Patents Examined by David E Smith
  • Patent number: 11935723
    Abstract: A method prepares a microsample from a volume sample using multiple particle beams. The method includes providing a volume sample in the microscope system, wherein the interior of the volume sample has a sample region of interest, and producing a macrolamella comprising the sample region of interest by removing sample material of the volume sample using one of the particle beams. The method also includes orienting the macrolamella relative to one of the particle beams, and removing sample material of the macrolamella via a beam so that the region of interest is exposed.
    Type: Grant
    Filed: November 9, 2021
    Date of Patent: March 19, 2024
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Fabian Perez Willard, Tobias Volkenandt
  • Patent number: 11931763
    Abstract: Apparatus, systems, and methods for identifying and quantifying chemical components in a high-melting-point liquid. One such method includes: receiving, into a nebulizer assembly, a high-melting-point liquid from a molten liquid conduit; aerosolizing, using the nebulizer assembly, at least a portion of the received high-melting-point liquid; delivering, into one or more instruments, the aerosolized high-melting-point liquid from the nebulizer; and chemically analyzing, using the one or more instruments, the aerosolized high-melting-point liquid.
    Type: Grant
    Filed: November 6, 2020
    Date of Patent: March 19, 2024
    Assignee: Abilene Christian University
    Inventors: Kim Pamplin, Tyler Cepica
  • Patent number: 11929230
    Abstract: A large current electron beam is stably emitted from an electron gun of a charged particle beam device. The electron gun of the charged particle beam device includes: a SE tip 202; a suppressor 303 disposed rearward of a distal end of the SE tip; a cup-shaped extraction electrode 204 including a bottom surface and a cylindrical portion and enclosing the SE tip and the suppressor; and an insulator 208 holding the suppressor and the extraction electrode. A shield electrode 301 of a conductive metal having a cylindrical portion 302 is provided between the suppressor and the cylindrical portion of the extraction electrode. A voltage lower than a voltage of the SE tip is applied to the shield electrode.
    Type: Grant
    Filed: April 18, 2019
    Date of Patent: March 12, 2024
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Keigo Kasuya, Akira Ikegami, Kazuhiro Honda, Masahiro Fukuta, Takashi Doi, Souichi Katagiri, Aki Takei, Soichiro Matsunaga
  • Patent number: 11929244
    Abstract: A collision reaction pool ion acceleration apparatus which has extremely low crosstalk. The apparatus comprises an apparatus body, a vacuum chamber, a first tube bundle channel and a second tube bundle channel. The vacuum chamber is fixedly connected to the interior of the apparatus body; the other end of the interior of the apparatus body is fixedly connected to a first insulation seat. A collision chamber is embeddedly connected to the inside the first insulation seat, and a high-frequency electrode quadrupole lens is fixedly connected to two sides of the collision chamber. When charged ions enter the collision chamber, the high-frequency electrode quadrupole lens focuses on the charged ions, so that the incoming charged ions form a new motion trajectory in the collision chamber, and the charged ions are easily separated from the collision chamber, thereby increasing the working efficiency.
    Type: Grant
    Filed: December 8, 2021
    Date of Patent: March 12, 2024
    Assignee: NANJING QLIFE MEDICAL TECHNOLOGY CO., LTD.
    Inventors: Xiaoliang Cheng, Kejia Zheng
  • Patent number: 11929232
    Abstract: Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.
    Type: Grant
    Filed: September 18, 2020
    Date of Patent: March 12, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Frank Nan Zhang, Zhongwei Chen, Yixiang Wang, Ying Crystal Shen
  • Patent number: 11929247
    Abstract: Apparatuses are disclosed which include one or more lamps configured to emit germicidal light, wherein the apparatuses are configured such that germicidal light emitted from the one or more lamps is projected exterior to the apparatus. The apparatuses further include wheels arranged along a bottom of the apparatus and a motor to provide automated mobility of the apparatus across at least a part of a room or area in which the apparatus is arranged. Moreover, the apparatuses include a processor and a storage medium having program instructions which are executable by the processor for activating the motor such that the apparatus is moved within the room or area while the one or more lamps are emitting germicidal light.
    Type: Grant
    Filed: August 23, 2019
    Date of Patent: March 12, 2024
    Assignee: Xenex Disinfection Services Inc.
    Inventors: Mark A. Stibich, James B. Wolford, Alexander N. Garfield, Martin Rathgeber, Eric M. Frydendall
  • Patent number: 11929238
    Abstract: At timing t0, a brake gas (raw material gas) starts to be supplied to an ion beam generator, and the brake gas is fed into a turbo molecular pump. After timing t1, a vent valve is opened intermittently to feed atmospheric air into the turbo molecular pump. The brake gas may be different from the raw material gas. The brake gas is supplied using a gas supply system.
    Type: Grant
    Filed: January 25, 2022
    Date of Patent: March 12, 2024
    Assignee: JEOL Ltd.
