Abstract: The present disclosure discloses a method and system for inspecting cargoes. The method comprises: acquiring a transmission image of the inspected cargoes; processing the transmission image to acquire an interested region; extracting features from the interested region, and determining cargo information of the inspected cargoes according to the extracted features; and providing a proposed treatment suggestion of the cargoes based on the determined cargo information and at least a part of information in a manifest. The above solution can facilitate an image judgment person to accurately judge whether the concerned cargoes are allowed to pass.

Abstract: A method for evaluating a specimen includes positioning a detector in an inserted position in which a first distance between a tip of the detector and a plane extending along a surface of the specimen is less than a distance between the plane and a tip of charged particle beam optics. While maintaining the detector at the inserted position, the surface of the specimen is scanned by a primary beam that exits from the tip of the charged particle beam optics. The detector detects x-ray photons and/or charged particles emitted or reflected from the specimen as a result of scanning the specimen with the primary beam. After completion of the scanning, the detector is positioned at a retracted position in which a second distance between the tip of the detector and the plane exceeds a distance between the tip of the charged particle beam optics and the plane.

Abstract: In one embodiment, an electron beam drawing apparatus includes an electron gun including a cathode and an anode, a current control circuit controlling a total emission current, a first detector detecting a first emission current from an outer peripheral portion of the cathode, a second detector detecting a second emission current from an central portion of the cathode, and a controller that determines a coefficient, which is a ratio of an emission current from the outer peripheral portion of the cathode to the first emission current. During a period in which a pattern is drawn on the substrate, the controller estimates a value of the second emission current by subtracting a value, which is resulted by multiplying the first emission current by the coefficient, from the total emission current, and controls the current control circuit in a manner of holding the estimated value constant.

Abstract: A method for operating a particle beam microscope includes: setting potentials of a particle source and an object; directing a particle beam onto the object; setting an excitation of a particle-optical lens; generating a dependence between a manipulated variable and the excitation so that the excitation is representable as a monotonic function dependent on the manipulated variable; changing the manipulated variable via an actuating element to focus the particle beam at the object; and determining a target value of the manipulated variable in a manner dependent on the set potentials. The target value virtually corresponds to an ideal excitation of the lens. The particle beam in the case of the ideal excitation is focused at the object. The absolute value of the first derivative of the function in a value range containing the target value is less than in the case of values lying outside of this value range.

Abstract: A package (100) comprising storage packaging (1) as well as a confinement canister (3) for irradiated fuel, the packaging comprising a lateral body (2) which extends around a longitudinal axis (12) of the packaging and which includes an internal surface (22) which delimits a cavity for housing the canister (3), the packaging furthermore comprising at least one assembly (15) forming a guide rail for the canister in the cavity, mounted on the lateral body (2) and protruding at least partly into the housing cavity (4). According to the invention, the assembly forming a guide rail (15) includes an impact shock absorbing element (28) designed to absorb the shock, by plastic deformation, of a lateral impact between the packaging (1) and the confinement canister (3).

Abstract: A charged particle beam lithography apparatus according to an embodiment includes: a pattern-writing-data data storage processing circuitry configured to store pattern writing data in association with pattern attribute information; a shot dividing processing circuitry configured to divide the pattern writing data into shot data in association with the pattern attribute information; an indicator data storage processing circuitry configured to store an indicator for determining correction section regions to be merged on calculation in an approximation calculation of heat transfers, the indicator being associated with the pattern attribute information; a pattern writing schedule creator configured to create a pattern writing schedule based on the shot data; an approximation-calculation-method determining processing circuitry configured to determine an approximation calculation method of the heat transfers from other shots written before a shot to be written, the shot being associated with the shot data to be wri

Abstract: An EUV light generation device generates EUV light stably. The EUV light generation device may include a chamber in which extreme ultraviolet light is generated when a target is irradiated with laser light in a predetermined region inside the chamber, a target supply device configured to output the target to the predetermined region in the chamber to thereby supply the target to the predetermined region, and a target recovery apparatus configured to recover the target output from the target supply device and not irradiated with the laser light. The target recovery apparatus may include a receiver disposed to be inclined with respect to a trajectory of the target output from the target supply device, the receiver being configured to receive the target by allowing the target not irradiated with the laser light to collide with the receiver, and an excitation device configured to vibrate the receiver.

Abstract: A focusing ion guiding apparatus includes: at least one ion guiding inlet and ion guiding outlet connected to each other via a transport axial line; at least one group of focusing electrode structures comprising at least one smooth and non-concave focusing electrode or focusing electrode array to which a focusing voltage is applied, the focusing electrode structure causing the ions transported in the apparatus to be radially focused for many times under the action of a focusing electric field formed by the focusing electrode structure; and a neutral gas flow transported in the axial direction, a diffusion path of the gas flow in an at least partially radial direction relative to the axial direction being blocked by the focusing electrode or its bearing substrate to increase a transport velocity of the gas flow in the axial direction and reduce retention or turbulence of the transported ions.

Abstract: A system for measuring cathodoluminescence from a substrate includes an electron beam source configured to generate an electron beam, a sample stage configured to secure a sample and an electron-optical column including a set of electron-optical elements to direct at least a portion of the electron beam through onto a portion of the sample. The system also includes a set of guide optics located at a position within or below the electron-optical column and a set of collection optics, wherein the set of guide optics captures cathodoluminescent light emitted from the sample in response to the electron beam and directs the cathodoluminescent light to the set of collection optics. In addition, the system includes a detector. The set of collection optics is configured to image the cathodoluminescent light onto the detector.

