a sealing element, wherein the fixing area, sealing element and sealing strip form a single part.

Abstract: A centrifugal workpiece processor for processing semiconductor wafers and similar workpieces includes a head which holds and spins the workpiece. The head includes a rotor having a gas system. Gas is sprayed or jetted from inlets in the rotor to create a rotational gas flow. The rotational gas flow causes pressure conditions which hold the edges of a first side of the workpiece against contact pins on the rotor. The rotor and the workpiece rotate together. Guide pins adjacent to a perimeter may help to align the workpiece with the rotor. The rotor may have cylindrical side walls joined to a top plate, and with the gas inlets located in the cylindrical sidewalls. The head is moveable into engagement with a bowl. Spray nozzles in the bowl spray a process liquid onto the second side of the workpiece, as the workpiece is spinning, to process the workpiece.

Abstract: A continuous dyeing device and related processes using indigo and/or other colorants for warp yarn chains and/or for fabrics, equipped with at least a first and a second dyeing compartments containing dyeing baths, the first and second dyeing compartments being enclosed, at least partially, in a hermetically sealed chamber. The device also includes at least one squeezing element interposed between the two dyeing compartments and a plurality of cylinders for heating and/or dehydrating the yarn and or the fabric, thereby increasing the diffusion and the absorption of the colorant. The cylinders are positioned downstream of the first dyeing compartment and squeezing element.

Abstract: An automated heat exchanger tube cleaning assembly and system are provided. The present system can automatically (without ongoing human intervention) survey the tube sheet of a heat exchanger in three-dimensions, convert and record the survey results as a digital file in three-dimensions, and then, according to sequential parameters input via custom software, automatically coordinate via computer one or more cleaning devices to effect the cleaning of each desired tube of the heat exchanger.

Abstract: A system and method for cleaning tapered towers such wind turbine towers. A semicircular member hugs the tower surface. A plurality of nozzles affixed to the semicircular member sprays high pressure cleaning fluid on the tower surface as the semicircular member is raised and lowered. The spray nozzles are kept at a constant distance from the tower surface by a plurality of wheels affixed to the semicircular member. At least one constricting structure is used to force the plurality of wheels to be in constant contact with the tower surface. The constricting structure can be a spring loaded scissor apparatus and/or a bungee cord with rolling beads. A brush can be optionally added to the semicircular member to aid in cleaning.

Abstract: A method for spin-drying textiles being subjected to a method for the production of a hydrophobic effect in a washing machine. Textiles located within the drum are brought into contact with hydrophobing substances dissolved in the washing liquid. The drum is accelerated for a first number of spin pulses to reach a speed in a first spinning block when the washing liquid is removed from the outer tub, the speed being below a critical speed of rotation. The drum is accelerated in a second spinning block for a second number of spin pulses to reach a speed that is above the critical speed of rotation. The drum is accelerated in a third and final spinning block for a third number of spinning pulses to reach a maximum speed of rotation that is compatible with the washing.

Abstract: Disclosed is a washing machine, The washing machine includes a tub to contain washing water; a drum rotatably installed in the tub to contain laundry to be washed; a detergent box to contain a detergent supplied to the inside of the tub; and a steam generating device to heat water to generate steam, supply the generated steam to the drum, and supply the heated water selectively to the detergent box.

Abstract: An object of the present is to uniform particle diameters and speeds of liquid droplets in a two-fluid nozzle for cleaning substrates which mixes gas and liquid internally and injects liquid droplets with gas so as to clean a substrate. The two-fluid nozzle for cleaning substrates has a gas supply passage for supplying gas, a liquid supply passage for supplying liquid, and a lead-out passage for leading out internally-formed liquid droplets, wherein an injection port for injecting liquid droplets to the outside is formed at the front end of the lead-out passage, and wherein a cross-sectional area Sb of the injection port is formed smaller than a cross-sectional area Sa of the lead-out passage, and a cross sectional area Sc of an exit of the gas supply passage is formed smaller than the cross-sectional area Sa of the lead-out passage.

Abstract: A cooling gas is discharged from a cooling gas discharge nozzle toward a local section of a front surface of a substrate on which a liquid film is formed. And then the cooling gas discharge nozzle moves from a rotational center position of the substrate toward an edge position of the substrate along a moving trajectory while the substrate is rotated. As a result, of the surface region of the front surface of the substrate, an area where the liquid film has been frozen (frozen area) expands toward the periphery edge from the center of the front surface of the substrate. It is therefore possible to form a frozen film all over the front surface of the substrate while suppressing deterioration of the durability of the substrate peripheral members since a section receiving supply of the cooling gas is limited to a local area on the front surface of the substrate.

Abstract: A multi-chambered deposition pin wash station is provided. The wash station includes a lower chamber and an upper drain basin connected by a plurality of wash tubes. Cleaning fluid is provided to the lower chamber and passes through the cleaning tubes into the upper drain basin. The cleaning tubes are adapted to clean a single deposition pin with a single tube per wash cycle.