    Inventors: Tatsuhito Kimura, Munehiro Kozuka
  • Patent number: 11921297
    Abstract: A system for generating pump illumination for laser sustained plasma (LSP) is disclosed. The system may include an illumination source configured to output a pump beam, one or more focusing optics, and one or more beam shapers configured to reshape the pump beam to provide a shaped pupil power distribution at an illumination pupil plane of the one or more focusing optics. The shaped pupil power distribution may include at least one of a flat-top distribution or an inverted distribution with a central local intensity minimum. Further, the one or more focusing optics may receive the pump beam from the one or more beam shapers and direct the pump beam to a plasma-forming material, whereby the pump beam at least one of forms or maintains a plasma that emits broadband illumination.
    Type: Grant
    Filed: February 28, 2022
    Date of Patent: March 5, 2024
    Assignee: KLA Corporation
    Inventors: Ilya Bezel, Matthew Derstine, Andrey Stepanov, Nikolay Sherbak
  • Patent number: 11923167
    Abstract: An ion implanter includes: a plurality of devices which are disposed along a beamline along which an ion beam is transported; a plurality of neutron ray measuring instruments which are disposed at a plurality of positions in the vicinity of the beamline and measure a neutron ray from a neutron ray source which is generated in the beamline due to collision of a high-energy ion beam; and a control device which monitors at least one of the plurality of devices, based on a plurality of measurement values measured by the plurality of neutron ray measuring instruments.
    Type: Grant
    Filed: December 22, 2022
    Date of Patent: March 5, 2024
    Assignee: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.
    Inventor: Hiroshi Matsushita
  • Patent number: 11915951
    Abstract: A plasma processing apparatus includes a stage disposed in a processing chamber for mounting a wafer, a plasma generation chamber disposed above the processing chamber for plasma generation using process gas, a plate member having multiple introduction holes, made of a dielectric material, disposed above the stage and between the processing chamber and the plasma generation chamber, and a lamp disposed around the plate member for heating the wafer. The plasma processing apparatus further includes an external IR light source, an emission fiber arranged in the stage, that outputs IR light from the external IR light source toward a wafer bottom, and a light collection fiber for collecting IR light from the wafer. Data obtained using only IR light from the lamp is subtracted from data obtained also using IR light from the external IR light source during heating of the wafer. Thus, a wafer temperature is determined.
    Type: Grant
    Filed: June 26, 2020
    Date of Patent: February 27, 2024
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Hiroyuki Kobayashi, Nobuya Miyoshi, Kazunori Shinoda, Tatehito Usui, Naoyuki Kofuji, Yutaka Kouzuma, Tomoyuki Watanabe, Kenetsu Yokogawa, Satoshi Sakai, Masaru Izawa
  • Patent number: 11915837
    Abstract: A method includes simulating diffraction in a transmission geometry of relativistic electron bunches from a crystallographic structure of a crystal thereby simulating diffraction of the relativistic electron bunches into a plurality of Bragg peaks. The method includes selecting a range of angles between a direction of propagation of the relativistic electron bunches and a normal direction of crystal including an angle at which a diffraction portion is maximized. The method includes sequentially accelerating a plurality of physical electron bunches to relativistic energies toward a physical crystal having the crystallographic structure and diffracting the plurality of physical electron bunches off the physical crystal at different angles and measuring the diffraction portion into the respective Bragg peak at the different angles. The method includes selecting a final angle based on the measured diffraction portion into the respective Bragg peak at the different angles and generating a pulse of light.
    Type: Grant
    Filed: July 16, 2021
    Date of Patent: February 27, 2024
    Assignee: Arizona Board of Regents on Behalf of Arizona State University
    Inventors: William Graves, Lucas Malin
  • Patent number: 11908673
    Abstract: An ion molecule reactor for generating analyte ions from analytes comprises: a) a reaction volume in which reagent ions can interact with the analytes in order to form analyte ions; b) at least one analyte inlet for introducing the analytes along an inlet path into the reaction volume whereby, preferably, the inlet path runs essentially along at least a first section of the predefined transit path in the reaction volume; c) at least one reagent ion source and/or at least one reagent ion inlet for providing reagent ions into the reaction volume; d) optionally, at least one ion guide comprising an electrode arrangement which is configured for producing an alternating electrical, magnetic and/or electromagnetic field, that allows for guiding the reagent ions and/or the analyte ions at least along a section of the predefined transit path, preferably along the whole transit path, through the reaction volume.
    Type: Grant
    Filed: October 19, 2018
    Date of Patent: February 20, 2024
    Assignee: TOFWERK AG
    Inventors: Felipe Lopez-Hilfiker, Manuel Hutterli, Marc Gonin, Carsten Stoermer, Michael Kamrath
  • Patent number: 11890490
    Abstract: A quality assurance device for a medical accelerator includes a housing having an inner radioluminescent layer adapted to provide a visual indication when contacted with invisible radiation generated by the medical accelerator. In addition, the quality assurance device includes one or more passive optical components within the housing adapted to deliver an image of the inner radioluminescent layer of the housing including the visual indication to one or more cameras located outside of the housing.
