Abstract: The present disclosure provides a method for lithography patterning in accordance with some embodiments. The method includes forming a photoresist layer over a substrate; performing an exposing process to the photoresist layer; and developing the photoresist layer, thereby forming a patterned photoresist layer. The photoresist layer includes a polymer backbone, an acid labile group (ALG) bonded to the polymer backbone, a first sensitizer that is bonded to the polymer backbone, a second sensitizer that is not bonded to the polymer backbone, and a photo-acid generator (PAG).

Abstract: The invention relates to a photopolymer formulation comprising specific aromatic glycol ethers as writing monomers, matrix polymers and a photoinitiator. The invention further provides an unexposed holographic medium obtainable using an inventive photopolymer formulation, and an exposed holographic medium obtainable by exposing a hologram into an inventive unexposed holographic medium. The invention likewise provides a visual display comprising an inventive exposed holographic medium, for the use of an inventive exposed holographic medium for production of chip cards, identification documents, 3D images, product protection labels, labels, banknotes or holographic optical elements, and specific aromatic glycol ethers.

Abstract: A nonlinear optical dye includes a compound represented by the general formula (1) below. In the above general formula (1), each of X1, X2, X3 and X4 independently represents a hydrogen atom, an alkyl group having a carbon number of 1 to 6, a halogen atom, a hydroxyl group, a nitro group, a cyano group, or a methylsulfonyl group. In the present invention, it is preferred that each of X1, X2, X3 and X4 independently represents a hydrogen atom, an alkyl group having a carbon number of 1 to 6, or a halogen atom. In the present invention, it is also preferred that the nonlinear optical dye has a dipole moment of 2.1 D or less and a maximum absorption wavelength within a range of 315 to 360 nm.

Abstract: The present invention provides a compound shown by the formula (1), wherein R1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; A represents a single bond or a linear divalent hydrocarbon group having 1 to 30 carbon atoms or a branched or cyclic divalent hydrocarbon group having 3 to 30 carbon atoms, in which the hydrocarbon group may contain a heteroatom, and a part or all of hydrogen atoms in the hydrocarbon group may be substituted with a group containing a heteroatom; “n” represents 0 or 1, provided that “n” is 0 when A is a single bond; and M+ represents a cation. This compound is suitable as a raw material of a polymer compound usable for a base resin of a resist composition that has high resolution and high sensitivity and is excellent in balance of lithography properties such as LWR and CDU.

Abstract: A polymeric compound including a structural unit (a0) represented by general formula (a0-1) shown below and a polycyclic group-containing structural unit (a2m) other than the structural unit (a0), the structural unit (a2m) containing a lactone-containing polycyclic group, a —SO2-containing polycyclic group or a carbonate-containing polycyclic group, and a resist composition including the same: wherein R0 represents a hydrocarbon group of 1 to 6 carbon atoms which may have a substituent, or a hydrogen atom; Ya0 represents a single bond or a divalent linking group; L represents an ester bond; and Ra0 represents a polycyclic group having a bridged ring polycyclic skeleton or a condensed ring polycyclic skeleton, which has in its skeleton —C(?O)O— or —SO2—, and at least one of an alkyl group, an alkoxy group, a halogen atom and a halogenated alkyl group.

Abstract: A salt represented by formula (I): wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, R1 and R2 in each occurrence independently represent a hydrogen atom, a fluorine atom or a C1 to C6 perfluoroalkyl group, z represents an integer of 0 to 6, X1 represents *—CO—O—, *—O—CO— or —O—, * represents a binding position to C(R1)(R2) or C(Q1)(Q2), A1 represents a C4 to C24 hydrocarbon group having a C4 to C18 divalent alicyclic hydrocarbon moiety, A2 represents a C2 to C12 divalent hydrocarbon group, R3 and R4 independently represent a hydrogen atom or a C1 to C6 monovalent saturated hydrocarbon group, R5 represents a hydrogen atom, a fluorine atom, or a C1 to C6 alkyl group where a hydrogen atom may be replaced by a fluorine atom, and Z+ represents an organic cation.

Abstract: Provided is a photopolymer composition that may exhibit low volume shrinkage during holographic recording and may prevent a photosensitive dye from remaining unbleached after holographic recording.

Abstract: A polymer includes a first moiety represented by Chemical Formula 1, and a second moiety including a substituted or unsubstituted C6 to C60 cyclic group, a substituted or unsubstituted C6 to C60 hetero cyclic group, or a combination thereof: In Chemical Formula 1, X is phosphorus (P), nitrogen (N), boron (B), or P?O, Y1 and Y2 are independently hydrogen or a moiety including at least one substituted or unsubstituted benzene ring, provided that at least one of Y1 and Y2 is the moiety including at least one substituted or unsubstituted benzene ring, Y3 is another moiety including at least one substituted or unsubstituted benzene ring, and * is a linking point.

Abstract: Methods and materials for patterning a substrate are disclosed herein. A poly(thioaminal) material may be utilized as a thermal resist material for patterning substrates in a thermal scanning probe lithography process. The poly(thioaminal) material may be functionalized with an electron withdrawing group and various monomers may be volatilized upon exposure to a thermal scanning probe.

Abstract: A method of forming a resist pattern including forming a first resist pattern on a substrate; applying a cross-linking composition so as to cover the first resist pattern; heating the covered first resist pattern and crosslinking an isocyanate group in the cross-linking composition with the first resist pattern; and developing the covered first resist pattern, wherein the cross-linking composition includes a blocked isocyanate compound having a protected isocyanate group.