Abstract: A method is provided for removing a residual fluid remaining at a point of contact between a substrate support member and a back surface of a substrate being prepared by a proximity head. According to the method, the proximity head is applied onto the back surface of the substrate and the substrate support member being held by a carrier. The substrate support member is heated after the substrate support member passes the proximity head. The heating of the substrate support member is discontinued once the residual fluid has substantially evaporated.

Abstract: In one embodiment, a washing system including a nozzle assembly having a nozzle and having formed therein a rinse passageway and a waste passageway. Each passageway has first and second ends. The first end of the waste passageway is adapted to be coupled to a waste pump adapted to remove waste fluid via a waste aperture defining the second end of the waste passageway. The first end of the rinse passageway is adapted to be coupled to a rinse pump adapted to provide rinse fluid via a rinse aperture defining the second end of the rinse passageway. The nozzle is coupled to the rinse aperture and is adapted to rotate and direct flow of the rinse fluid outwardly while rotating.

Abstract: The present invention discloses an ultrasonic cleaner in which an automated ultrasonic cleaning operation is executed using an aqueous solution. The cleaner includes a tank having a valve means in fluid communication therewith, a bottom tank portion with at least one drainage aperture therethrough and at least one tank wall depending therefrom to provide a solution retention region. At least one ultrasonic transducer is removably secured to one of the tank bottom and tank wall. A partition in the solution retention region has at least one aperture defined therethrough and defines a service section and a support section thereby.

Abstract: A screening arrangement is provided for a dishwasher having a tub portion defining a sump about a lower end thereof. The dishwasher further includes a heating element disposed proximate to the lower end of the tub portion and defining laterally-opposed inner and outer peripheries. A screen element is arranged adjacent the sump and is configured to screen a dishwashing fluid entering the sump from the tub portion. The screen element extends laterally inward of the inner periphery of the heating element and laterally outward of the outer periphery of the heating element. The screen element is also configured to be heat-resistant so as to protect one of the lower end, the sump, and a lower spray arm from heat emitted by the heating element. An associated apparatus and method are also provided.

Abstract: A washing machine includes a water-storing tub for storing washing water, a heater having a heat-generating unit disposed in the water-storing tub and a terminal unit formed on first and second ends of the heat-generating unit, a heater cover covering the heater, a clamp fastening the heat-generating unit, a thermostat associated with the clamp to detect a temperature of the heater, and a water infiltration protecting cover for protecting the terminal unit.

Abstract: An substrate processing apparatus includes a substrate holding unit, a process liquid supplying unit, a first guide portion provided around the substrate holding unit for guiding the process liquid scattered from the substrate, a second guide portion provided outside the first guide portion for guiding the process liquid scattered from the substrate, a third guide portion provided outside the second guide portion for guiding the process liquid scattered from the substrate, a first recovery channel provided outside the first guide portion integrally with the first guide portion for recovering the process liquid guided by the second guide portion, a second recovery channel provided outside the first recovery channel integrally with the first guide portion for recovering the process liquid guided by the third guide portion, and a driving mechanism for independently moving up and down the first, second, and third guide portions.

Abstract: An outer support body for a drawer-type dishwasher includes first and second U-shaped brackets. The first U-shaped bracket includes first and second leg members that are joined by a first cross member. Likewise, the second U-shaped bracket includes third and fourth leg members that are joined by a second cross member. The outer support body also includes side wall members that are secured to the first and third and second and fourth leg members respectively. A rear brace extends between and interconnects the side wall members at a position spaced from the second cross member. In addition, a drip pan is provided at a bottom portion of the outer support body between the side wall members.

Abstract: A rinsing liquid supplier includes a temperature adjuster. The temperature adjuster cools DIW to a temperature lower than room temperature. This temperature adjuster cools down DIW to a temperature not more than 10 degrees centigrade for instance, and cooling down to an even lower temperature of 5 degrees centigrade or below is more preferable. Meanwhile, the temperature adjuster maintains DIW at not less than 0 degrees centigrade, which prevents freezing of the DIW. The cooled DIW supplied to a rinsing liquid pipe is discharged from the rinsing liquid discharge nozzle toward the top surface of the substrate, to thereby form a liquid film. Further, the cooled DIW is discharged toward the rear surface of the substrate from the liquid discharge nozzle via the liquid supply pipe, to thereby form the liquid film on the rear surface. Since the liquid films are already cooled, they are frozen in a short time when the cooling gas is discharged toward the top surface and the rear surface of the substrate.

Abstract: A substrate holding rotating mechanism is used to hold and rotate a substrate to be processed. The substrate holding rotating mechanism according to the present invention includes at least three spindles, clamp rollers mounted respectively on the spindles for holding a periphery of a substrate, a rotating device for rotating at least one of the clamp rollers, at least one base member on which at least one of the spindles is installed, and a rotational mechanism adapted to allow the base member to be rotatable.

Abstract: A substrate processing apparatus of the present invention is to apply processing using a processing liquid to a substrate. The substrate processing apparatus includes a first-side plate disposed oppositely to a first surface of the substrate with a distance and provided with plural discharge ports and suction ports in a surface opposing the first surface, a first-side processing liquid supply mechanism that supplies a processing liquid to the discharge ports in the first-side plate, and a first-side suction mechanism that sucks insides of the suction ports in the first-side plate.