Abstract: In a lithographic apparatus having a movable object table in vacuum, an interferometer-based alignment system for detecting the position of that object table has a passive part in vacuum and an active part outside the vacuum chamber. The active part contains the beam generator, e.g. a laser, and the electronic detectors whilst the passive part contains the illumination and imaging optics. The two parts are coupled by optical fibers. The interferometer may make use of different diffraction orders from measurement and reference gratings and the order separation may be included in the passive part.

Abstract: A projection optical system according to the present invention whose image side numerical aperture is greater than or equal to 0.75, and which forms an image of a first object upon a second object using light of a predetermined wavelength less than or equal to 300 nm, comprises: a first lens group G1 of positive refractive power; a second lens group G2 of negative refractive power; a third lens group G3 of positive refractive power; and a fourth lens group G4 of positive refractive power, and: the first lens group G1, the second lens group G2, the third lens group G3 and the fourth lens group G4 are arranged in order from a side of the first object; and a distance D in mm along an optical axis between an optical surface of the fourth lens group G4 closest to the second object, and the second object, satisfies a condition of 0.1<D<5.

Abstract: A process for controlling focus parameters in a lithographic process used in manufacture of microelectronic circuits. The process comprises initially providing a lithographic mask having a target mask portion containing a measurable dimension sensitive to defocus, projecting an energy beam through the target mask portion onto a first location of a substrate at a first focus setting, and lithographically forming a first target on the substrate corresponding to the first focus setting, the first target containing a measurable dimension sensitive to defocus. The process then includes projecting an energy beam through the target mask portion onto a second location of the substrate at a second focus setting, lithographically forming a second target on the substrate corresponding to the second focus setting, the second target containing a measurable dimension sensitive to defocus, and measuring the defocus sensitive dimension for each of the first and second targets on the substrate.

Abstract: An integrated apparatus for optically monitoring semiconductor workpieces includes a supporting assembly for supporting the workpiece, and an optical monitoring unit positioned opposite the surface of the workpiece and separated therefrom by an optical window. The optical monitoring unit is mounted for reciprocating movement within a plane parallel to the window for monitoring at least one desired parameter of the semiconductor workpiece and has pattern recognition and auto-focusing utilities. The optical window includes one or more relatively small window fragments located at predetermined locations to enable observation of desired, predetermined portions of the workpiece. The size and shape of the window fragments are selected according to the requirements of transparency in a predetermined spectral range, mechanical strength and ability of pattern recognition and auto-focusing.

Abstract: A reaction mass and an actuator are used to reduce unwanted vibrations of an optical element in the projection system of a lithographic projection apparatus. The reaction mass may be mechanically connected only to the optical element or may be compliantly mounted to the projection system frame.

Abstract: An air conditioner arranged in a machine chamber supplies gas for air conditioning into an exposure chamber via a supply path, and performs air conditioning of the exposure chamber. Then, the gas for air conditioning that has performed air conditioning returns to the machine chamber via an exhaust path. A chemical filter is provided in part of the exhaust path returning to the machine chamber from the exposure chamber. This filter securely removes contaminants that are introduced by outgassing and the like in an exposure apparatus main body and that are contained in the gas for air conditioning returning to the machine chamber from the exposure chamber. Accordingly, the inside of the exposure chamber can be kept chemically clean. Therefore, highly accurate exposure quantity control and thus highly accurate exposure can be performed for a long period of time, and high throughput can be maintained for a long period of time.

Abstract: An exposure apparatus includes an illumination optical system for illuminating a pattern of a reticle with laser light outputted from a continuous emission laser, a projection optical system for projecting the illuminated pattern onto a subject to be exposed, and an interferometer, of a Fizeau type, being operable while using laser light outputted from the continuous emission laser.

Abstract: An anti-vibration apparatus includes a table, an actuator system which applies a force to the table, a first system which applies to the actuator system a first signal for causing the actuator system to apply the force in proportion to a displacement of the table, and a second system which applies to the actuator system a second signal for causing the actuator system to apply the force based on an acceleration of the table. The first and second signals are generated by the first and second systems, respectively, so that a natural vibration mode of a system including the table and the actuator system is unchanged.

Abstract: A semiconductor photolithography system to improve overlay accuracy is disclosed. Such a system can include an exposure tool, at least one track, and a number of photoresist modules. The exposure tool performs functionality related to both at least a front-end and a back-end wafer. Each track has one or more paths to and from the exposure tool. The photoresist modules each perform functionality related to photoresist, on only either the front-end wafer or the back-end wafer, not both. Each module is located on one of the tracks. More specifically, a two-track system is disclosed, where each track has a path to and from the exposure tool, and a single-track system is disclosed having two paths to and from the exposure tool.

Abstract: An air bearing stage device which is suitable for use with a vacuum environment is disclosed. According to one aspect of the present invention, a stage apparatus includes a table that is positioned in a system vacuum chamber, a first rod that carries the table, and first and second plates that support the first rod. The first plate includes an air bearing surface that is held against the first side of a first wall by a first vacuum force. A first drive mechanism drives the first plate to move the first rod in a first direction, and also drives the second plate to move the first rod in the first direction, while a second drive mechanism which includes a second rod and a first linear motor causes the second rod to move the first rod in a second direction.

