Abstract: Methods of forming a near field transducer (NFT), the methods including the steps of depositing plasmonic material on a substrate; laser annealing at least a portion of the deposited plasmonic material at a wavelength from 100 nm to 2.0 micrometers (?m) to induce liquid phase epitaxy (LPE) in the annealed deposited plasmonic material to form a epitaxially modified plasmonic material; and forming a NFT from at least a portion of the epitaxially modified plasmonic material are disclosed as well as other methods and devices such as those formed.

Abstract: A display device according to one or more exemplary embodiments of the present invention includes: a display panel; a window on the display panel; an active surface layer on the window; and a hard coating layer on the active surface layer and having a curved surface.

Abstract: A chemical vapor deposition method for producing a dielectric film, the method comprising: providing a substrate into a reaction chamber; introducing gaseous reagents into the reaction chamber wherein the gaseous reagents comprise a silicon precursor comprising an silicon compound having Formula I as defined herein and applying energy to the gaseous reagents in the reaction chamber to induce reaction of the gaseous reagents to deposit a film on the substrate. The film as deposited is suitable for its intended use without an optional additional cure step applied to the as-deposited film.

Abstract: The present invention relates to a method for synthesizing and collecting, in a single step, nanoparticles of different materials, and for producing coatings thereof on materials with simple or complex geometries, both in a controlled atmosphere and in ambient conditions, by means of the combined application of a laser beam and high-intensity electric fields.

Abstract: A production method of a semiconductor device includes introducing a reduction gas for reducing metal to a space containing a target to be used as the semiconductor device. The method also includes introducing a material gas and a first gas simultaneously to the space on a basis of a predetermined partial pressure ratio after introducing the reduction gas, to form a film that contains the metal, on the target. The material gas etches the metal when only the material gas is flowed. The first gas is different from the material gas. The predetermined partial pressure ratio is a ratio of the material gas and the first gas.

Abstract: A process for producing doped nanoparticles, in particular for N-doped nanoparticles, includes a hydrothermal process using an organic nitrogen-containing compound or a mineral acid having at least one nitrogen atom. In particular, the photocatalytically active particles produced are characterized by a particularly high activity even in visible light.

Abstract: A method and apparatus for positioning and heating a substrate in a chamber are provided. In one embodiment, the apparatus comprises a substrate support assembly having a support surface adapted to receive the substrate and a plurality of centering fingers for supporting the substrate at a distance parallel to the support surface and for centering the substrate relative to a reference axis substantially perpendicular to the support surface. The plurality of the centering fingers are movably disposed along a periphery of the support surface, and each of the plurality of centering fingers comprises a first end portion for either contacting or supporting a peripheral edge of the substrate.

Abstract: A pattern forming method comprising, a step (1) of coating a layer formed of a curable composition (A1) containing at least a certain polymerizable compound (a1) on a surface of a substrate, a step (2) of dispersedly dropping a droplet of a curable composition (A2) containing at least a polymerizable compound (a2) on the layer of the curable composition (A1) to form lamination, a step (3) of sandwiching between a mold and the substrate a layer in which the curable composition (A1) and the curable composition (A2) are partially mixed, a step (4) of curing a portion of the layer in which the two curable compositions are partially mixed all at once by applying light from the side of the mold, the portion being sandwiched between the mold and the substrate, and a step (5) of separating the mold from the layer formed of the cured curable compositions.

Abstract: A pre-drying processing liquid containing a sublimable substance that changes to gas without passing through to a liquid and a solvent in which the sublimable substance dissolves is supplied to a front surface of a substrate on which a pattern has been formed. Thereafter, the solvent is evaporated from the pre-drying processing liquid on the front surface of the substrate to thereby form a solidified body containing the sublimable substance on the front surface of the substrate. Thereafter, the solidified body is sublimated and thereby removed from the front surface of the substrate. A value acquired by multiplying a ratio of the thickness of the solidified body to the height of the pattern by 100 is greater than 76 and less than 219.

Abstract: Embodiments relate to a method of manufacturing pinned nano-structures with tailored gradient properties. First and second compositions are provided, Each of the compositions includes a nano-structural material, a plurality of grain growth inhibitor nano-particles, and at least one of a tailoring solute and a plurality of tailoring nano-particles. Deposition layers are formed proximal to a substrate with each of the compositions through electrospray techniques.

Abstract: Provided are a method of producing a nano composite structure and a nano composite structure produced by using the same. The method comprises producing a substrate; placing a metal net structure above the substrate; and plasma treating the substrate above which the metal net structure is placed. The nano composite structure includes a substrate having a plurality of first protrusions constituting a nano pattern on its surface; and an inorganic particle disposed on an end of at least a portion of the first protrusions.

