Abstract: A cleaning method for removing a silicon-containing film deposited in a temperature-adjustable process container by a heater and a cooler includes: stabilizing a temperature in the process container to a cleaning temperature; and removing the silicon-containing film by supplying a cleaning gas into the process container stabilized at the cleaning temperature; wherein in the removing the silicon-containing film, a heating capability of the heater and a cooling capability of the cooler are controlled based on the temperature in the process container.

Abstract: A method for cleaning a silicon wafer includes the steps of: supplying hydrofluoric acid onto a surface of the silicon wafer to treat the silicon wafer while rotating at a first rotational rate, stopping the supply of the hydrofluoric acid and shaking off hydrofluoric acid on the surface of the silicon wafer without supplying pure water onto the surface of the silicon wafer while rotating the silicon wafer at a second rotational rate which is the same as or faster than the first rotational rate, and supplying ozone water onto the surface of the silicon wafer to treat the silicon wafer after shaking the hydrofluoric acid off the surface while rotating at a third rotational rate which is faster than the second rotational rate. This method for cleaning a silicon wafer is capable of suppressing adhesion of water marks and particles and enhancing the wafer quality.

Abstract: The method and system uses ultrasound (US) transducers in contact with an inboard surface underwater portions of marine vessels or structures. By first digitally generating disruptive, multi-frequency, interfering US waveform signals (complex waveforms, typically replicating a Bessel function) and then converting the signals into analog, the transducers generate disruptive, multi-frequency, interfering US waveforms through the underwater portions of the marine vessels and structures which waveforms disrupt unwanted marine growth on the water-side of the vessel or structure. The digital signals, and also the analog signals, are complex waveform signals, typically produced with a Bessel function. The US transducers are either circular membrane transducers or surface transducers. A computer processor coupled to a memory, generates the complex waveform signals fed to the US transducers.

Abstract: Systems and methods for the ultrasonic disruption of biofilm and algae growth on underwater structures utilize an ultrasonic actuator that produces a natural frequency in the ultrasonic range. In some embodiments, the ultrasonic actuator includes one or more piezoelectric transducers.

Abstract: A method for stripping a coating off of a blade includes discharging liquid nitrogen through a nozzle onto the blade at a coating to cause lifting of the coating from a substrate of the blade and traversing the nozzle along the blade to cause peeling of the coating off of the substrate of the blade as the nozzle traverses the blade.

Abstract: According to one embodiment of the present disclosure, provided is a substrate cleaning method that performs an operation, in a state where a cleaning member is in contact with a rotating substrate, the cleaning member is moved between a first position on the substrate and a second position close to an edge of the substrate, n times (n is an integer of 2 or more), wherein a controller, which controls a driver that moves the cleaning member, controls the driver to perform an edge cleaning step to perform cleaning of the substrate in a state where the cleaning member is in contact with the second position on the substrate for a predetermined period of time after the cleaning member reaches the second position at least in one operation of the first to the (n-1)th operations.

Abstract: The subject invention provides yeast-based products, as well as their use to improve industrial production and performance by, for example, efficiently cleaning contaminating and/or fouling substances such as FOG, biofilm, paraffin, and/or asphaltenes from industrial equipment.

Abstract: This invention relates to the field of induction cleaning, more particularly to chemically cleaning the induction system of the internal combustion engine. The carbon that accumulates within the induction tract of the internal combustion engine is very difficult to remove. Chemically these carbon deposits are very close to that of asphalt or bitumen. It has been found that if the induction cleaning chemicals are delivered in timed layered intervals the removal of such induction carbon can be accomplished. The Dual Solenoid Induction Cleaner uses electronically controlled solenoids to deliver at least two different chemistries in alternating layers to the engine's induction system. These electric solenoids are connected to a single induction cleaner nozzle. The induction cleaner nozzle is slipped through the vacuum port opening into the inside of the induction system where it will spray an aerosol of the chemistry directly into the moving air column entering the engine.

Abstract: A device, mechanism, and methodology for regular and consistent cleaning of the vacuum aperture, nozzle, and contacting surfaces of a pick-and-place apparatus and the pick-up tools of automated or manual semiconductor device and die handling machines are disclosed. The cleaning material may include a cleaning pad layer with one or more intermediate layers that have predetermined characteristics, regular geometrical features, and/or an irregular surface morphology.

Abstract: An apparatus for removing a photoresist layer from at least one alignment mark of a wafer is provided. The apparatus includes a holder, a solvent dispenser, and a suction unit. The holder is used to support the wafer, wherein the alignment mark is formed in a peripheral region of the wafer. The solvent dispenser is used to spray a solvent onto the photoresist layer on the alignment mark of the wafer to generate a dissolved photoresist layer. The suction unit is used to remove the dissolved photoresist layer and the solvent from the wafer through exhausting.

