Patents Examined by Jay Kim
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Patent number: 9009840Abstract: In a resource-on-demand environment, virtual machine images are validated before use. A provider or source of a virtual machine image may generate a manifest, indicating executable components of the machine image. Before use, a created virtual machine may compare its executable components with those specified by the manifest. To ensure authenticity, the manifest may be associated with a signature, and the virtual machine may use the signature to verify the manifest and the source of the machine image.Type: GrantFiled: January 23, 2012Date of Patent: April 14, 2015Assignee: Amazon Technologies, Inc.Inventor: Thomas C. Stickle
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Patent number: 7417673Abstract: The invention relates to photographing process, where zooming is carried out. In a method an image is formed through imaging optics onto a light sensitive image sensor in an imaging device and wherein the device is capable of both optical and digital zooming. The method comprises steps of determining an amount of available illumination, determining, according to the amount of available illumination, a ratio between the optical zooming and the digital zooming, and performing, according to which ratio, the optical and the digital zooming. The invention also relates to a device, controller, a computer executable program and a medium.Type: GrantFiled: May 31, 2005Date of Patent: August 26, 2008Assignee: Nokia CorporationInventors: Antti Wright, Anne Juvonen, Ossi Kalevo
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Patent number: 7411252Abstract: Disclosed is a tri-gate field effect transistor with a back gate and the associated methods of forming the transistor. Specifically, a back gate is incorporated into a lower portion of a fin. A tri-gate structure is formed on the fin and is electrically isolated from the back gate. The back gate can be used to control the threshold voltage of the FET. In one embodiment the back gate extends to an n-well in a p-type silicon substrate. A contact to the n-well allows electrical voltage to be applied to the back gate. A diode created between the n-well and p-substrate isolates the current flowing through the n-well from other devices on the substrate so that the back gate can be independently biased. In another embodiment the back gate extends to n-type polysilicon layer on an insulator layer on a p-type silicon substrate. A contact to the n-type polysilicon layer allows electrical voltage to be applied to the back gate.Type: GrantFiled: June 21, 2005Date of Patent: August 12, 2008Assignee: International Business Machines CorporationInventors: Brent A. Anderson, Matthew J. Breitwisch, Edward J. Nowak
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Patent number: 7405087Abstract: A magnetic memory device includes a first interconnection which runs in a first direction, a second interconnection which runs in a second direction different from the first direction, a magnetoresistive element which is arranged at the intersection of and between the first and second interconnections, and a metal layer which is connected to the magnetoresistive element and has a side surface that partially coincides with a side surface of the magnetoresistive element.Type: GrantFiled: May 24, 2005Date of Patent: July 29, 2008Assignee: Kabushiki Kaisha ToshibaInventors: Kentaro Nakajima, Keiji Hosotani
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Patent number: 7397101Abstract: A horizontal germanium silicon heterostructure photodetector comprising a horizontal germanium p-i-n diode disposed over a horizontal parasitic silicon p-i-n diode uses silicon contacts for electrically coupling to the germanium p-i-n through the p-type doped and n-type doped regions in the silicon p-i-n without requiring direct physical contact to germanium material. The current invention may be optically coupled to on-chip and/or off-chip optical waveguide through end-fire or evanescent coupling. In some cases, the doping of the germanium p-type doped and/or n-type doped region may be accomplished based on out-diffusion of dopants in the doped silicon material of the underlying parasitic silicon p-i-n during high temperature steps in the fabrication process such as, the germanium deposition step(s), cyclic annealing, contact annealing and/or dopant activation.Type: GrantFiled: July 7, 2005Date of Patent: July 8, 2008Assignee: Luxtera, Inc.Inventors: Gianlorenzo Masini, Lawrence C. Gunn, III, Giovanni Capellini