Patents Examined by Marle R. Buscher
  • Positive photoresist containing a mixture of propylene glycol alkyl ethers and propylene glycol alkyl ether acetate
    Patent number: 5039594
    Abstract: The invention provides a positive working photosensitive element with improved odor and increased photospeed which comprises coating a formulation containing at least one novolak or polyvinyl phenol resin, at least one o-quinone diazide and a solvent mixture comprising propylene glycol alkyl ether and propylene glycol alkyl ether acetate, onto a substrate, drying, exposing to imaging energy and developing.
    Type: Grant
    Filed: June 6, 1990
    Date of Patent: August 13, 1991
    Assignee: Hoechst Celanese Corporation
    Inventor: Dana Durham