Abstract: An apparatus and method of measuring the thickness of a substrate. A first light is reflected from a standard sample having a known thickness. The light is concentrated through the light-focusing lens. The first light is converted into a first electrical signal by a detector responding to a light intensity of the concentrated first light. A second light is reflected from a substrate, and then is concentrated through the light-focusing lens. The second light is converted into a second electrical signal by the detector responding to a light intensity of the concentrated second light. An operating unit determines first and second peak values from the first and second electrical signals, respectively. The operating unit calculates the thickness of the substrate by using a standard distance corresponding to the first peak value, a moving distance of the substrate corresponding to the second peak value, and the known thickness of the standard sample.

Abstract: Apparatus and techniques for automated optical inspection (AOI) utilizing image scanning modules with multiple objectives for each camera are provided. A scanning mechanism includes optical components to sequentially steer optical signals from each of the multiple objectives to the corresponding camera.

Abstract: Methods and apparatus for monitoring oxygen saturation levels in tissue are disclosed. According to one aspect of the present invention, a sensor arrangement for use in an optical imaging system includes a first source structure, a second source structure, and a detector arrangement. The first source structure provides a first beam of light and the second source structure provides a second beam of light. The detector arrangement includes detector structures that have centerpoints, and receives the first and second beams of light after the first and second beams of light are reflected off of an external surface. The detector arrangement is arranged to define a first axis that passes through the centerpoint of each detector structure, and a distance from a centerpoint of the first source structure to the first axis is not equal to a distance from a centerpoint of the second source structure to the first axis.

Abstract: The invention relates to a three-dimensional measurement system comprising a hardware part and a software part, in which the hardware part includes a mobile two-axis assembly (12) associated with a remote measurement device (13) installed on a fixed part (14), each axis being equipped with an angular encoder (22) restoring the direction of a sighting at any time, and in which the software part includes a control part at the input and an acquisition part at the output.

Abstract: A method for measuring scene inhomogeneity includes the steps of directing radiance of a scene into a dispersive spectrometer, and changing the field-of-view (FOV) of the spectrometer, while directing the radiance of the scene into the spectrometer. The method then processes the radiance of the scene to obtain a signal. The method also includes measuring an amplitude of the signal and determining scene inhomogeneity based on the measured amplitude of the signal. The method may include uniformly oscillating the FOV of the spectrometer and, next, obtaining a sinusoidal signal, based on uniformly oscillating the FOV of the spectrometer.

Abstract: An optical metrology model for a repetitive structure is optimized by selecting one or more profile parameters using one or more selection criteria. One or more termination criteria are set, the one or more termination criteria comprising measures of stability of the optical metrology model. The profile shape features of the repetitive structure are characterized using the one or more selected profile parameters. The optical metrology model is optimized using a set of values for the one or more selected profile parameters. One or more profile parameters of the profile of the repetitive structure are determined using the optimized optical metrology model and one or more measured diffraction signals. Values of the one or more termination criteria are calculated using the one or more determined profile parameters.

Abstract: A particle detecting method which is capable of detecting the number of low-speed particles accurately, and a storage medium storing a program for implementing the method. Intensity of scattered light generated when a light emitted into a gas stream is scattered by a particle is measured using a light receiving sensor at predetermined time intervals. A measuring time period for measuring the scattered light intensity is divided into measurement periods each defined as a predetermined time period, and a measured time point in each measurement period is selected at which a maximum value of the scattered light intensity measured is measured. The number of particles having passed by in front of the light receiving sensor is counted based on the measured time point selected in each measurement period.

Abstract: A surface plasmon resonance imaging system (40) and method is provided. The system (40) includes a light source (42) comprising a light-emitting diode (LED) array that is positioned at the focal point of a collimating lens (44). The light source (42) and collimating lens (44) are used to illuminate the substrate surface (50) at a range of angles dependent upon which one or more LEDs are lit. The substrate surface (50) receives light from the collimated lens (44) at a selected incident angle, which can be varied by selective illumination of one or more of the LEDs in the LED array. The system (40) further includes a detector (60) that is positioned such that it is capable of detecting an image reflected from the substrate surface (50).

Abstract: The present invention is a system and method of conditioning the sample and surrounding environment of an exhaled breath sensor. It includes (i) using a particular molecular sieve for a triple purpose: (a) maintaining the sensor at a constant relative humidity during storage, (b) equilibrating the incoming breath stream to the same relative humidity as the sensor, and (c) eliminating the analyte from the environment around the sensor during storage. The present invention also includes removal of interfering components from the exhaled breath, such as carbon dioxide, as well as a thermal management technique.

Abstract: An improved laser scanning apparatus (46) for determining frame or unibody alignment or misalignment of a vehicle (40) is provided, which includes a laser assembly (54), a pair of rotatable mirror assemblies (56,58) and laser detectors (114,116) located within an enclosed housing (50,52). The laser assembly (54) has an upper pair of lasers (122,126) located in known, spaced relationship above a lower pair of lasers (124,128); detector assemblies (114, 116) are also provided including substantially parabolic reflective surfaces (118a, 120a) with detectors (114a, 116a) disposed substantially at the focal point of the surfaces (118a, 120a). The apparatus (46) is used in conjunction with a plurality of individually coded reflective targets (44) which are suspended from known reference points on the vehicle (40).

