Patents Examined by Porfirio Nazario-Gonzalez
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Patent number: 9682866Abstract: A neutral complex of a cyclic silane characterized in being represented by the general formula [Y]1[SimZ2m-aHa]. (In the formula: Y is at least one kind of coordination compound selected from a group consisting of (1) compounds represented as X1R1n. (when X1 is P, P?O or N, n=3 and each R1 represents a substituted or unsubstituted alkyl group or aryl group and R1s are the same or different; when X1 is S, S?O or O, n=2 and each R1 represents the same group as described above and R1s are the same or different; and the number of amino groups in X1R1n is 0 or 1), and (2) at least one heterocyclic compound selected from the group consisting of substituted or unsubstituted N—, O—, S —or P— containing heterocyclic compounds that have an unshared electron pair in the ring (the number of amino groups in the heterocyclic compound is 0 or 1), each Z represents a halogen atom of any of Cl, Br, I and F and Zs are the same or different, l is 1 or 2, m is 3 to 8, and a is 0 to m.Type: GrantFiled: December 19, 2014Date of Patent: June 20, 2017Assignee: NIPPON SHOKUBAI CO., LTD.Inventors: Morihiro Kitamura, Shin-ya Imoto, Tomonori Shinokura, Takashi Abe
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Patent number: 9677178Abstract: Alkoxyaminosilane compound having formula I, and processes and compositions for depositing a silicon-containing film, are described herein: (R1R2)NSiR3OR4OR5 ??Formula (I) wherein R1 is independently selected from a linear or branched C1 to C10 alkyl group; a C2 to C12 alkenyl group; a C2 to C12 alkynyl group; a C4 to C10 cyclic alkyl group; and a C6 to C10 aryl group; R2 and R3 are each independently selected from hydrogen; a linear or branched C1 to C10 alkyl group; a C3 to C12 alkenyl group, a C3 to C12 alkynyl group, a C4 to C10 cyclic alkyl group, and a C6 to C10 aryl group; and R4 and R5 are each independently selected from a linear or branched C1 to C10 alkyl group; a C2 to C12 alkenyl group; a C2 to C12 alkynyl group; a C4 to C10 cyclic alkyl group; and a C6 to C10 aryl group.Type: GrantFiled: November 13, 2015Date of Patent: June 13, 2017Assignee: VERSUM MATERIALS US, LLCInventors: Daniel P. Spence, Xinjian Lei, Ronald Martin Pearlstein, Manchao Xiao, Richard Ho
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Patent number: 9676679Abstract: The present disclosure is directed to a traceless directing group in a radical cascade. The chemo- and regioselectivity of the initial attack in skipped oligoalkynes is controlled by a propargyl alkoxy moiety. Radical translocations lead to the boomerang return of radical center to the site of initial attack where it assists to the elimination of the directing functionality via ?-scission in the last step of the cascade. In some aspects, the reaction of the present invention is catalyzed by a stannane moiety, which allows further via facile reactions with electrophiles as well as Stille and Suzuki cross-coupling reactions. This selective radical transformation opens a new approach for the controlled transformation of skipped oligoalkynes into polycyclic ribbons of tunable dimensions.Type: GrantFiled: November 3, 2015Date of Patent: June 13, 2017Assignee: The Florida State University Research Foundation, Inc.Inventors: Igor V. Alabugin, Kamalkishore Pati
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Patent number: 9670108Abstract: Bisphosphites having a central 2,3?-biphenol unit are useful for catalyzing hydroformylation.Type: GrantFiled: November 27, 2015Date of Patent: June 6, 2017Assignee: Evonik Degussa GmbHInventors: Katrin Marie Dyballa, Robert Franke, Armin Böerner, Detlef Selent
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Patent number: 9670301Abstract: Problem: To provide a novel copolymer capable of use as a surface treatment agent which is safe and does not generate hydrogen, which has good compatibility with other cosmetic raw materials so as to be able to improve compounding stability of a cosmetic, which contributes to good water resistance, sebum resistance, gloss, feel, hair attachment ability, skin attachment ability and the like of a cosmetic, which further may be used for treatment of powders of a wide range of cosmetics, and which nearly entirely suppresses the occurrence of dispersion failure on the skin. Resolution Means: A copolymer comprising: (A) an unsaturated monomer having a carbosiloxane dendrimer structure; and (B) an unsaturated monomer having at least one hydrophilic group in the molecule. A content of the unsaturated monomer having the carbosiloxane dendrimer structure is in the range of 35 to 50% by mass of the total monomer units of the copolymer.Type: GrantFiled: August 22, 2013Date of Patent: June 6, 2017Assignee: Dow Corning Toray Co., Ltd.Inventors: Haruhiko Furukawa, Akito Hayashi, Tomohiro Iimura
