Patents Examined by Richard Z. Zhang
-
Patent number: 11819890Abstract: A nozzle cleaner includes: a cleaning tank which stores a cleaning solution; a first conductive member that is disposed to be immersed into the cleaning solution stored in the cleaning tank when the nozzle is cleaned; an ultrasonic wave generating mechanism which is disposed so that at least a part of a second conductive member is immersed into the cleaning solution stored in the cleaning tank when the nozzle is cleaned and generates an ultrasonic vibration in the cleaning solution stored in the cleaning tank; a first voltage control unit which controls a potential applied to the first conductive member; and a second voltage control unit which controls a potential applied to the second conductive member, wherein the first voltage control unit applies a second potential V2 higher than a first potential V1 applied to the nozzle when the nozzle is cleaned to the first conductive member.Type: GrantFiled: December 8, 2017Date of Patent: November 21, 2023Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Takushi Miyakawa, Gorou Yoshida, Yuto Tanaka, Kohei Nonaka, Takamichi Mori, Tetsuji Kawahara
-
Patent number: 11814725Abstract: There is provided a technique of cleaning an interior of a supply part by performing a cycle a predetermined number of times, the cycle including: (a) supplying a first gas, which is one of a cleaning gas and an additive gas that reacts with the cleaning gas, from the supply part toward an interior of a process container in which a substrate has been processed by supplying a processing gas from the supply part to the substrate; and (b) supplying a second gas, which is the other one of the cleaning gas and the additive gas and is different from the first gas, from the supply part toward the interior of the process container in a state in which a part of the first gas remains in the supply part after supply of the first gas is stopped.Type: GrantFiled: June 4, 2019Date of Patent: November 14, 2023Assignee: KOKUSAI ELECTRIC CORPORATIONInventors: Koei Kuribayashi, Takeo Hanashima, Hiroyuki Miyagishi, Hiroto Yamagishi
-
Patent number: 11756804Abstract: In a chemical mechanical polishing system, a platen shield cleaning assembly is installed on a rotatable platen in a gap between the rotatable platen and a platen shield. The assembly includes a sponge holder attached to the platen and a sponge. The sponge is held by the sponge holder such that an outer surface of the sponge is pressed against an inner surface of the platen shield.Type: GrantFiled: December 29, 2022Date of Patent: September 12, 2023Assignee: Applied Materials, Inc.Inventors: Shantanu Rajiv Gadgil, Sumit Subhash Patankar, Nathan Arron Davis, Allen L. D'Ambra
-
Patent number: 11756770Abstract: A post-discharge plasma coating device for a wired substrate comprising an inner tubular electrode on an inner tubular wall for receiving the substrate and a precursor moving axially in a working direction; an outer tubular electrode coaxial with, and surrounding, the inner tubular electrode. The inner and outer electrodes are configured to be supplied with an electrical power source for producing a plasma when a plasma gas is supplied between the electrodes and is thereby excited, the plasma excited gas flowing axially in the working direction and reacting with the precursor in a coating area at the end of the inner tubular wall in the direction. The inner tubular wall extends axially towards the coating area at least until, in various instances beyond, the end of the outer electrode, in the working direction and at least one dielectric tubular wall extends axially between the inner tubular electrode and the outer tubular electrode.Type: GrantFiled: September 8, 2017Date of Patent: September 12, 2023Assignee: Luxembourg Institute of Science and Technology (LIST)Inventors: Simon Bulou, Patrick Choquet, Thomas Gaulain, Mathieu Gerard
-
Patent number: 11745230Abstract: A cleaning apparatus for cleaning of medical machine components of machines such as CPAP machines, nebulizers, PEEP machines, and the like is disclosed herein. The cleaning apparatus comprises a container body. A carousel is configured for placement within the container body. The carousel comprises a support structure. The carousel further comprises a helical ramp attached to the support structure and extending helically from an operative top end of the support structure to an operative bottom end of the support structure along a periphery of the support structure.Type: GrantFiled: March 16, 2023Date of Patent: September 5, 2023Inventor: Jerome Wilson
-
Patent number: 11735438Abstract: A method and apparatus for Marangoni substrate drying is disclosed which includes an adjustable spray bar assembly having mounting brackets coupled to a support structure of a drying system, a base assembly coupled to the mounting brackets and disposed parallel to a face of the support structure, and a mounting assembly coupled to and parallel with the base assembly. The mounting assembly is adjustable in a vertical direction at two distal ends. The mounting assembly includes arms onto which one or more spray bars may be disposed. While secured to the mounting assembly, the one or more spray bars may be rotated about a longitudinal axis.Type: GrantFiled: December 2, 2019Date of Patent: August 22, 2023Assignee: Applied Materials, Inc.Inventors: Edwin Velazquez, Jagan Rangarajan
-
