Abstract: A nozzle head NH of a plasma processing apparatus comprises an annular inner holder 3, an annular inner electrode 11 surrounding this holder 3, an annular outer electrode 21 surrounding this electrode 11, and an annular outer holder 4 surrounding this electrode 21. The inner holder 3 is provided with a plurality of bolts 7 spacedly arranged in the peripheral direction and adapted to push the inner electrode 11 radially outwardly. The outer holder 4 is provided with a plurality of bolts 8 spacedly arranged in the peripheral direction and adapted to push the outer electrode 21 radially inwardly. Owing to this arrangement, the operation for disassembling, assembling and centering the annular electrodes 11, 21 can be carried out with ease.

Abstract: The barrel type susceptor for use in the semiconductor epitaxial growth is characterized in that a face plate 5 of a susceptor main body 2 having the shape of a truncated cone is partitioned into two or more in a longitudinal direction thereof, each partition being provided with a wafer mounting concave portion 6a, 6b, 6c on which a wafer is laid, and the inclination angle ?a, ?b, ?c of a bottom face 6a1, 6b1, 6c1 of the concave portion for each partition to the vertical line is gradually decreased in each partition from the upper part to the lower part.