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Patent number: 9670151Abstract: Compounds of the formula I: or pharmaceutically acceptable salts thereof, wherein m, p, q, Ar, R1 and R2 are as defined herein. Also provided are methods for preparing, compositions comprising, and methods for using compounds of formula I.Type: GrantFiled: November 3, 2014Date of Patent: June 6, 2017Assignee: Roche Palo Alto LLCInventors: Robert Greenhouse, Ralph New Harris, III, Saul Jaime-Figueroa, James M. Kress, David Bruce Repke, Russell Stephen Stabler
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Patent number: 9670239Abstract: Bisphosphites having an outer naphthyl-phenyl unit and a central 2,3?-biphenol unit and their preparation are described.Type: GrantFiled: December 1, 2015Date of Patent: June 6, 2017Assignee: Evonik Degussa GmbHInventors: Katrin Marie Dyballa, Robert Franke, Armin Boerner, Detlef Selent
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Patent number: 9669098Abstract: The disclosure relates to metal organic frameworks or isoreticular metal organic frameworks, methods of production thereof, and methods of use thereof.Type: GrantFiled: July 13, 2015Date of Patent: June 6, 2017Assignee: The Regents of the University of CaliforniaInventors: Omar M. Yaghi, Hiroyasu Furukawa, Hexiang Deng
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Patent number: 9670127Abstract: An object of the present invention is to provide a novel porous coordination polymer having superhydrophobicity. The present invention relates to a porous coordination polymer comprising: a divalent or trivalent metal ion; and an organic ligand represented by the following formula (1): wherein X1, X2, and X3 are the same or different, and each represent CO2?, CS2?, PO32?, PO42?, AsO32?, AsO42?, SO3?, SO4?, SeO3?, SeO4?, TeO3?, or TeO4?; and R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, and R12 are the same or different, and each represent hydrogen or C1-20 alkyl; the metal ion and the organic ligand being alternately linked by a coordinate bond.Type: GrantFiled: February 24, 2015Date of Patent: June 6, 2017Assignee: Kyoto UniversityInventors: Susumu Kitagawa, Masakazu Higuchi, Prabhakara Rao Koya
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Patent number: 9663546Abstract: Compounds, and oligomers of the compounds, are synthesized with cyclic amine ligands attached to a metal atom. These compounds are useful for the synthesis of materials containing metals. Examples include pure metals, metal alloys, metal oxides, metal nitrides, metal phosphides, metal sulfides, metal selenides, metal tellurides, metal borides, metal carbides, metal silicides and metal germanides. Techniques for materials synthesis include vapor deposition (chemical vapor deposition and atomic layer deposition), liquid solution methods (sol-gel and precipitation) and solid-state pyrolysis. Suitable applications include electrical interconnects in microelectronics and magnetoresistant layers in magnetic information storage devices. The films have very uniform thickness and high step coverage in narrow holes.Type: GrantFiled: July 25, 2014Date of Patent: May 30, 2017Assignee: President and Fellows of Harvard CollegeInventor: Roy Gerald Gordon
