Patents Examined by Julie E Stein
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Patent number: 6996410Abstract: A telecommunication network (TN) comprises a radio access network (2) defining cells in which user equipments (7) are localized and a core network (1) linked to the radio access network and adapted to establish a multimedia broadcast multicast context for the user equipments (7) located in the cells.Type: GrantFiled: June 24, 2003Date of Patent: February 7, 2006Assignee: AlcatelInventors: Lieve Maria Marcella Rosemarijin Bos, Adrianus Johannes Van Ewijk, Laurent Jean André Thiebaut
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Patent number: 6993341Abstract: The present invention is directed to forward link and reverse link diversity in a wireless telecommunications network. The present invention solves the reverse link/forward link dependence between a mobile station and a base station of a network by purposely selecting different base stations or sectors of a base station for reverse-link and forward-link transmissions. In one embodiment, reverse link traffic channel transmissions are targeted to a different base station than the base station from which the forward link traffic channel transmissions originate and respective control information of these channels are embedded or transmitted with the opposite link. Such diversity may be activated only in signal conditions that have a certain predefined value or mobile station locations that exhibit a sufficient chance of experiencing a forward or reverse link failure.Type: GrantFiled: July 3, 2002Date of Patent: January 31, 2006Assignee: Denso CorporationInventor: Jason F. Hunzinger
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Patent number: 6990352Abstract: A method and system for establishing a data connection between two devices over a mobile telecommunications network is provided. A mobile terminal can establish a data connection with a second device by establishing a GPRS connection and obtaining an IP address. The mobile terminal sends an SMS message including its IP address to the second device. The second device also establishes a GPRS connection and obtains an IP address, and then sends a return SMS message including the second device's IP address to the mobile terminal. Once the two devices have exchanged IP address information, they jointly set up a data connection to transfer data, e.g., image files.Type: GrantFiled: October 3, 2002Date of Patent: January 24, 2006Assignee: Nokia CorporationInventors: Seppo Pyhälammi, Jussi Mäki
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Patent number: 6987978Abstract: The disclosed invention makes mobile terminals physically impossible to use in specific spaces without using radio waves of so high intensity as to affect medical devices and without requiring telephone companies that operate wireless communications systems (WCS) to take special measures. Cooperation of a telephone company on the implementation of making mobile terminals physically impossible to use in specific spaces makes mobile terminals provided by the telephone company easy to use. Pseudo signals of downlink pilot signal in WCS are emitted off the pilot timing in specific spaces. Uplink channel radio waves in cooperative telephone compannies' WCS are relayed and communication path is disconnected if the uplink channel radio waves are for communication of an attribute banned in the space. Communication path can be disconnected without increasing the intensity of radio waves so high.Type: GrantFiled: January 7, 2003Date of Patent: January 17, 2006Assignee: Hitachi, Ltd.Inventors: Noboru Masuda, Takashi Yano, Takeshi Kato
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Patent number: 6985735Abstract: Method and system for the planning and/or evaluation of radio networks, especially CDMA radio networks. The service area of a radio network is divided into pixels after which for each pixel a probability is determined whether it is covered by a cell of the radio network. To account for cell breathing due to traffic changes, the planning involves the calculation of a link budget for each pixel and of a noise rise for each cell.Type: GrantFiled: September 9, 2002Date of Patent: January 10, 2006Assignee: Koninklijke KPN N.V.Inventor: Nils Anders Stefan Gustafsson
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Patent number: 6973310Abstract: The mobile station is in the sleep mode until just prior to a designated slot. Upon wakeup, the mobile station ensures a link is maintained with the network by measuring the strength of several pilots. If a neighbor pilot is stronger than the current pilot, a handoff is performed. After handoff, the Control Channel Capsule (CCC) may be demodulated by the mobile station to obtain new overhead information, such as neighbor pilots. If no handoff is performed, the reacquisition slew for the current pilot is measured and fed back to the sleep controller to determine the next wake-up time. The mobile station then returns to sleep mode.Type: GrantFiled: November 11, 2002Date of Patent: December 6, 2005Assignee: Qualcomm Inc.Inventor: Arthur J. Neufeld
