Patents Examined by Nicholas A. Smith
  • Patent number: 11974512
    Abstract: A preparation method of a silicon-based molecular beam heteroepitaxy material, a memristor, and use thereof are provided. A structure of the heteroepitaxy material is obtained by allowing a SrTiO3 layer, a La0.67Sr0.33MnO3 layer, and a (BaTiO3)0.5—(CeO2)0.5 layer to successively grow on a P-type Si substrate. The silicon-based epitaxy structure is obtained by allowing a first layer of SrTiO3, a second layer of La0.67Sr0.33MnO3, and a third layer of (BaTiO3)0.5—(CeO2)0.5 (in which an atomic ratio of BaTiO3 to CeO2 is 0.5:0.5) to successively grow at a specific temperature and a specific oxygen pressure. The preparation method of a silicon-based molecular beam heteroepitaxy material adopts pulsed laser deposition (PLD), which is relatively simple and easy to control, and can achieve the memristor function and neuro-imitation characteristics. A thickness of the first buffer layer of SrTiO3 can reach 40 nm.
    Type: Grant
    Filed: February 18, 2022
    Date of Patent: April 30, 2024
    Assignee: Hebei University
    Inventors: Xiaobing Yan, Haidong He, Zhen Zhao
  • Patent number: 11952654
    Abstract: A sputtering device to sputter a liquid target. The sputtering device including a trough to receive a liquid target material and a device to stir or agitate the liquid target material. The device configured to degas the liquid target material or/and to dissipate solid particles or islands on a surface of the target or/and to move such particles or islands from an active surface region to a passive surface region and/or vice-versa, whereby the passive surface region is at least 50% less exposed to sputtering as the active surface region.
    Type: Grant
    Filed: October 22, 2019
    Date of Patent: April 9, 2024
    Assignee: EVATEC AG
    Inventors: Dominik Jaeger, Thomas Tschirky, Marco Rechsteiner, Heinz Felzer, Hartmut Rohrmann
  • Patent number: 11952295
    Abstract: A control system of a dual power supply type electrolyzer includes an electrolyzer, a first power supply circuit, and a second power supply circuit. The electrolyzer includes a first electrode and a second electrode. The first power supply circuit connected to the first electrode. The second power supply circuit connected to the second electrode. The first power supply circuit and the second power supply circuit simultaneously supply power respectively to the first electrode and the second electrode. The first electrode and the second electrode have a same amount of power, but the first electrode and the second electrode have different polarities and their polarities alternate periodically.
    Type: Grant
    Filed: October 19, 2021
    Date of Patent: April 9, 2024
    Assignee: DARTPOINT TECH. CO., LTD.
    Inventor: Chung-Hsin Hsieh
  • Patent number: 11952273
    Abstract: We disclose herein a viable, cost efficient method for the instantaneous production of hydrogen gas. Hydrogen gas production is increased by utilizing solar and lunar energy. The hydrogen gas is generated spontaneously by the reaction of sodium hydroxide and aluminum as corrosion occurs, forming a layer of aluminum oxide upon the aluminum. This aluminum oxide layer prevents further reaction of sodium hydroxide and aluminum, and thus no more hydrogen gas is produced. Production of aluminum oxide can be bypassed by adding acetic acid or sodium acetate to the reaction. In this reaction the products are aluminum hydroxide and hydrogen gas. Thus, we disclose herein a method that prevents of the formation of aluminum oxide by the use of sodium acetate or acetic acid, the use of iron as a catalyst, and the enhancement of the reaction using natural light.
    Type: Grant
    Filed: December 12, 2011
    Date of Patent: April 9, 2024
    Inventors: Hari Har Parshad Cohly, Rajendram V. Rajnarayanan, Bharat Subodh Agrawal, Hui Chu Tsai
  • Patent number: 11939661
    Abstract: According to one of various aspects of the present invention, a tungsten sputtering target has a purity of tungsten is 5 N (99.999% by weight) or more, and an impurity of carbon and an impurity of oxygen contained in tungsten are 50 ppm by weight or less, respectively, and an average grain size of tungsten crystal is more than 100 ?m.