Abstract: In beta emission imaging, magnetic lensing allows a lower resolution detector to detect the spatial distribution of emissions at a higher resolution. The sample is placed in a magnetic field with field lines at a given density, and the detector is placed away from the sample where the magnet field lines diverge, resulting in a lesser density. Since the beta emissions travel along the field lines, the divergence of the field lines from the sample to the detector result in lensing or magnification. Using positron attenuation tomography to detect annihilation in the detector allows for correction due to self-absorption by the sample. The correction and lensing are used together or may be used independently.

Abstract: The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).

Abstract: A method of targeted mass spectrometric analysis is provided for analyzing trace compounds at sub-ppb level compared to sample matrix. Sample is chromatographically separated at standard conditions to employ a map of target mass (M) versus retention time (RT). Small mass ions under M(RT) are rejected by RF field, and remaining ions are accumulated for pulsed injection into a multi-reflecting TOF MS, either directly from EI source, or from linear RF trap or via a heated RF only quadrupole with axial ion trapping. In combination with EI source the method provides sub femtogram sensitivity at matrices loads in microgram range.

Abstract: A corona ignition assembly comprising a plurality of different insulators disposed between an ignition coil assembly and firing end assembly is provided. A high voltage center electrode extends longitudinally between an igniter central electrode and the ignition coil assembly. A high voltage insulator formed of a fluoropolymer surrounds the high voltage center electrode, and a firing end insulator formed of alumina surrounds the igniter central electrode. According to one embodiment, a glue formed of a compliant and insulating material, such as a silicon-based material, forms a seal between the high voltage insulator and the firing end insulator. According to another embodiment, a dielectric compliant insulator is disposed between the high voltage insulator and the ignition coil assembly, and the glue forms a seal therebetween. The glue fills air gaps to prevent unwanted corona discharge, and thus extends the life of the materials and directs energy to the firing end.

Abstract: Ion filter for FAIMS fabricated using the LIGA technique. The ion filter is manufactured using a metal layer to form the ion channels and an insulating support layer to hold the structure rigidly together after separation of the metal layer into two electrodes.

Abstract: A charged particle spectrometer of hemispherical analyzer type for analyzing a particle emitting sample, the spectrometer comprising at least a first mechanism configured to move at least a part of the lens with respect to the axis between the sample spot and the analyzer entrance in a coordinate direction synchronously with a deflection of the particle beam.

Abstract: In a charged particle beam device including an objective lens that focuses a charged particle beam; a first deflector that deflects the charged particle beam to emit the charged particle beam to a sample from a direction different from an ideal optical axis of the objective lens; and a second deflector that deflects a charged particle emitted from the sample, a charged particle focusing lens to focus the charged particle emitted from the sample is disposed between the sample and the second deflector and strengths of the objective lens and the charged particle focusing lens are controlled, according to deflection conditions of the first deflector.

Abstract: A device for measuring electron orbital angular momentum states in an electron microscope includes the following components aligned sequentially in the following order along an electron beam axis: a phase unwrapper (U) that is a first electrostatic refractive optical element comprising an electrode and a conductive plate, where the electrode is aligned perpendicular to the conductive plate; a first electron lens system (L1); a phase corrector (C) that is a second electrostatic refractive optical element comprising an array of electrodes with alternating electrostatic bias; and a second electron lens system (L2). The phase unwrapper may be a needle electrode or knife edge electrode.

Abstract: An extreme ultraviolet light generation device may include: a chamber earthed to a ground, in which extreme ultraviolet light is generated by irradiating a metal target supplied inside with laser light; a target supply unit earthed to the ground and configured to output the target supplied into the chamber from a nozzle; an extraction electrode configured to exert electrostatic force on the target by applying a negative first potential to the extraction electrode; a first power supply configured to apply the first potential to the extraction electrode; an acceleration electrode unit configured to accelerate the target by applying a negative second potential lower than the first potential to the acceleration electrode unit; a second power supply configured to apply the second potential to the acceleration electrode unit; and a charge neutralizer disposed inside the acceleration electrode unit and configured to emit electrons onto the target.

Abstract: A method for operating a particle beam microscope includes: setting a potential of a particle source; setting a potential of an object; directing a particle beam onto the object; focusing the particle beam using a particle-optical lens; providing a dependence between a value of an excitation of the particle-optical lens and a value of the potential of the object; changing a manipulated variable with the aid of an actuating element actuatable by a user; and setting the excitation of the particle-optical lens in a manner dependent on the manipulated variable. In a first mode of operation, the potential of the object is set on the basis of the excitation of the particle-optical lens in accordance with the dependence between the value of the excitation of the particle-optical lens and the value of the potential of the object.

Abstract: The present specification discloses a radiographic inspection system for screening an area. The inspection system has a container that defines an enclosed volume, a radiation source positioned within the enclosed volume, a detector array, a movable structure attached to a portion of the base of the container, and a controller programmed to move the movable structure to achieve an optimum height of the radiation source's field of view based upon a plurality of data.