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Patent number: 6954650Abstract: A method determines mobility characteristics of a mobile terminal by measuring a first and second angular direction of travel of the mobile terminal at a first and second instant. The first angular direction is subtracted form the second angular direction to determine the directivity of the mobile terminal during an interval of time between the first instant and the second instant. The directivity, in terms of a mean, variance, or histogram can be used to classify the mobile terminal, and location-aware services can be adapted and delivered according to the classification.Type: GrantFiled: July 5, 2002Date of Patent: October 11, 2005Assignee: Mitsubishi Electric Research Labs, Inc.Inventors: Zafer Sahinoglu, Anthony Vetro
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Patent number: 6937854Abstract: An apparatus and method for conducting a conference call between a wireless line and a land line using customer premise equipment, where a cordless telephone device connected to the PSTN includes a wireless telephone cradle for receiving a cellular telephone. Interface circuitry residing in the cordless telephone controls operation of the cordless telephone handset and the cellular handset when positioned in the cradle and connects a first call between a user and a first party via the PSTN and a second call between the user and a second party via the wireless telephone network toward establishing a conference call among the user, the first party and the second party. Echo cancellation and suppression is provided to minimize objectionable echo between the two far end parties.Type: GrantFiled: January 6, 2003Date of Patent: August 30, 2005Assignee: VTech Telecommunications, LimitedInventors: Holger Janssen, Steve Kropp
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Patent number: 6937872Abstract: Methods and apparatuses for frequency synchronizing basestations in a cellular communication system. In one aspect of the invention, a method to predict a timing of transmission of a basestation in a cellular communication system includes: receiving a first time tag for a first timing marker in a first cellular signal transmitted from the basestation; receiving a second time tag of a second timing marker in a second cellular signal transmitted from the basestation; and computing a frequency related to the basestation using the first and second time tags. Each of the time tags are determined using at least one satellite positioning system signal received at a mobile station which receives the corresponding time marker.Type: GrantFiled: July 2, 2002Date of Patent: August 30, 2005Assignee: Qualcomm IncorporatedInventor: Norman F. Krasner
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Patent number: 6931248Abstract: A method for an ATN aeronautical telecommunications network to select ground stations giving access to the ATN terrestrial network, by an aircraft in the course of its task. The method equips the on-board router with a database relating to the ATN network containing a file of ground stations graded as a function of the geographical position of the aircraft on its route prepared during the construction of the flight plan, and provides a link between the on-board router and the navigation equipment of the aircraft, allowing the on-board router to know the position of the aircraft on its route and to use this position to select, from the database, the ground stations having the aircraft in their areas of coverage, with an order of preference determined by the company operating the aircraft. This accelerates the choice of a ground station for access to the ATN terrestrial network, while leaving complete control of this choice to the operating company.Type: GrantFiled: September 28, 2001Date of Patent: August 16, 2005Assignee: ThalesInventor: Matthieu Borel
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Patent number: 5681423Abstract: The present invention is a semiconductor wafer, and a method of fabricating the semiconductor wafer, that reduces dishing over large area features in chemical-mechanical polishing processes. The semiconductor wafer has a substrate with an upper surface, a large area feature formed on the substrate, and a separation layer deposited on the substrate. The separation layer has a top surface and a cavity extending from the top surface towards the upper surface of the substrate. The large area feature is positioned in the cavity of the separation layer, and a support pillar is positioned in the cavity. In one embodiment, the pillar has a base positioned between components of the large area feature and a crown positioned proximate to a plane defined by the top surface of the separation layer. In operation, the pillar substantially prevents the polishing pad of a polishing machine from penetrating into the cavity beyond the top surface of the separation layer.Type: GrantFiled: June 6, 1996Date of Patent: October 28, 1997Assignee: Micron Technology, Inc.Inventors: Gurtej Singh Sandhu, Chris Chang Yu