Abstract: According to a first embodiment of the invention, a first and second reticle are used to form layers using a photolithographic process. The first and second reticles each include a grating positioned so that when the reticles are printed, the two gratings will at least partially overlap each other. The two gratings produce an interference pattern, which is used to measure overlay error.

Abstract: An optical arrangement and method of filtering include a beam splitter that accepts an incident beam and transmits light from the incident beam of a first polarization and reflects light from the incident beam of a second polarization. The transmitted light is a first beam and the reflected light is a second beam. A first spectral filter, receives the first beam, reflects a first spectral band of the first beam, and transmits the remainder of the first beam. A second spectral filter receives the remainder of the first beam and reflects a second spectral band of the first beam. The first and second spectral filters can also receive the second beam and reflect similar first and second spectral bands. The spectral bands are then returned to the beam splitter, where they may be directed toward a dispersal element or an array of photodetectors.

Abstract: The optical object discriminating device includes a light projecting part which applies light, which is emitted from a semiconductor light emitting element, to a measuring object which is an object to be measured, and a light receiving part which receives reflected light reflected by the measuring object. Between the light receiving part and the measuring object is placed a polarization-state selector part which permits polarized light of a specified polarization direction to pass therethrough. A signal processing part processes a signal outputted by the light receiving part, and measures intensity of light of the polarization direction permitted by the polarization-state selector part to pass therethrough.

Abstract: A validating machine 30 according to the present invention is provided with a validation sensor 2 having a first-side light emitting device 8 and a first-side light receiving device 10 disposed closely to each other and a validation sensor 2? having a second-side light emitting device 8? and a second-side light receiving device 10? disposed closely to each other so that the validation sensor 2 and the validation sensor 2? are disposed opposite to each other on a first side and on a second side of a bill 4. The first-side light emitting device 8 and the second-side light emitting device 8? are controlled so as to emit light at their respective emission timings different from each other.

Abstract: Fourier filters and wafer inspection systems are provided. One embodiment relates to a one-dimensional Fourier filter configured to be included in a bright field inspection system such that the bright field inspection system can be used for broadband dark field inspection of a wafer. The Fourier filter includes an asymmetric illumination aperture configured to be positioned in an illumination path of the inspection system. The Fourier filter also includes an asymmetric imaging aperture complementary to the illumination aperture. The imaging aperture is configured to be positioned in a light collection path of the inspection system such that the imaging aperture blocks light reflected and diffracted from structures on the wafer and allows light scattered from defects on the wafer to pass through the imaging aperture.

Abstract: An optical monitoring system for monitoring thin film deposition on a substrate includes a support bridge that is attached on an inside of a deposition chamber. The system further includes a fiber optic collimator having an optical fiber for incoming light, and another fiber optic collimator having an optical fiber for transmitted or reflected light from the substrate. The system further includes a shutter that is closed when a desired thin film thickness is deposited on the substrate.

Abstract: Disclosed is an apparatus and method for a compact, rugged, and inexpensive spectrometer that will make possible a range of new applications for optical spectroscopy including point-of-care medical devices, personal monitors, and ubiquitous environmental sensing. Embodiments of the disclosure include silicon photodetectors where incident light passes through a layer of an inexpensive, absorbing thin film. In one embodiment, one or more photodetectors may be used where a series of absorbing thin film layers are passed over the photodetectors. In another embodiment, an absorbing thin film layer is placed over one or more photodetectors where the absorptivity of the thin film layer is different for each photodetector.

Abstract: A method of selection of an illuminator for use in an accelerated light stability test device chamber is described that employs measuring and comparing the spectral irradiance of at least one light source for use in an illuminated device and at least one illuminator suitable for use in an accelerated weathering chamber and selecting an illuminator having certain irradiance criteria. Also described are methods of accelerated light stability testing of an illuminated display components and an accelerated light stability tcst device.

Abstract: In a flatness measurement apparatus, a sensor unit having a flatness-detection sensor is slidable along the linear guide rail. A support system supports the linear guide rail such that the linear guide rail is rotatable in a horizontal plane, whereby a surface of a wafer stage to be measured is scanned all over with the sensor unit having the flatness-detection sensor so as to ensure a flatness measurement of the whole surface of the wafer stage.

Abstract: An imaging apparatus for obtaining spectral image data from an object that includes: a) a light source; b) an input optics section; c) a programmable spectral filter that conditions the multispectral image bearing light according to a predetermined spectral transmission function; d) a detector array in the path of the conditioned multispectral image bearing light and providing a corresponding output signal; and, e) a control logic processor in communication with the spatial light modulator for modulating addressable areas of the spatial light modulator to provide the spectral transmission function thereby.