    Type: Grant
    Filed: September 7, 2018
    Date of Patent: March 26, 2024
    Assignee: JX Metals Corporation
    Inventors: Shinji Sogawa, Takafumi Dasai, Seiji Nakasumi
  • Patent number: 11932934
    Abstract: Physical vapor deposition methods for reducing the particulates deposited on the substrate are disclosed. The pressure during sputtering can be increased to cause agglomeration of the particulates formed in the plasma. The agglomerated particulates can be moved to an outer portion of the process chamber prior to extinguishing the plasma so that the agglomerates fall harmlessly outside of the diameter of the substrate.
    Type: Grant
    Filed: September 9, 2022
    Date of Patent: March 19, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Halbert Chong, Lei Zhou, Adolph Miller Allen, Vaibhav Soni, Kishor Kalathiparambil, Vanessa Faune, Song-Moon Suh
  • Patent number: 11931701
    Abstract: Methods and systems for producing lithium hydroxide and lithium carbonate are described. One or more embodiments involve reacting potassium hydroxide with lithium chloride or lithium nitrate to create a reciprocal salt system, and precipitation to form lithium hydroxide and potassium chloride crystals, potassium nitrate crystals, or any combination thereof. In certain embodiments, lithium chloride feedstock, nitrate feedstock, or mixture thereof, is obtained by reacting lithium sulfate with calcium chloride, calcium nitrate, or combination thereof. Additional embodiments include producing lithium carbonate, including, but not limited to, by reacting lithium hydroxide with carbon dioxide.
    Type: Grant
    Filed: May 23, 2023
    Date of Patent: March 19, 2024
    Inventor: Peter Ehren
  • Patent number: 11926908
    Abstract: A system for controlling an electrochemical production process includes a variable controllable power circuit and an electrolytic cell. The cell includes two electrodes and operates in different states dependent on the potential difference across the electrodes. The system includes a power circuit controller that causes the power circuit to apply a given potential difference across the electrodes to initiate operation of the cell in the one of multiple possible states associated with the given potential difference. The possible states include a production state associated with a first non-zero potential difference in which a product of interest is produced, and an idle state associated with a second non-zero potential difference in which the product of interest is not produced. A monitoring and control subsystem maintains a predefined set of production process conditions, including a predefined operating temperature range, while the cell operates in both the production state and the idle state.
    Type: Grant
    Filed: April 22, 2022
    Date of Patent: March 12, 2024
    Assignee: AEON BLUE TECHNOLOGIES, INC.
    Inventor: Deóis Chiaráin Mac Séamuis Ua Cearnaigh
  • Patent number: 11923178
    Abstract: A vacuum processing apparatus SM of this invention has: a vacuum chamber which performs a predetermined processing on a to-be-processed substrate that is set in position in the vacuum chamber. Inside the vacuum chamber there is disposed a deposition preventive plate) which is made up of a fixed deposition preventive plate and a moveable deposition preventive plate which is moveable in one direction. Further provided are: a metal block body disposed in a vertical posture on an inner wall surface of the vacuum chamber; and a cooling means for cooling the block body. In a processing position in which a predetermined vacuum processing is performed on the to-be-processed substrate, a top surface of the block body is arranged to be in proximity to or in contact with the moveable deposition preventive plate.
    Type: Grant
    Filed: September 12, 2019
    Date of Patent: March 5, 2024
    Assignee: ULVAC, INC.
    Inventors: Koji Suzuki, Hideto Nagashima, Yoshinori Fujii
  • Patent number: 11898236
    Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a processing chamber for processing a substrate comprises a sputtering target, a chamber wall at least partially defining an inner volume within the processing chamber and connected to ground, a power source comprising an RF power source, a process kit surrounding the sputtering target and a substrate support, an auto capacitor tuner (ACT) connected to ground and the sputtering target, and a controller configured to energize the cleaning gas disposed in the inner volume of the processing chamber to create the plasma and tune the sputtering target using the ACT to maintain a predetermined potential difference between the plasma in the inner volume and the process kit during the etch process to remove sputtering material from the process kit, wherein the predetermined potential difference is based on a resonant point of the ACT.