Patent number: 11688613Abstract: A substrate processing apparatus is configured to dry a substrate by replacing a liquid film formed on a top surface of the substrate, which is horizontally held, with a supercritical fluid. The substrate processing apparatus includes a pressure vessel, a cover body and a supporting body. The pressure vessel has therein a drying chamber for the substrate. The cover body is configured to close an opening of the drying chamber. The supporting body is configured to support the substrate horizontally within the drying chamber. The supporting body is fixed to the drying chamber.Type: GrantFiled: July 29, 2021Date of Patent: June 27, 2023Assignee: TOKYO ELECTRON LIMITEDInventors: Shota Umezaki, Hiroaki Inadomi
-
Patent number: 11672967Abstract: A self-cleaning needleless connector may include a connector body defining a fluid passageway including an inlet and an outlet, a cover disposed over at least the inlet of the connector body, an access point disposed at an inlet end of the cover, where in a first position the inlet is within the cover and in an second position the inlet is extended beyond the cover and configured to receive a male luer, a reservoir containing a cleaning agent, and an abrasive surface located in the cover that is in fluid communication with the cleaning agent, where the abrasive surface and the cleaning agent are configured to contact an exterior surface of the inlet to create friction.Type: GrantFiled: June 12, 2019Date of Patent: June 13, 2023Assignee: GROVE GROUP, LLCInventors: Nathan Gish, Ross Hudson, Josh Luttrell
-
Patent number: 11642707Abstract: A method of unclogging ducts in a part made by additive manufacturing, the ducts running from at least one well that opens out into the surface of the part, the method comprising the steps of: fabricating a guide with a body that is designed to fit in the well, the guide having internal channels that extend from a base of the guide that is accessible by a user to an outside wall of the body; cleaning the well and inserting the body of the guide in the well so that channels in the guide open out in register with inlets of ducts that are to be unclogged; and inserting a thin flexible tool, e.g. a metal cable, through the base of the guide into at least one channel therein and causing the tool to penetrate into the duct in register in the part so as to unclog it.Type: GrantFiled: August 29, 2018Date of Patent: May 9, 2023Assignee: SAFRAN LANDING SYSTEMSInventors: Olivier Rigo, Thomas Kairet, Denis Luttenbacher, Stéphane Lambre, Stefano Argentero, Gérard Balducci
-
Patent number: 11617471Abstract: A novel cleaning container is disclosed for backflushing and hence clean an espresso machine. The container may include a body having a top, an opposing bottom, and an interior cavity for holding water, detergent, and/or other cleaning fluid. A piston is slidably disposed within the interior cavity between up and down positions, wherein the piston and an opening of the body at the top define a variable volume for cleaning the machine. A spring is seated firmly within the body underneath the piston for biasing the piston to the up position. A stopper disposed about the top of the piston limits the motion of the piston at the top of the body. One or more grooves within the body are in fluid communication with one or more outlets to permit fluid to exit the body during cleaning. The body may be transparent or translucent.Type: GrantFiled: September 9, 2021Date of Patent: April 4, 2023Assignee: Strategic Exits LLCInventor: Douglas Weber
-
Patent number: 11612452Abstract: The present disclosure is directed to endoscope cleaning systems and methods. The endoscope cleaning system can include a pump housing that houses a peristaltic pump, an endoscope sheath fluidly connected to the pump housing, and a pump control communicatively coupled to the peristaltic pump. Upon activation of the pump control, the peristaltic pump can supply fluid to the endoscope sheath for cleaning an endoscope. Upon deactivation of the pump control, the peristaltic pump can remove residual fluid from the endoscope.Type: GrantFiled: October 28, 2020Date of Patent: March 28, 2023Assignee: Stryker CorporationInventors: Theodore Leclere, Candice Pack
-
Patent number: 11607717Abstract: A cleaning apparatus for cleaning of medical machine components of machines such as CPAP machines, nebulizers, PEEP machines, and the like is disclosed herein. The cleaning apparatus comprises a container body. A carousel is configured for placement within the container body. The carousel comprises a support structure. The carousel further comprises a helical ramp attached to the support structure and extending helically from an operative top end of the support structure to an operative bottom end of the support structure along a periphery of the support structure.Type: GrantFiled: March 30, 2020Date of Patent: March 21, 2023Inventor: Jerome Wilson
-
Patent number: 11594427Abstract: A substrate processing apparatus performs increasing a pressure within a processing vessel up to a processing pressure higher than a threshold pressure of a processing fluid by supplying the processing fluid into the processing vessel in which a substrate having thereon a liquid is accommodated; and supplying the processing fluid into the processing vessel and draining the processing fluid while maintaining the pressure within the processing vessel at a level allowing the processing fluid to be maintained in a supercritical state. The increasing of the pressure includes: increasing the pressure to a first pressure; and increasing the pressure to the processing pressure from the first pressure. A temperature of the substrate is controlled to a first temperature in the increasing of the pressure to the first pressure, and is controlled to a second temperature higher than the first temperature in the increasing of the pressure to the processing pressure.Type: GrantFiled: November 24, 2020Date of Patent: February 28, 2023Assignee: TOKYO ELECTRON LIMITEDInventors: Toru Ihara, Gentaro Goshi, Masami Yamashita
