Patents Examined by R. F. Johnson
  • Patent number: 5364905
    Abstract: A continuous method for the in-situ polymerization of plastic in an elastomeric material in a form suitable for reinforcing the elastomeric material is provided. The method comprises feeding elastomer and a monomer or monomer precursor of a reinforcing material into a mixing device, mixing the elastomer and the monomer or monomer precursor vigorously, initiating polymerization, and causing the monomers to continue to polymerize until the polymer solidifies when the melting point of the polymer produced exceeds the mixing temperature of the elastomer, terminating polymerization.
    Type: Grant
    Filed: April 26, 1991
    Date of Patent: November 15, 1994
    Assignee: The Goodyear Tire & Rubber Company
    Inventors: Richard G. Bauer, Donald J. Burlett, Joseph W. Miller, Jr., Gordon R. Schorr, Pradeep M. Bapat
  • Patent number: 5362834
    Abstract: Improved gel compounds based on reaction products of polyols and polyisocyanates are characterized in that the polyol component consists of a mixture of a) one or more polyols having hydroxyl values below 112 and b) one or more polyols having hydroxyl values of 112 to 600 and in that the isocyanate index of the reaction mixture is in the range from 15 to 70. They may be used as pressure-distributing elements.
    Type: Grant
    Filed: April 28, 1992
    Date of Patent: November 8, 1994
    Assignee: Bayer Aktiengesellschaft
    Inventors: Dietmar Schapel, Heinz-Dieter Ebert, Hartwig Grammes
  • Patent number: 5354632
    Abstract: A reticle and method of forming a patterned resist layer on a semiconductor substrate using the reticle is described. The substrate is coated with a resist layer. The resist layer is selectively exposed to a radiation wave having a wavelength that is transmitted through the reticle. The reticle includes at least one first, second, and third areas. The first area has a first transmittance. The second area is adjacent to the first area and has a second transmittance that is less than the first transmittance. The second area shifts radiation transmitted through the second area approximately 180.degree. out of phase relative to radiation transmitted through the first area. The third area is adjacent to the second area. The third area is substantially opaque to prevent virtually any transmission of radiation. The resist layer is developed to form the patterned resist layer including at least one resist layer opening and at least one resist element.
    Type: Grant
    Filed: April 15, 1992
    Date of Patent: October 11, 1994
    Assignee: Intel Corporation
    Inventors: Giang T. Dao, Kenny K. H. Toh, Eng T. Gaw, Rajeev R. Singh
  • Patent number: 5352733
    Abstract: A water based, solvent free, two component polyurethane-polyurea dispersion containing up to 65% solids. The first component is a polyester-polyol phase and an aqueous amine phase mixture. The polyester-polyol is a combination of modified polyester-polyols, low viscosity polyether or polyester-polyols, chain extending low molecular weight polyols, neutralizing amines and a detergent. It has a solids content of 90-100% and is totally hydroxyl functional with a carboxylic acid number of 10 and 50, an hydroxyl number of 180 and 300, an equivalent weight range of 165 and 365 and a viscosity of 600-1500 cps at 25.degree. C. The amine phase is an combination of neutralizing and chain extending amines having ratios preformulated to provide a balanced chain extending cross-linking reaction in aqueous phase with--NCO reactive groups. The aqueous amine blend has an equivalent weight of 40 to 50 and a solids content of 40-60%.
    Type: Grant
    Filed: March 10, 1993
    Date of Patent: October 4, 1994
    Assignee: R. E. Hart Labs, Inc.
    Inventor: Richard E. Hart
  • Patent number: 5346983
    Abstract: Substituted phenyl compounds endowed with chain extension activity for formulations such as polyurethanes are disclosed, and which have the general formula: ##STR1## wherein n is 1-1000; R.sub.1 .dbd.R.sub.2, and R.sub.1 and R.sub.2 are from the group --CH.sub.2 --CH.sub.2, --CH.sub.2 --C(CH.sub.3)H--; and --C(CH.sub.3)H--CH.sub.2 --; and R.sub.3 is from the group consisting of: ##STR2## and the diasteromeric salts thereof.
    Type: Grant
    Filed: May 28, 1993
    Date of Patent: September 13, 1994
    Assignee: Hoechst Celanese Corporation
    Inventors: Michael T. Sheehan, James R. Sounik, Bret F. Hann, William W. Wilkison, III