    Type: Grant
    Filed: October 20, 2021
    Date of Patent: February 13, 2024
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Zhiyong Wang, Halbert Chong, John C. Forster, Irena H. Wysok, Tiefeng Shi, Gang Fu, Renu Whig, Keith A Miller, Sundarapandian Ramalinga Vijayalakshmi Reddy, Jianxin Lei, Rongjun Wang, Tza-Jing Gung, Kirankumar Neelasandra Savandaiah, Avinash Nayak, Lei Zhou
  • Patent number: 11898256
    Abstract: A method and apparatus for producing hydrogen gas whereby a nanobubble generator introduces nanobubbles at a concentration of at least 107 nanobubbles per cm3 into an electrolytic cell comprising a pair of electrodes and a hydrogen-containing, electrolyzable liquid, and the electrolytic cell is operated to produce hydrogen gas.
    Type: Grant
    Filed: July 7, 2023
    Date of Patent: February 13, 2024
    Assignee: Moleaer, Inc.
    Inventors: Federico Pasini, Bruce Scholten
  • Patent number: 11891706
    Abstract: The disclosure relates in its first aspect to a process of conversion of a gaseous stream comprising methane into hydrogen (51) and carbon (25), the process is remarkable in that it comprises a step (a) of providing a first gaseous stream (3, 7); a step (b) of bromination and synthesis in which the first gaseous stream (3, 7) is put in contact with a second stream (53) comprising bromine resulting in the formation of a third stream (15) comprising methyl bromides and hydrogen bromide, and of a fourth stream (25) comprising carbon including graphite and/or carbon black; a step (c) of separation performed on the third stream (15) to recover a hydrogen bromide-rich stream (41) which is then oxidized in a step (d) to produce a stream (51) comprising hydrogen. The second aspect relates to the installation for performing the process of the first aspect and the third aspect concerns the use of bromine in such process.
    Type: Grant
    Filed: March 29, 2021
    Date of Patent: February 6, 2024
    Assignees: TOTALENERGIES ONETECH, SULZER MANAGEMENT AG
    Inventors: Romuald Coupan, Nikolai Nesterenko, Gleb Veryasov
  • Patent number: 11895779
    Abstract: The method for processing a substrate includes the substrate preparation step of preparing the substrate, the pattern formation step of forming dummy patterns extending in an X-direction on the substrate, the mask arrangement step of arranging a stencil mask having multiple opening patterns on the substrate, the coating formation step of forming a metal film on the substrate through the multiple opening patterns, and the separation step of separating the dummy patterns from the substrate to obtain a submount. The dummy pattern has protrusion formed such that a side surface of the submount is exposed and formed close to the side surface with a clearance.
    Type: Grant
    Filed: September 11, 2019
    Date of Patent: February 6, 2024
    Assignee: SUMITOMO PRECISION PRODUCTS CO., LTD.
    Inventor: Yasuyuki Hirata
  • Patent number: 11878360
    Abstract: The present disclosure provides an electrochemical machining device and a method for a blisk using an electrode array, which relate to the technical field of electrochemical machining. The electrochemical machining device comprises an outer ring-shaped rotating ring, an inner ring-shaped base and a plurality of cathode rods. An inner diameter of the outer ring-shaped rotating ring is larger than an outer diameter of the inner ring-shaped base, and an inner diameter of the inner ring-shaped base is larger than an outer diameter of the blisk. The outer ring-shaped rotating ring and the inner ring-shaped base are coaxially arranged. Middle parts of the cathode rods are connected with the inner ring-shaped base, outer ends of the cathode rods are rotatably connected with the outer ring-shaped rotating ring, and inner ends of the cathode rods are provided with trepanning cathode pieces or radial feeding electrodes.
    Type: Grant
    Filed: July 5, 2023
    Date of Patent: January 23, 2024
    Assignee: NANJING UNIVERSITY OF AERONAUTICS AND ASTRONAUTICS
    Inventors: Di Zhu, Shuanglu Duan, Jia Liu, Dong Zhu
  • Patent number: 11872526
    Abstract: An electrochemical hydrogen compression system includes a hydrogen gas compression part that compresses hydrogen by applying a current between an anode and a cathode provided on two surfaces of a proton exchange film, and a supply pipeline that guides hydrogen discharged from a hydrogen supply source to the hydrogen gas compression part. The hydrogen gas compression part has an outlet for discharging unreacted hydrogen. The electrochemical hydrogen compression system further includes a film resistance meter and a voltmeter that acquire information related to a wet state of the proton exchange film, a fourth opening/closing part and a fifth opening/closing part that regulate discharge of hydrogen from the outlet, and a control device that controls the fourth opening/closing part and the fifth opening/closing part. The control device controls the fourth opening/closing part and the fifth opening/closing part based on at least the wet state of the proton exchange film.
