Patents Examined by Jonathan D. Baskill
  • Patent number: 5180434
    Abstract: In continuous apparatus for the glow discharge deposition of amorphous silicon alloy solar cells of p-i-n-type configuration in a plurality of interconnected, dedicated deposition chambers, a plasma bar operatively disposed between at least the plasma regions in which the layer pairs of amorphous silicon alloy material defining the major semiconductor junction of the solar cell are deposited. The plasma bar is adapted to initiate a plasma so as to prevent chemically adsorbed contaminants from deleteriously affecting the surface of the first deposited of the layer pair, thereby improving the open circuit voltage of the solar cell. In a similar manner, the plasma bar may also be provided between the layer pairs of amorphous silicon alloy material which combine to define the minor semiconductor junction of the solar cell. Finally, a plasma bar may be disposed between the oxide-based layer of a back reflector for reducing oxygen contamination of the silicon alloy material deposited thereupon.
    Type: Grant
    Filed: March 11, 1991
    Date of Patent: January 19, 1993
    Assignee: United Solar Systems Corporation
    Inventors: Gary M. DiDio, Kermit Jones, Kevin Hoffman, Timothy Laarman, Jon Call, Prem Nath