Abstract: A de-pellicle tool for removing a pellicle from a reticle during the formation of circuit patterns on substrates in the fabrication of integrated circuits. The de-pellicle tool of the present invention comprises a support frame on which is mounted the reticle and the pellicle supported on the reticle. A pair of handle-actuated lift pins on opposite sides of the support frame are extended into respective pin openings in the pellicle frame, after which the handles are pushed downwardly to raise the lift pins and lift the pellicle frame from the reticle. Accordingly, no moving parts contact the reticle during the pellicle-removing procedure, preventing scratching or other damage to the reticle.

Abstract: A method of detecting a focal point position of a projection optical system. The method includes moving an object having a first mark in a direction of an optical axis of the projection optical system, illuminating the first mark with light, taking an image of the illuminated first mask through the projection optical system, using an image pickup unit, with respect to each position of the object, calculating a contrast-related value relating to contrast of a first signal corresponding to the first mark in each of the images, measuring an intensity of the light with respect tot each of the images, based on a second signal different from the first signal, correcting the contrast-related value of each of the images, based on the corresponding intensity of the light, and detecting the focal point position, based on the corrected contrast-related value of each of the images.

Abstract: A stage assembly (10) for moving and positioning a device (26) is provided herein. The stage assembly (10) includes a stage base (12), a stage (14), a stage mover assembly (16), and a reaction mass assembly (18). The stage mover assembly (16) moves the stage (14) along an X axis and along a Y axis relative to the stage base (12). The reaction mass assembly (18) is coupled to the stage mover assembly (16). Uniquely, the reaction mass assembly (18) reduces the reaction forces created by the stage mover assembly (16) in three degrees of freedom that are transferred to the stage base (12). With this design, stage mover assembly (16) has less influence upon the position of the stage base (12). These features allow for more accurate positioning of the device (26) by the stage assembly (10) and better performance of the stage assembly (10).

Abstract: A spectroscopic ellipsometer having a multiwavelength light source, spectrometer (or wavelength-scanning monochromator and photodetector), a polarizer and polarization analyzer, and one or more objectives in the illumination and collection light paths, further comprises a stationary polarization modulator that modulates the light polarization versus wavelength. Modulator can be an optically active crystal rotating the linear polarization plane by a different angle for each wavelength or a non-achromatic waveplate retarder that varies the relative phase delay of the polarization components periodically over wavelength. The measured spectrum can be used to characterize selected features or parameters of a sample, e.g. by comparison with one or more theoretical spectra.

Abstract: An apparatus is provided with an illumination optical system for irradiating illumination light from a light source onto a predetermined illumination area on a mask and a projection optical system for projecting a pattern formed on the mask onto a photosensitive substrate. The apparatus synchronously moves the mask and the substrate in predetermined scanning directions perpendicular to an optical axis of the projection optical system thereby to effect scanning exposure of a projected image of the pattern on the substrate. The apparatus comprises a device for inputting information on a distortion of a pattern having been already formed on the substrate, in a direction perpendicular to the scanning directions, and a device for controlling imaging characteristics of the projection optical system, based on the information thus input.

Abstract: A projection optical system having a large numerical aperture in a soft X-ray wavelength range of 200 nm or less, specifically 100 nm or less and a resolution drastically lower than 50 nm, and a projection exposure apparatus provided with the projection optical system.

Abstract: A device for the analysis of an optical wavefront includes an array (ML) of microlenses (Li), and signal processing elements. Each mircolens (Li) defines a subaperature (Spi), and focuses an elementary surface of the wavefront, intercepted by the subaperature, for forming a spot (Ti) on the detector. For each subaperature (Spi), a zone (Zi) of assumed localization of the spot is defined. The processing unit makes it possible to establish a measurement file associating to each subaperature the position of this spot. The structure of the array (ML) presents one or several local variations. By comparing the contribution of these local variations taken from the measurement file, with their contribution taken from a reference file, the displacement between the subaperature from which a detected spot is derived and the subaperature that defines the zone of assumed localization wherein the spot is located is measured.

Abstract: Apparatus for dubbing a film from a source language to a target language includes a replay device (1) which replays a film and a control unit (6) which generates an acoustic model of the scene. A dubbing soundtrack on the replay device (1) is fed via a line (2) to an acoustic processor (3). The acoustic processor (3) processes the dubbed soundtrack under the control of the control unit (6) to produce a dubbed soundtrack which is modified to take into account the acoustic environment of the scene. This soundtrack may be recorded on a recording device (5). The application further discloses the generation of soundtracks for computer generated scenes taking into account the virtual acoustic environment.

Abstract: An exposure method is disclosed, which comprises exposing a light on a photomask having a mask pattern, in an exposing device, receiving in the exposing device the light which passed through the photomask to observe an optical image of the mask pattern based on the received light, deciding an optimum exposure condition based on the optical image of the mask pattern to form a predetermined resist pattern, and exposing a light on a photoresist film formed on a wafer via the photomask based on the optimum exposure condition.

Abstract: A printing apparatus (110) for selectively printing an image from image data either onto any member of a set of photosensitive media (140), including a first photosensitive medium (140) having a relatively low contrast response and a second photosensitive medium (140) having a relatively high contrast response. The printing apparatus (110) uses a spatial light modulator (136) for forming an image, having at least a first set of setup voltage conditions for printing onto the first photosensitive medium (140) and a second set of setup voltage conditions for printing onto the second photosensitive medium (140). An adjustable polarizing component in the path of output light from the spatial light modulator (136), has at least a first contrast setting for the first photosensitive medium (140) and a second contrast setting for the second photosensitive medium (140).