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Patent number: 5676853Abstract: A mask and a method for forming a mask on a surface of an underlying layer of material used in semiconductor device manufacturing. The mask is a mixture of mask particles and spacer particles. The spacer particles space the mask particles apart from one another to control the distance and the uniformity of the distribution of mask particles across the surface of the underlying layer. The spacer particles and mask particles have different physical properties that allow the spacer particles to be selectively removed from the surface of the underlying layer. The spacer particles are preferably removed from the surface of the underlying layer by selectively etching the spacer particles from the underlying layer. After the spacer particles are removed from the underlying layer, the mask particles remain on the underlying layer to provide spaced apart mask elements on the surface of the underlying layer.Type: GrantFiled: May 21, 1996Date of Patent: October 14, 1997Assignee: Micron Display Technology, Inc.Inventor: James J. Alwan
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Patent number: 5672241Abstract: A method of forming metal contact holes during semiconductor fabrication. The method includes three major steps to form the metal contact holes; a wet isotropic etching process for forming a first recess portion, a dry isotropic etching process for extending the first recess portion into a second recess portion, and a dry anisotropic etching process for forming a third recess portion beneath the second recess portion. The second recess portion and the third recess portion in combination constitute the metal contact hole. The lateral extent of the second recess portion, which in part affects subsequent deposition of metal in the contact hole and thus the step coverage effect of the metal connection, can be controlled by limiting the time of the dry isotropic etching process.Type: GrantFiled: June 12, 1996Date of Patent: September 30, 1997Assignee: Winbond Electronics CorporationInventors: Yu-Chung Tien, Chieh-Lin Huang
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Patent number: 5670018Abstract: A back end of the line dry etch method is disclosed. Etching of a mask oxide and temporary (sacrificial) silicon mandrel occurs following the formation of gate stacks and tungsten studs. The mask oxide is etched selectively to tungsten and silicon through the use of a polymerizing oxide etch. The silicon is etched selectively to both silicon nitride, silicon oxide, and tungsten. The process removes the silicon mandrel and associated silicon residual stringers by removing backside helium cooling, while using HBr as the single species etchant, and by adjusting the duration, the pressure, and the electrode gaps during the silicon etch process. The silicon may be undoped polysilicon, doped polysilicon, or single crystal silicon.Type: GrantFiled: April 27, 1995Date of Patent: September 23, 1997Assignees: Siemens Aktiengesellschaft, International Business Machines CorporationInventors: Elke Eckstein, Birgit Hoffman, deceased, Edward William Kiewra, Waldemar Walter Kocon, Marc Jay Weiss
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Patent number: 5668053Abstract: A method for fabricating a multilayer semiconductor device according to the invention includes the steps of providing a conductive layer on a substrate; forming a barrier layer on the first conductive layer; forming an insulation layer on the barrier layer; selectively etching the insulation layer using the barrier layer as a stopper to form a through-hole; and selectively removing the barrier layer at the bottom of the through-hole from the conductive layer.Type: GrantFiled: December 27, 1994Date of Patent: September 16, 1997Assignee: NEC CorporationInventor: Takeshi Akimoto
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Patent number: 5637189Abstract: A dry etch process for etching a semiconductor substrate having a p-n heterojunction formed by contact between a p-layer and a n-layer requires application of a reverse bias voltage of less than a p-n breakdown voltage across the p-n heterojunction. A plasma containing chemically reactive negative ions is directed against the n-layer, with etching of non-masked regions of the substrate continuing until it is substantially stopped at the reverse biased p-n heterojunction. The semiconductor substrate can be cooled or periodically recoated with erodable protective material to limit sidewall damage to the semiconductor substrate while still allowing downward etching. This dry etch process is well suited for construction of dimensionally accurate microdevices and microelectromechanical systems.Type: GrantFiled: June 25, 1996Date of Patent: June 10, 1997Assignee: Xerox CorporationInventors: Eric Peeters, Joel A. Kubby
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Patent number: 5620611Abstract: Reduced undercutting of a titanium-tungsten layer in a ball limiting metallurgy (BLM) is achieved in the preparation of solder ball interconnect structures by removing metal oxide film which forms on the titanium-tungsten layer and etching the titanium-tungsten layer in different steps. Removing the metal oxide with an acid solution prior to etching the titanium-tungsten layer provides for a more uniform etch of the titanium-tungsten layer.Type: GrantFiled: June 6, 1996Date of Patent: April 15, 1997Assignee: International Business Machines CorporationInventors: Madhav Datta, Thomas S. Kanarsky, Michael B. Pike, Ravindra V. Shenoy