    Type: Grant
    Filed: December 14, 2021
    Date of Patent: January 16, 2024
    Assignee: Honda Motor Co., Ltd.
    Inventors: Hayato Daimon, Hiroshi Yoshimura, Naoki Mitsuta, Shuichiro Kojima
  • Patent number: 11873572
    Abstract: A method for electropolishing a manufactured metallic article, the method comprising: contacting the metallic article with an electropolishing electrolyte; and electropolishing the metallic article in the electropolishing electrolyte through the application of an applied current regime comprising: at least one electropolishing regime, each electropolishing regime comprising a current density of at least 2 A/cm2 and a voltage comprising a shaped waveform having a frequency from 2 Hz to 300 kHz, a minimum voltage of at least 0 V and a maximum voltage of between 0.5 to 500 V.
    Type: Grant
    Filed: March 24, 2020
    Date of Patent: January 16, 2024
    Assignee: 3DM BIOMEDICAL PTY LTD
    Inventor: Dean Klower
  • Patent number: 11857919
    Abstract: Methods, apparatuses, and systems related to electrochemical capture of Lewis acid gases from fluid mixtures are generally described. Certain embodiments are related to electrochemical methods involving selectively removing a first Lewis acid gas from a fluid mixture containing multiple types of Lewis acid gases (e.g., a first Lewis acid gas and a second Lewis acid gas). Certain embodiments are related to electrochemical systems comprising certain types of electroactive species having certain redox states in which the species is capable of binding a first Lewis acid gas but for which binding with a second Lewis acid gas is thermodynamically and/or kinetically unfavorable. The methods, apparatuses, and systems described herein may be useful in carbon capture and pollution mitigation applications.
    Type: Grant
    Filed: October 22, 2021
    Date of Patent: January 2, 2024
    Assignee: Massachusetts Institute of Technology
    Inventors: Sahag Voskian, Trevor Alan Hatton, Cameron G. Halliday
  • Patent number: 11851777
    Abstract: There is provided a hydrogen gas mixing device, including: a water electrolysis part configured to generate a hydrogen gas and an oxygen gas by electrolysis of water; a mixing gas supply part configured to supply a mixing gas; and a gas mixing part configured to mix the hydrogen gas and the mixing gas, wherein a non-combustible dilution gas is introduced into an oxygen flow part of the water electrolysis part through which the oxygen gas flows.
    Type: Grant
    Filed: December 28, 2020
    Date of Patent: December 26, 2023
    Assignee: YAMAHA FINE TECHNOLOGIES CO., LTD.
    Inventors: Hisashi Ichinokiyama, Takeshi Katoh, Toru Ishii, Yukio Sasaki
  • Patent number: 11827997
    Abstract: The present disclosure relates to the field of manufacturing of silicon carbide (SiC) single crystal wafers, and discloses a stripping method and a stripping device for SiC single crystal wafers. The single crystal wafers obtained by the present disclosure have no damage layer or stress residue on surfaces or sub-surfaces, and are simple in operation and low in cost.
    Type: Grant
    Filed: November 15, 2022
    Date of Patent: November 28, 2023
    Assignee: ZJU-Hangzhou Global Scientific and Technological Innovation Center
    Inventors: Rong Wang, Wenhao Geng, Xiaodong Pi, Deren Yang
  • Patent number: 11821102
    Abstract: A method for smoothing and polishing metals via ion transport by free solid bodies. The method includes connecting a part to be treated to a pole of a current generator and subjecting the part to friction with a set of particles that includes electrically charged and electrically conductive free solid bodies in a gaseous environment.
    Type: Grant
    Filed: October 15, 2021
    Date of Patent: November 21, 2023
    Assignee: DRYLYTE, S.L.
    Inventor: Pau Sarsanedas Millet