Patents Examined by Leigh Marle Garbowski
  • Method of compensating photomask data for the effects of etch and lithography processes
    Patent number: 7600212
    Abstract: A method for synthesizing a photomask data set from a given target layout, including the following steps: (a) providing a set of target polygons for the target layout; (b) fitting a smooth curve to a target polygon of the set of target polygons, the curve having a set of etch-target points; (c) moving the etch target points according to a model of an etch process to produce a set of lithography-target points; and (d) synthesizing a photomask data set based on a model of a lithography process and the set of lithography-target points.
    Type: Grant
    Filed: October 2, 2006
    Date of Patent: October 6, 2009
    Assignee: Cadence Design Systems, Inc.
    Inventors: Franz X. Zach, Jesus Carrero, Bayram Yenikaya, Gokhan Percin, Xuelong Cao, Abdurrahman Sezginer