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Patent number: 9663545Abstract: The invention relates to compounds characterized by a general formula (1), wherein X is a group described by a general formula —Kp—Fl—Kq—, wherein Fl is —C(?O)—, —C(?S)—, with l being 0 or 1, Kp is a Cp-alkyl with p being 0, 1, 2, 3 or 4, Kq is a Cq-alkyl with q being 0, 1, 2, 3 or 4, and wherein n of R1n is 0, 1, 2, 3, 4 or 5, and each R1 independently from any other R1 is —C(?O)OR2, —C(?O)NR22, —C(?O)SR2, —C(?S)OR2, —C(NH)NR22, CN4H2, —NR22, —C(?O)R2, —C(?S)R2, —OR2, —SR2, —CF3, —OCF3, —SCF3, —SOCF3, —SO2CF3, —CN, —NO2, —F, —Cl, —Br or —I, with each R2 independently from any other R2 being a hydrogen or C1-C4 alkyl, and wherein OM is an organometallic compound independently selected from the group of an unsubstituted or substituted metal sandwich compound, an unsubstituted or substituted half metal sandwich compound or a metal carbonyl compound and their use in a method for treatment of infections by helminths.Type: GrantFiled: July 1, 2014Date of Patent: May 30, 2017Assignees: UNIVERSITAT ZURICH, THE UNIVERSITY OF MELBOURNEInventors: Jeannine Hess, Malay Patra, Gilles Gasser, Abdul Jabbar, Robin B. Gasser
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Patent number: 9663547Abstract: Disclosed are Silicon- and Zirconium-containing precursors having one of the following formulae: wherein each R1, R2, R3, R4, R5, R6, R7, R8, R9 and R10 is independently selected from H; a C1-C5 linear, branched, or cyclic alkyl group; or a C1-C5 linear, branched, or cyclic fluoroalkyl group. Also disclosed are methods of synthesizing the disclosed precursors and using the same to deposit Zirconium-containing thin films on substrates via vapor deposition processes.Type: GrantFiled: December 23, 2014Date of Patent: May 30, 2017Assignee: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges ClaudeInventors: Clement Lansalot-Matras, Julien Lieffrig, Hana Ishii, Christian Dussarrat
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Patent number: 9648870Abstract: An antimicrobial composite material and a method for fabricating the same are provided. The antimicrobial composite material includes a porous material, a chelating agent, and a multivalent metal ion. The chelating agent is chemically bonded to the porous material, and the multivalent metal ion is chemically bonded to the chelating agent.Type: GrantFiled: July 29, 2015Date of Patent: May 16, 2017Assignee: Industrial Technology Research InstituteInventors: Hsin-Yi Huang, Hsin-Hsien Wu
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Patent number: 9643987Abstract: Monophosphites having an unsymmetric biaryl structure and metal complexes thereof are provided. The metal complex compositions are useful as hydroformylation catalysts. The metals of the complex include Rh, Ru, Co and Ir. A method of hydroformylation using the metal complex or the metal complex components is also provided.Type: GrantFiled: December 2, 2015Date of Patent: May 9, 2017Assignee: Evonik Degussa GmbHInventors: Katrin Marie Dyballa, Robert Franke, Detlef Selent, Armin Börner
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Patent number: 9643900Abstract: A process to prepare a relatively inexpensive utility fluid comprises contacting together ethylene and a coordination-insertion catalyst and, optionally, an alpha-olefin, in a continuously-fed backmixed reactor zone under conditions such that a mixture of a hyperbranched oligomer and a branched oligomer is formed. The hyperbranched oligomer has an average of at least 1.5 methine carbons per oligomer molecule, and at least 40 methine carbons per one-thousand total carbons, and at least 40 percent of the methine carbons is derived from the ethylene, and the average number of carbons per molecule is from 25 to 100, and at least 25 percent of the hyperbranched oligomer molecules has a vinyl group and can be separated from the branched oligomer, which has an average number of carbons per molecule of up to 20. The coordination-insertion catalyst is characterized as having an ethylene/octene reactivity ratio up to 20 and a kinetic chain length up to 20 monomer units.Type: GrantFiled: June 24, 2014Date of Patent: May 9, 2017Assignee: DOW GLOBAL TECHNOLOGIES LLCInventors: Daniel J. Arriola, Brad C. Bailey, Jerzy Klosin, Zenon Lysenko, Gordon R. Roof, Austin J. Smith
