Patents Examined by Martin Angerbranndt
  • Patent number: 9633848
    Abstract: Disclosed is a photosensitive resin composition comprising (A) an alkali-soluble resin having a structural unit represented by the following formula (1), (B) a compound that generates an acid by light, (C) a thermal crosslinking agent, and (D) an acryl resin having a structural unit represented by the following formula (2): wherein R1 represents a hydrogen atom or a methyl group; R2 represents an alkyl group having 1 to 10 carbon atoms, or the like; and a represents an integer of 0 to 3, b represents an integer of 1 to 3, and the total of a and b is 5 or less, and wherein R3 represents a hydrogen atom or a methyl group; and R4 represents a hydroxyalkyl group having 2 to 20 carbon atoms.
    Type: Grant
    Filed: October 9, 2013
    Date of Patent: April 25, 2017
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Yu Aoki, Shigeru Nobe, Hiroshi Matsutani, Kei Kasuya, Akitoshi Tanimoto, Shingo Tahara
  • Patent number: 9620378
    Abstract: A composition comprises: a compound having one partial structure represented by formula (1), and a solvent. n1 and n2 are each independently an integer of 0 to 2; and k1 and k2 are each independently an integer of 0 to 9. The compound preferably has an intermolecular bond-forming group. The compound is preferably represented by formula (2). Z represents the partial structure represented by the formula (1); Ar1 and Ar2 represent a substituted or unsubstituted arenediyl group having 6 to 20 carbon atoms; Ar3 and Ar4 represent a substituted or unsubstituted aryl group having 6 to 20 carbon atoms; and p1 and p2 are each independently an integer of 0 to 3.
    Type: Grant
    Filed: December 24, 2015
    Date of Patent: April 11, 2017
    Assignee: JSR CORPORATION
    Inventors: Shin-ya Nakafuji, Goji Wakamatsu, Tsubasa Abe, Kazunori Sakai
  • Patent number: 9448475
    Abstract: A photoresist composition comprising a resin having an acid-labile group, an acid generator, and a compound represented by formula (I0).
    Type: Grant
    Filed: February 18, 2015
    Date of Patent: September 20, 2016
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro Masuyama, Takahiro Yasue, Koji Ichikawa
  • Patent number: 8703363
    Abstract: A method is described for recording a volume reflection holographic image that is viewable when illuminated by light at a wavelength Wv.
    Type: Grant
    Filed: February 16, 2011
    Date of Patent: April 22, 2014
    Assignee: Sabic Innovative Plastic IP B.V.
    Inventors: Michael T. Takemori, Andrew A. Burns, Mark A. Cheverton, Sumeet Jain, Sora Kim
  • Patent number: 7141336
    Abstract: Disclosed is a hologram transfer film which can realize easy and good transfer of a hologram and, at the same time, can realize stable transfer of the hologram in a transfer process. The hologram transfer film comprises: a substrate film; and a transfer layer provided on the substrate film, the transfer layer comprising a hologram-forming layer and a heat-sensitive adhesive layer provided in that order on the substrate film, the hologram-forming layer having a breaking strain of 0.5 to 15% at 25° C. and a breaking strain of 0.5 to 30% at 120° C.
    Type: Grant
    Filed: October 8, 2002
    Date of Patent: November 28, 2006
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Satoshi Shioda, Mikiko Hojo, Hiroyuki Otaki, Kenji Ueda, Tetsuya Toshine
  • Patent number: 6790592
    Abstract: A phase-change optical information recording medium capable of recording information therein, reproducing recorded information therefrom, rewriting recorded information, and erasing recorded information therefrom, which phase-change optical information recording medium is provided with a recording layer containing therein a phase-change recording material including Ge, Ga, Sb, Te, and one element selected from the group consisting of Mg and Ca, which recording material is capable of performing a reversible phase transition from a noncrystalline phase to a crystalline phase and vice verse with the application of an electromagnetic wave thereto.
    Type: Grant
    Filed: September 14, 2001
    Date of Patent: September 14, 2004
    Assignee: Ricoh Company, Ltd.
    Inventors: Makoto Harigaya, Katsuhiko Tani, Noriyuki Iwata, Kazunori Ito, Hajime Yuzurihara, Eiko Hibino, Hiroko Ohkura, Nobuaki Onagi, Hiroshi Miura, Yoshiyuki Kageyama
  • Patent number: 5633100
    Abstract: This invention relates to a process for forming a reflection hologram. A process for forming a volume reflection hologram is provided wherein the formation of secondary holograms is suppressed by the placement of index matched filters contiguous to at least one surface of the photosensitive recording element during formation of the hologram.
    Type: Grant
    Filed: November 27, 1991
    Date of Patent: May 27, 1997
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Daniel J. Mickish, Steven R. MacKara, Torence J. Trout