    Type: Grant
    Filed: December 12, 2019
    Date of Patent: February 6, 2024
    Assignee: University of Kentucky Research Foundation
    Inventors: Janelle A. Molloy, Dennis A. Cheek, Quan Chen
  • Patent number: 11890387
    Abstract: A germicidal system for use in disinfecting a human interface device includes at least one human interface device. One or more ultra-violet (UV) light sources are used in proximity to the at least one human interface device for disinfecting a touch surface of the human interface device below a surgical grade sterilization. A memory for storing usage data of the at least one UV light source. At least one server is used for providing a central storage location for usage data supplied from the memory and a computer is used in communication with the at least one server for controlling the operational parameters of the at least one UV light source.
    Type: Grant
    Filed: September 22, 2022
    Date of Patent: February 6, 2024
    Assignee: UV Partners, Inc.
    Inventor: Theodore John Cole
  • Patent number: 11887807
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.
    Type: Grant
    Filed: January 23, 2023
    Date of Patent: January 30, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhongwei Chen
  • Patent number: 11887743
    Abstract: Conformal coatings provide environmental protection for sensitive military electronics. Preliminary MCNP™ modeling of metal oxide impregnated acrylic conformal coatings indicates an effective shield for gammas below 10 keV and a reduction in neutron displacement damage to Si-based electronics across the Watt spectrum. This work provides data which can allow an optimal overall shielding worth per total weight to eventually be evaluated.
    Type: Grant
    Filed: April 16, 2021
    Date of Patent: January 30, 2024
    Assignee: NORTH CAROLINA STATE UNIVERSITY
    Inventors: Robert Bruce Hayes, Michael Jeffrey DeVanzo
  • Patent number: 11887831
    Abstract: In some embodiments, a method for optimizing performance of a mass spectrometer comprises using an ion source to generate ions, collisionally cooling the ions within an ion guide, directing said ions from the ion guide through at least one ion lens to a downstream mass analyzer, ramping a DC voltage applied to the ion lens, performing a mass analysis of the ions within the mass analyzer while the DC voltage applied to the ion lens is ramped, estimating performance of the mass spectrometer by measuring one or more characteristics of at least one of an ion signal and the voltage ramp, and adjusting a DC voltage applied to said at least one lens element based on said measured one or more characteristics of at least one of the ion signal and the voltage ramp so as to enhance performance of the mass spectrometer.
    Type: Grant
    Filed: December 12, 2019
    Date of Patent: January 30, 2024
    Assignee: DH Technologies Development Pte. Ltd.
    Inventors: Leigh Bedford, Yang Kang, Yves Le Blanc, Bradley Schneider
  • Patent number: 11881378
    Abstract: Provided herein are approaches for angle control of neutral reactive species ion beams. In one approach, a workpiece processing apparatus may include a plasma source operable to generate a plasma within a plasma chamber enclosed by a chamber housing, and an extraction plate coupled to the chamber housing. The extraction plate may include a plurality of channels for delivering one or more radical beams to a workpiece, wherein each of the plurality of channels has a lengthwise axis oriented at a non-zero angle relative to a perpendicular extending from a main surface of the workpiece, wherein each channel of the plurality of channels has a channel length and a channel width, and wherein the channel width varies along the channel length.
    Type: Grant
    Filed: May 13, 2022
    Date of Patent: January 23, 2024
    Inventors: Glen F. R. Gilchrist, Yufeng Qiu
  • Patent number: 11879470
    Abstract: A mass spectrometer comprising: a vacuum housing comprising a first vacuum chamber having a first gas exhaust port; a gas pump (1700) having a first gas inlet port connected to the first gas exhaust port (H1) by a first gas conduit for evacuating the first vacuum chamber; and a first apertured cover (2010) arranged over the first gas exhaust port (H1) or first gas inlet port, or in the first gas conduit therebetween.
    Type: Grant
    Filed: May 31, 2019
    Date of Patent: January 23, 2024
    Assignee: Micromass UK Limited
    Inventors: Cedric Marsh, Peter Carney, Jason Lee Wildgoose, David Wallis, Paul McIver, Soji Chummar, George Andreas Antoniades, Dipesh Mistry
  • Patent number: 11879784
    Abstract: The invention relates to a modulatable infrared emitter comprising a MEMS heating element and an actuator, wherein the actuator triggers shape and/or structure changes of the MEMS heating element. Said change in shape and/or structure of the MEMS heating element may vary the ratio of the emitting area to the total area, thereby producing a change in intensity of the emitted infrared beam. The invention further relates to a manufacturing method for the infrared emitter, a method for modulated emission of infrared radiation using the infrared emitter, and preferred uses of the infrared emitter. In further preferred aspects the invention relates to a system comprising the infrared emitter and a control device for regulating the actuator.
    Type: Grant
    Filed: September 13, 2019
    Date of Patent: January 23, 2024
    Assignee: Hahn-Schickard-Gesellschaft für angewandte Forschung e. V.
    Inventors: Alfons Dehé, Achim Bittner, Daniel Biesinger