Abstract: A method for cleaning and conditioning the water-steam circuit of a power plant, especially of a nuclear power plant, uses an amine as a film-forming agent. The amine is metered into the working medium circulating in the water-steam circuit. The film-forming agent forms a hydrophobic film on the surfaces of the circuit. During the process, the concentration of at least one impurity contained in the water and the concentration of the film-forming agent in at least in the feed water of the steam generator are measured and monitored. The concentration of the film-forming agent is varied, as needed, subject to the concentration of the impurity.

Abstract: A dishwasher includes a tub at least partially forming a treating chamber, a dish rack provided within the wash chamber, and a spray manifold. The spray manifold can have multiple apertures and/or sprayers for emitting wash liquid to define a spray zone.

Abstract: Methods of removing metal from a portion of a substrate are useful in integrated circuit fabrication. Methods include exposing the substrate to an oxidizing environment comprising at least one oxidizing agent and at least one reducing agent, determining whether metal remaining on the portion of the substrate is less than or equal to a particular level, and if the metal remaining on the portion of the substrate is deemed to be greater than the particular level, exposing the substrate to a reducing environment comprising at least one reducing agent and at least one oxidizing agent.

Abstract: A single-wafer-type cleaning apparatus is provided. The single-wafer-type cleaning apparatus is configured to be capable of controlling electrostatic charges generated due to rotating a wafer during a semiconductor cleaning process and a defect caused by the electrostatic charges. The cleaning process uses an ionizer mounted on a chuck.

Abstract: A cleaning device is provided that includes a housing, a cleaning head, a flexible pouch, a cleaning element, and a spray nozzle. The housing defines an internal cavity having a power source in selective electrical communication with a pump. The flexible pouch is removably stored in the housing and includes a cleaning fluid therein. The pouch forms a fluid and air tight connection with an inlet of the pump. The cleaning element is connected to the cleaning head and has a first spray opening. The spray nozzle is in fluid communication with an outlet of the pump. The spray nozzle is positioned on the cleaning head so as to spray the cleaning fluid from the flexible pouch through the first opening onto a surface being cleaned.

Abstract: A method of cleaning a substrate such as semiconductor substrate for IC fabrication is described that includes cleaning the semiconductor substrate with a mixture of ozone and one of an acid and a base. Exemplary acids and bases include HCl, HF, and NH4OH. The cleaning mixture may further include de-ionized water. In an embodiment, the mixture is sprayed onto a heated substrate surface.

Abstract: A cleaning system and method of cleaning filters that removes the ash in the plugged regions is disclosed. The filter is subjected to vibrations, which serve to loosen trapped and packed retentate from the filter. The loosened retentate is then captured by a collection bin. The cleaning system can be integral with the intended application, such as within an automobile. In another embodiment, the cleaning system is a separate cleaning station, where the filter is removing from its intended application, cleaned, and then reinstalled.

Abstract: The present invention relates to a method of, and a device for, detecting clogging of a dishwasher filter. The device is arranged to drain the dishwasher on process water, measure operating current of a motor driving a dishwasher drain pump and determine whether the dishwasher filter is clogged based on the measured drain pump motor operating current.

Abstract: A media scrubbing system includes a pair of rotating brushes arranged to rotate in opposed directions and receive media between the rotating brushes so as to scrub downwards on opposed surfaces of the media. The system includes oscillating rollers for supporting the media between the brushes. The oscillating rollers are arranged to reciprocally move vertically so as to oscillate the media as the brushes are rotating.

Abstract: A system for processing solar cells is disclosed which includes a separation module for separating a processing frame from solar cells that are fed along a conveyance line. The processing frame can be separated without requiring manual lifting of the processing frame by feeding the processing frame and solar cells into a magnetic roller system. The magnetic roller system can gradually lift the processing frame away from the solar cells and divert the processing frame to a separate roller system. The solar cells can remain on the main conveyance line for further processing.

Abstract: A method of cleaning a submerged surface covered by a liquid medium includes injecting a cleaning liquid with a submerged fluid jet through the liquid medium at the submerged surface. The method may also include introducing at least one of a non-reactive gas and a reactive gas with the cleaning liquid through the submerged fluid jet.

Abstract: Described is a wiper system for motor vehicle windows, more particularly motor vehicle windscreens, comprising at least one wiper (1, 2), at least one motor (5, 6) that drives the at least one wiper (1, 2), and a switching device (10) for directly controlling the motor (5, 6), wherein the switching device (10) has one or two switching elements (11, 15, 18, 19, 20) by means of which at least four switching states can be selected, and wherein selecting one of the switching states causes an operating mode of the at least one wiper (1, 2) to change.

