Patents Examined by Norton Nadine
  • Patent number: 7550092
    Abstract: A chemical mechanical polishing composition includes: an abrasive component, a corrosion inhibitor, a surfactant, a diacid compound, a metal residue inhibitor, and water. The metal residue inhibitor is selected from the group of compounds having the following formulas: and combinations thereof, wherein R1, R2, R3, and R4 are independently selected from H, C1-C6 alkyl, C2-C6 alkenyl, and C2-C6 alkylidyne; and R5, R6, R7, R8, R9, and R10 are independently selected from H and C1-C6 alkyl.
    Type: Grant
    Filed: June 19, 2006
    Date of Patent: June 23, 2009
    Assignee: Epoch Material Co., Ltd.
    Inventors: Hui-Fang Hou, Wen-Cheng Liu, Pao-Cheng Chen, Yen-Liang Chen, Jui-Ching Chen
  • Patent number: 7438824
    Abstract: To make high quality long-range periodic nanostructures in a transparent or semi-transparent substrate, the transparent or semi-transparent substrate is scanned with a linearly polarized laser beam generated by a femtosecond laser and exceeding a predetermined energy/pulse threshold along a scanning path. Sub-diffraction limit structures are formed as periodic planes of modified material in the transparent or semi-transparent substrate extending along the scanning path. The modified material can then be chemically etched to form cavities.
    Type: Grant
    Filed: March 24, 2006
    Date of Patent: October 21, 2008
    Assignee: National Research Council of Canada
    Inventors: Rod Taylor, Paul Corkum, Ravi Bhardwaj Vedula, Eli Simova, David Rayner, Cyril Hnatovsky