Abstract: Tapered optical waveguides (33') can be easily made by using photolithographic masking and etching to define on a substrate (21) a first polymer structure (22) having a substantially uniform thickness and a tapered width. The first polymer structure is heated sufficiently to form a meniscus along its entire length. The fluidity causes the material to redistribute itself such that, rather than being of uniform thickness, it has a thickness that varies with its width; consequently, the thickness as well as the width of the first polymer structure becomes tapered. The first polymer is cooled and hardened to form a second polymer structure (22') that has a tapered width and a tapered thickness as is desirable for a tapered optical waveguide. The second polymer structure itself can be used as a tapered optical waveguide, or it can be used to control the reactive ion etching of the underlying substrate.
Type:
Grant
Filed:
December 13, 1993
Date of Patent:
August 8, 1995
Assignee:
AT&T Corp.
Inventors:
William H. Haemmerle, William M. MacDonald, Casimir R. Nijander, Joseph Shmulovich, Wesley P. Townsend, Yiu-Huen Wong