Abstract: A liquid solder resist composition contains a carboxyl group-containing resin, a photopolymerizable compound containing at least one compound selected from a group consisting of a photopolymerizable monomer and a photopolymerizable prepolymer, a photopolymerization initiator, and a titanium dioxide. The photopolymerization initiator contains a bisacylphosphine oxide-based photopolymerization initiator, a first ?-hydroxyalkyl phenone-based photopolymerization initiator that is a liquid at 25° C., and a second ?-hydroxyalkyl phenone-based photopolymerization initiator that is a solid at 25° C.

Abstract: The material for forming an underlayer film for lithography of the present invention contains a compound represented by the following general formula (1). (in formula (1), each X independently represents an oxygen atom or a sulfur atom, R1 represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom or an aromatic group having 6 to 30 carbon atoms, and each R2 independently represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, provided that at least one R2 represents a hydroxyl group, each m is independently an integer of 1 to 4, n is an integer of 1 to 4, and p is 0 or 1.

Abstract: Provided is a compound containing a phenolic hydroxy group which has excellent heat resistance, a resist composition which has excellent thermal decomposition resistance, optical sensitivity and resolution, and a composition for a resist underlayer coating which has excellent thermal decomposition resistance and dry etching resistance. The compound containing a phenolic hydroxy group has a molecular structure represented by Structural Formula (1) below: wherein R1 is a hydrogen atom, an alkyl group or an aryl group, n is an integer of 2 to 10, R2 is any one of an alkyl group, an alkoxy group, an aryl group, an aralkyl group and a halogen atom, m is an integer of 0 to 4, and when m is 2 or greater, a plurality of R2's may be the same as or different from each other and may be bonded to either one of two aromatic rings of the naphthylene skeleton.

Abstract: In making an optical component, one or more portions of a substrate's surface are patterned. At least a region of the substrate's surface is coated in negative photoresist, the region encompassing said portions. The negative photoresist becomes undevelopable when exposed to light. Light which forms a grating structure is projected over each of the portions. Light of substantially uniform intensity over the entirety of the region but for the portions, thereby leaving the negative photoresist outside of the portions undevelopable. The negative photoresist is developed so as to embody the grating structure in the photoresist covering the portions. The substrate's surface is patterned to impose the grating structure on the substrate's surface from the developed photoresist; the undevelopable photoresist inhibits patterning of the surface region outside of the portions. The optical component comprises the patterned substrate.

Abstract: The invention pertains in a first aspect to a multilayer film that includes a frangible holographic image layer and an adhesive layer adjacent to a side of the holographic image layer; and, an additional temporary support layer that is adjacent a side of the holographic image layer that is opposite the adhesive layer, and provides integrity to the multilayer film. The additional temporary support layer can be a polyester film that is removable from the multilayer film at ?10 gram per inch peel strength; or, can be a heat-shrinkable film that is removable from the multilayer film with the application of heat. After application of the multilayer film to a substrate, the holographic image layer forms an exterior surface of the multilayer film.

Abstract: A set of laminates includes an outer laminate and an inner laminate, wherein the outer laminate includes a transparent polymeric support including on a first side of the support a color laser markable layer containing an infrared dye having an absorption maximum ?max(IR-1) in the infrared region; wherein the inner laminate includes a transparent polymeric support including on, a first side of the transparent polymeric support, a color laser markable layer containing an infrared dye having an absorption maximum ?max(IR-2) in the infrared region and, on a second side of the transparent polymeric support, a color laser markable layer containing an infrared dye having an absorption maximum ?max(IR-3) in the infrared region; and the conditions a) and b) are satisfied: ?max(IR-1)>?max(IR-2)>?max(IR-3); and??a) ?max(IR-1)>1100 nm and ?max(IR-3)<1000 nm.

Abstract: The material for forming an underlayer film for lithography of the present invention contains a compound having a structure represented by the following general formula (1). (in formula (1), each X independently represents an oxygen atom or a sulfur atom, R1 represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom or an aromatic group having 6 to 30 carbon atoms, R2 represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, m is an integer of 0 to 3, n is an integer of 1 to 4, p is 0 or 1, and q is an integer of 1 to 100.).

Abstract: The present invention provides a novel photopolymer formulation comprising matrix polymers, writing monomer and a photoinitiator and further comprising a compound of formula (1) where A1, A2 and A3 are each independently hydrogen, fluorine, chlorine, bromine or iodine, R1, R2, R3, R4 and R5 are each independently hydrogen, halogen, cyano, nitro, amino, alkylimino, azide, isonitrile, enamino, formyl, acyl, carboxyl, carboxylate, carboxamide, orthoester, sulphonate, phosphate, organosulphonyl, organosulphoxidyl, optionally fluorinated alkoxy or an optionally substituted aromatic, heteroaromatic, aliphatic, araliphatic, olefinic or acetylenic radical while suitable radicals may be connected together via bridge of any desired substitution, or in that two or more compounds of formula (I) may be connected together via at least one of the radicals R1, R2, R3, R4 and R5, in which case these radicals therein constitute a 2- to 4-tuply functional bridge, with the proviso that at least one of the radicals R1, R2, R3

Abstract: A pattern forming process is provided comprising the steps of applying a resist composition comprising a polymer comprising recurring units having formula (1a) and/or (1b), an acid generator and a solvent onto a substrate, baking to form a resist film, exposing the resist film to high-energy radiation, baking, and developing in an alkaline developer to form a negative tone pattern.

Abstract: A recording material includes a dye-bonded polymer compound which contains a polymer compound to which a one-photon absorption dye is bonded, and a glass transition temperature of the recording material is higher than 200° C. An optical information recording medium includes a recording layer and an intermediate layer adjacent to the recording layer, and the recording layer contains the above-described recording material.