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Patent number: 9637384Abstract: The present invention relates to new fullerene derivatives of formulae 1a-d, 2 and 3: method of synthesizing said derivatives, and applications thereof in organic photovoltaics, e.g., organic solar cells. In particular, the fullerene derivatives of the present invention are soluble in non-halogenated solvents such that an environmental-friendly and low-cost fabrication method for industrialization of solar cell based on the new fullerene derivatives is provided. An ink formulation for forming a thin film on a substrate of organic photovoltaics comprising at least one of the fullerene derivatives of the present invention is also provided. Greater than 3% power conversion efficiency of the organic solar cells (area=0.16 cm2) formed based on the fullerene derivatives of the present invention with less pollution and lower cost in fabrication can be achieved in the present invention.Type: GrantFiled: July 14, 2015Date of Patent: May 2, 2017Assignee: NANO AND ADVANCED MATERIALS INSTITUTE LIMITEDInventors: Wing Leung Wong, Lai To Leung, Liang Zhang, Chi Mei Chow, Haojun Zhu, Lai Fan Lai, Kwok Keung Paul Ho
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Patent number: 9640386Abstract: Classes of liquid aminosilanes have been found which allow for the production of silicon carbo-nitride films of the general formula SixCyNz. These aminosilanes, in contrast, to some of the precursors employed heretofore, are liquid at room temperature and pressure allowing for convenient handling. In addition, the invention relates to a process for producing such films. The classes of compounds are generally represented by the formulas: and mixtures thereof, wherein R and R1 in the formulas represent aliphatic groups typically having from 2 to about 10 carbon atoms, e.g., alkyl, cycloalkyl with R and R1 in formula A also being combinable into a cyclic group, and R2 representing a single bond, (CH2)n, a ring, or SiH2.Type: GrantFiled: December 16, 2014Date of Patent: May 2, 2017Assignee: VERSUM MATERIALS US, LLCInventors: Manchao Xiao, Arthur Kenneth Hochberg
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Patent number: 9630982Abstract: The present invention provides salts of a cation and an anion, wherein the cation comprises (i) a silsesquioxane moiety of formula (ii) a chromophoric moiety D, which may which may be substituted with one or more substituents selected from the group consisting of C1-10-alkyl, phenyl, halogen, OC1-6-alkyl, OH, NH2 and NO2, and (iii) a moiety of formula wherein L4 is C1-20-alkylene, phenylene-C1-20-alkylene or C1-20-alkylene-phenylene-C1-20alkylene, R11, R12, R13 and R14 are independently from each other hydrogen or C1-4-alkyl, R15, R16, R17 and R18 are independently from each other C1-4-alkyl, R19 is C1-20-alkyl, which may be substituted with phenyl, O—C1-6-alkyl or NO2, and d is an integer from 1 to 25, and electrophoretic devices comprising the salts.Type: GrantFiled: April 16, 2014Date of Patent: April 25, 2017Assignee: BASF SEInventors: Reinhold Öhrlein, Gabriele Baisch
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Patent number: 9630164Abstract: An object of the present invention is to provide a porous polymer metal complex which can be used as a gas adsorbent and contains two or more types of similar ligands. A porous polymer metal complex is provided expressed by [CuX]n(1) (in the Formula, X represents two or more types of isophthalic acid ions selected from the group consisting of isophthalic acid ions and isophthalic acid ions having a substituent at position 5, at least an amount of one type of X is 5 mol % to 95 mol % of the total number of moles of X, and n represents an assembly number of constituent units expressed by CuX and is not particularly limited).Type: GrantFiled: October 31, 2013Date of Patent: April 25, 2017Assignee: NIPPON STEEL & SUMITOMO METAL CORPORATIONInventors: Hiroshi Kajiro, Koichi Nose, Susumu Kitagawa, Ryotaro Matsuda, Hiroshi Sato
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Patent number: 9624248Abstract: The present disclosure provides an ionic liquid compound of Formula (I) and its application in reactions such as alkylation, arylation, acylation, diels alder and oligomerization, The present disclosure also provides a process for preparing the ionic liquid compound of Formula (I) which involves preparing an ionic salt complex represented by Formula [(NR1R2R3)iM1]n+[Xj]n? by mixing an amine represented by Formula NR1R2R3 and a metal salt represented by formula M1Xj; and mixing the ionic salt complex and a metal salt represented by formula M2Yk to obtain the ionic liquid compound.Type: GrantFiled: April 21, 2014Date of Patent: April 18, 2017Assignee: Reliance Industries LimitedInventors: Pavankumar Aduri, Parasu Veera Uppara, Viswanath Kotra, Mangesh Sakhalkar, Vibhuti Dukhande