Abstract: An ultrasonic system for treating a submerged surface of a target structure, the system including: an ultrasonic generator for generating electrical energy to drive first and second ultrasonic transducers, the electrical energy including at least two different frequencies including a first and second operation frequency; first ultrasonic transducers configured to be mounted as a first array to the target structure, and connectable to the ultrasonic generator and operable to generate a first ultrasound signal from the first operation frequency; and second ultrasonic transducers configured to be mounted as a second array to the target structure, and connectable to the ultrasonic generator and operable to generate a second ultrasound signal from the second operation frequency, wherein the first and second ultrasonic transducers are spaceable from one another to produce guided ultrasonic waveforms through the target structure including heterodyned frequencies from the first ultrasound signal and the second ultras

Abstract: A cleaning system for cleaning a lamella plate settler includes at least one mechanical cleaning device; a suspension device adapted to suspend the mechanical cleaning device; wherein the suspension device includes a displacement device for lowering and raising the at least one mechanical cleaning device for mechanical cleaning of a lamella plate positioned below the cleaning system. By providing a frame supporting the at least one cleaning device; wheels attached to the frame and adapted to move on rails, the wheels including driving wheels and non-driving wheel, and a sensor, preferably an inductive sensor, adapted to sense the rotational position of the driving wheels, the lamella plate settler can be automatically be cleaned without emptying the basin of water, thus allowing cleaning during operation. A lamella plate settler and a method of cleaning a lamella plate are also provided.

Abstract: According to one embodiment, a method including supplying a liquid onto a substrate, solidifying the liquid on the substrate to form a solidified body, and melting the solidified body of the liquid on the substrate is provided. When solidifying the liquid, an internal pressure of the liquid on the substrate is varied.

Abstract: The present disclosure relates to a method and apparatus for cleaning a 3D printed article, in particular a 3D printed heat exchanger. After 3D printing, an article may have internal passages formed from bonded powder and said passages may contain unbonded powder that needs to be removed before further use of/processing of the article. To remove this unbonded powder, the article is filled with a cleaning fluid and vibrated. The cleaning fluid is then pumped out of the article and past a sensor that generates a magnetic field. The sensor detects the presence of powder particles in the fluid by detecting a perturbation of the magnetic field caused by said particles. The fluid is then filtered and returned to a reservoir for use. The sensor may indicate the article is sufficiently clean when a detected concentration of particles in the fluid drops below a threshold.

Abstract: A method for removing particles from a semiconductor wafer surface is disclosed. A wafer is being spun on a spin coater contained within a condensing environment. Liquid vapor is then infused into the condensing environment to allow some of the liquid vapor to be condensed onto a surface of the wafer on which particles may adhere while the wafer is being spun. Next, a set of light pulses is applied to the surface of the spinning wafer. Finally, an electric grid is utilized to remove the particles off the surface of the wafer.

Abstract: A system for automatically cleaning and washing an ice cream machines includes a liquid container for storing raw materials; a freezing cylinder connected with the liquid container through a cleaning pathway; a water tank for storing rinse water to rinse the freezing cylinder and the cleaning pathway; a detergent tank for storing detergents to clean and wash the freezing cylinder and the cleaning pathway; a pump arranged on the cleaning pathway to selectively pump the raw material, the rinse water or the detergent; and a control panel adapted to control an on/off and cleaning.

Abstract: A microporous membrane wipe and a method of using such microporous membrane wipe are disclosed. The microporous membrane wipe may be uniaxially or biaxially oriented microporous membrane. The uniaxially or biaxially oriented microporous membrane may be made from one or more block and/or impact copolymers of polyethylene and/or polypropylene. A method of using such a microporous membrane wipe for skin oil blotting is also disclosed. Further disclosed is a method of using such a microporous membrane wipe for cleaning a surface for the removal of fingerprints, smudges and the like, where such surfaces may include, for example, eyeglasses, electronics, cell phones, displays, optical devices, camera lenses, microscope lenses and other precision optics, and/or the like.

Abstract: The method and system uses ultrasound (US) transducers in contact with an inboard surface underwater portions of marine vessels or structures. By first digitally generating disruptive, multi-frequency, interfering US waveform signals (complex waveforms, typically replicating a Bessel function) and then converting the signals into analog, the transducers generate disruptive, multi-frequency, interfering US waveforms through the underwater portions of the marine vessels and structures which waveforms disrupt unwanted marine growth on the water-side of the vessel or structure. The digital signals, and also the analog signals, are complex waveform signals, typically produced with a Bessel function. The US transducers are either circular membrane transducers or surface transducers. A computer processor coupled to a memory, generates the complex waveform signals fed to the US transducers.

Abstract: An apparatus for raising and lowering a cutting tool within a decoking drum, a decoking system and a method of raising and lowering a decoking system cutting tool. Instead of using metallic ropes, chains, or a self-propelled gear-based approach, non-metallic belts are secured at respective ends to a crosshead and one or more counterweights to enable vertical movement of the crosshead that in turn permits vertical movement of the cutting tool throughout the height of the drum. A motorized pulley system controls the movement of the belt, and preferably avoids having the motor be carried by the crosshead. The belts on each pulley are preferably arranged as cooperative sets so that within each set, both primary load belts and secondary load belts are present.

Abstract: A condition warning system for an apparatus such as a pot and pan washing machine, a control system and control methods for a pot and pan washing machine are provided. The condition warning system includes a control system that monitors operational, safety or compliance parameters of an apparatus, and a light that illuminates a location below (or above) an operator's direct line of sight, and which is outside of the operator's direct line of sight. The control system and control methods include a punitive wash action lockout, an extended wash cycle time, and a deep clean wash cycle.