Abstract: A method of operating a gas extraction system includes receiving a drilling fluid sample at a flow meter via a flow meter inlet conduit and discharging the drilling fluid sample into a flow meter outlet conduit. A first inline mud valve positioned in the flow meter inlet conduit and a second inline mud valve positioned in the flow meter outlet conduit are each closed to transition the gas extraction system to a bypass flushing configuration. A bypass flow meter valve positioned in a flow meter bypass conduit is opened to divert the drilling fluid sample around the flow meter. The flow meter is then flushed with flushing fluid by opening first and second flow meter flushing valves and starting a pump to circulate the flushing fluid through the flow meter.

Abstract: An ultrasonic cleaning apparatus and an ultrasonic cleaning method for an edge face of a substrate help prevent re-contamination caused by splashing or the like of ultrasonic wave propagating water sprayed onto an edge face of an object to be cleaned. An ultrasonic wave transmitting tube provided to continue from the spot shower and configured to transmit and spray the ultrasonic wave propagating water to the substrate is provided, the ultrasonic wave transmitting tube is installed so as not to be positioned on the substrate, the substrate is retained so that the surface of the substrate assumes a horizontal state, and ultrasonic wave propagating water is sprayed to the edge face, which constitutes an outer periphery of the substrate arranged in a space from the ultrasonic wave transmitting tube in a direction of tangent line of the edge face while rotating the substrate by a rotatable rotation retaining portion.

Abstract: A dishwasher appliance includes a first spray assembly and a second spray assembly disposed within a wash chamber of a tub. A hydraulic switch of the dishwasher appliance has a first outlet conduit that extends towards the first spray assembly and a second outlet conduit that extends towards the second spray assembly. A plug of the hydraulic switch is movable between the first outlet conduit and the second outlet conduit. The hydraulic switch may permit a flow of wash fluid to either the first spray assembly or the second spray assembly. A related method for operating a dishwasher appliance is also provided.

Abstract: A spin base is caused to rotate at a number of revolutions of from 250 rpm to 350 rpm (first number of revolutions), and at the same time, a cleaning solution is supplied through a discharge head to a holding surface of a spin base while the upper end of a processing cup surrounding the spin base is placed below the holding surface. Thus, an outer upper surface of the processing cup is cleaned with the cleaning solution scattered from the holding surface. Then, the spin base is caused to rotate at a number of revolutions of from 350 rpm to 450 rpm (second number of revolutions) higher than the first number of revolutions, and at the same time, a cleaning solution is supplied through the discharge head onto the holding surface. Thus, a partition plate outside the processing cup is cleaned with the cleaning solution scattered from the rotating holding surface.

Abstract: Systems and methods for edge exclusion control are described. One of the systems includes a plasma chamber. The plasma processing chamber includes a lower electrode having a surface for supporting a substrate. The lower electrode is coupled with a radio frequency (RF) power supply. The plasma processing chamber further includes an upper electrode disposed over the lower electrode. The upper electrode is electrically grounded. The plasma processing chamber includes an upper dielectric ring surrounding the upper electrode. The upper dielectric ring is moved using a mechanism for setting a vertical position of the upper dielectric ring separate from a position of the upper electrode. The system further includes an upper electrode extension surrounding the upper dielectric ring. The upper electrode extension is electrically grounded. The system also includes a lower electrode extension surrounding the lower dielectric ring. The lower electrode extension is arranged opposite the upper electrode extension.

Abstract: A substrate processing apparatus according to an embodiment includes: a liquid supplier configured to supply a processing liquid to a surface of a substrate; a temperature detector configured to detect a surface temperature of the substrate supplied with the processing liquid by the liquid supplier; a temperature monitor configured to determine whether or not the surface temperature detected by the temperature detector has reached a predetermined temperature; and a controller configured to cause the liquid supplier to stop supplying the processing liquid when the temperature monitor determines that the surface temperature has reached the predetermined temperature.

Abstract: An apparatus and method for cleaning milking stalls on a platform of a rotary parlour. The rotary parlour includes a robotic manipulation device configured to perform a primary task; a holding device configured to hold the end portion of the hose member in a predetermined parking position, and a control unit. When it is time to clean a milking stall on the platform, the control unit activates the robotic manipulation device such that, instead of performing a primary task, the robotic manipulation device performs an additional task in which the robotic manipulation device grips the end portion of a hose member and moves the end portion from a parking position to a number of cleaning positions from which liquid jets are sprayed from the outlet opening of the end portion against predetermined surfaces to be cleaned in the milking stall.

Abstract: An improved vehicle washing apparatus includes a plurality of upright tower sections. Each of the upright tower sections has a plurality of elongated tubular members. A horizontal section having a plurality of elongated tubular members connects the upright tower sections. At least two of the elongated tubular members of the upright tower sections and the horizontal section are configured to be conduits of liquid to supply liquid to a plurality of nozzles disposed on at least two of the elongated tubular members of each of the upright tower sections and the horizontal section. An undercarriage apparatus may apply liquid to the underside of the agricultural vehicle. A chemical fill station may be provided along with a loading pad on which to position the agricultural vehicle during a cleaning process and a chemical fill process.