Abstract: A system in a water body uses buoyant force of gaseous Hydrogen and Oxygen to generate electrical power with one or more turbines that includes power resulting from the buoyant force while transporting the Hydrogen or Oxygen to a higher elevation, without loss of electrons, for conversion to electricity at the higher elevation. Conversion of Hydrogen and Oxygen to water through a Hydrogen Fuel Cell or by burning at the higher elevation may generate additional steam power, hydropower, or purified water. Portable submersible modules may transport the system below or above the water to and from the base of a plumbing portion of the system. The amount of gaseous fuel energy available at the higher elevation is not detrimentally impacted by the generation of electricity by the turbine.

Abstract: A laminate includes a substrate made of an organic polymer having a functional group containing an oxygen atom or a nitrogen atom, a functional layer bonded to the functional group of the organic polymer contained in the substrate and formed by an atomic layer deposition process, and an overcoat layer provided to cover the functional layer and containing transition metal atoms. Because the adhesion between the substrate and the functional layer is improved and the functional layer is protected by the overcoat layer, it is possible to achieve both improved gas barrier properties and/or improved durability against an environmental stress such as heat, humidity and the like.

Abstract: Provided is a method of manufacturing a mask includes preparing a first conductive layer. The first conductive layer includes a third portion having a mesh shape in a plurality of cell regions on a substrate, a second portion disposed between the cell regions, and a first portion surrounding the third portion and the second portion. The method further includes preparing a second conductive layer including at least one opening on the first conductive layer. The method also includes oxidizing a part of the first conductive layer exposed through the at least one opening of the second conductive layer. The method further includes preparing a plating layer on the first conductive layer and the second conductive layer, and removing the first conductive layer and the second conductive layer from the plating layer.

Abstract: A coating method includes: forming multiple through holes in a coating film including a support sheet and a transfer layer on the support sheet, the multiple through holes passing through only the transfer layer; after the forming of the multiple through holes, disposing the coating film so that the transfer layer faces a surface of a target object; pressing the coating film against the surface of the target object from a side of the support sheet so that the transfer layer is transferred to the surface of the target object; and, after the pressing, peeling off the support sheet from the transfer layer.

Abstract: A method for manufacturing a solid-state battery device. The method can include providing a substrate within a process region of an apparatus. A cathode source and an anode source can be subjected to one or more energy sources to transfer thermal energy into a portion of the source materials to evaporate into a vapor phase. An ionic species from an ion source can be introduced and a thickness of solid-state battery materials can be formed overlying the surface region by interacting the gaseous species derived from the plurality of electrons and the ionic species. During formation of the thickness of the solid-state battery materials, the surface region can be maintained in a vacuum environment from about 10?6 to 10?4 Torr. Active materials comprising cathode, electrolyte, and anode with non-reactive species can be deposited for the formation of modified modulus layers, such a void or voided porous like materials.

Abstract: The present disclosure may be embodied as a method for creating a restriction pattern from a mask material having a strain (?mask) an for mapping elastomeric membrane having a strain (?membrane) into a target 3D shape. The method may include discretizing the target 3D shape into a plurality of radial segments, and a radial strain (?r) is determined for each radial position (r) on each radial segment of the plurality of radial segments. A restriction pattern is determined, wherein the restriction pattern comprises a quantity of mask material for each position r to provide a composite strain (?mask, ?silicone). In some embodiments, the method further includes depositing a first membrane layer into a mold and placing mask material into the first membrane layer according to the determined restriction pattern. The first membrane layer is cured.

Abstract: A method for adjusting a position of a showerhead in a processing chamber includes arranging a substrate that includes a plurality of mandrels on a substrate support in the processing chamber and adjusting a position of the showerhead relative to the substrate support. Adjusting the position of the showerhead includes adjusting the showerhead to a tilted position based on data indicating a correlation between the position of the showerhead and azimuthal non-uniformities associated with etching the substrate. The method further includes, with the showerhead in the tilted position as adjusted based on the data, performing a trim step to etch the plurality of mandrels.

Abstract: A method for depositing a silicon nitride film is provided to fill a recessed pattern formed in a surface of a substrate with a silicon nitride film. In the method, a first silicon nitride film is deposited in the recessed pattern formed in the surface of the substrate. The first silicon nitride film has a V-shaped cross section decreasing its film thickness upward from a bottom portion of the recessed pattern. A second silicon nitride film conformal to a surface shape of the first silicon nitride film is deposited.

Abstract: According to a method set forth herein a plurality of preform plies having first and second preform plies can be associated together to define a preform. The preform can be subject to chemical vapor infiltration (CVI) processing to define a ceramic matrix composite (CMC) structure.