-
Patent number: 11578864Abstract: Disclosed herein is a method of automatically cleaning boiler pipes. The provision of a pipe-cleaning tank on one side of a casing to store a cleaning solution therein and a tank supply valve in the pipe-cleaning tank allows the cleaning solution stored in the pipe-cleaning tank to automatically flow into a heat exchanger and various pipes inside the casing by means of only a simple operation of manipulating the tank supply valve, thereby making it easy to eliminate scale that has accumulated in the heat exchanger and the pipes.Type: GrantFiled: April 5, 2021Date of Patent: February 14, 2023Inventor: Young-Hwan Choi
-
Patent number: 11560696Abstract: A high pressure jetting system for use with a water supply system includes a recirculating unit to connect to an isolated section of the water supply system. The isolated section remains under water supply system pressure. The recirculating unit includes a filter unit and a pump unit capable of generating a circulating flow of water. A first pig launch and recovery apparatus couples a first hydrant to the recirculating unit and a second pig launch and recovery apparatus couples a second hydrant to the recirculating unit. A jetting unit including a jetting head is coupled to a jetting hose. The jetting unit enters the closed circuit through the second pig launch and recovery apparatus and travels within the isolated section. The jetting head emits a plurality of water jets to assist removal of material from an inner surface of the water mains and pipes.Type: GrantFiled: January 17, 2020Date of Patent: January 24, 2023Assignee: NO-DES, Inc.Inventor: Chris Eric Wilkinson
-
Patent number: 11555296Abstract: A high pressure jetting system includes a recirculating unit connected to an isolated section of a water supply system which remains under system pressure. The recirculating unit includes a filter unit and a pump unit generating a circulating flow of water. A first pig launch and recovery apparatus couples a first hydrant to the recirculating unit and a second pig launch and recovery apparatus couples a second hydrant to the recirculating unit. A camera unit including a camera and drogue chute enters through the first apparatus and travels in a flushing flow direction to the second apparatus. The drogue chute is then removed from the camera. The camera then couples to a jetting unit having a jetting head and hose and re-enters through the second apparatus. The jetting unit emits a plurality of water jets to move in a counter-current flow direction and remove material from the water mains.Type: GrantFiled: March 13, 2020Date of Patent: January 17, 2023Assignee: NO-DES, Inc.Inventor: Chris Eric Wilkinson
-
Patent number: 11545371Abstract: In a chemical mechanical polishing system, a platen shield cleaning assembly is installed on a rotatable platen in a gap between the rotatable platen and a platen shield. The assembly includes a sponge holder attached to the platen and a sponge. The sponge is held by the sponge holder such that an outer surface of the sponge is pressed against an inner surface of the platen shield.Type: GrantFiled: June 23, 2020Date of Patent: January 3, 2023Assignee: Applied Materials, Inc.Inventors: Shantanu Rajiv Gadgil, Sumit Subhash Patankar, Nathan Arron Davis, Allen L. D'Ambra
-
Patent number: 11529932Abstract: A self-contained, compact camera wash system 1000 for a drone 800 or as an automotive aftermarket kit 1101 uses a pressurized container 1002 similar to a common aerosol can to supply washer fluid to a washer nozzle 1020 via actuable valving. The fluid supply container is small for use with drone cameras (e.g., ˜15 ml in volume) and is readily packaged in a compact assembly. For the automotive aftermarket kit 1101 a larger volume container volume is provided and configured to be easily replaced as needed.Type: GrantFiled: July 28, 2017Date of Patent: December 20, 2022Assignee: DLHBOWLES, INC.Inventor: Russell Hester
-
Patent number: 11515182Abstract: There is provided a drying apparatus for covering an upper surface of the substrate with an uneven pattern formed thereon with a liquid film and subsequently drying the substrate, including: a first heat transfer part whose temperature is adjusted to a first temperature, wherein a first heat is transferred between the first heat transfer part and the substrate by a first temperature difference; a second heat transfer part whose temperature is adjusted to a second temperature different from the first temperature, wherein a second heat is transferred between the second heat transfer part and the substrate by a second temperature difference; and a controller configured to control the first temperature and the second temperature and to control a surface tension distribution of the liquid film so as to control an agglomeration of the liquid film.Type: GrantFiled: May 15, 2020Date of Patent: November 29, 2022Assignee: TOKYO ELECTRON LIMITEDInventor: Katsuhiro Morikawa
-
Patent number: 11508589Abstract: When performing a liquid processing on a substrate W being rotated and removing a processing liquid by a cleaning liquid, a cleaning liquid nozzle 421 configured to discharge a cleaning liquid slantly with respect to a surface of the substrate W toward a downstream side of a rotational direction of the substrate W and a gas nozzle 411 configured to discharge a gas toward a position adjacent to a central portion side of the substrate W when viewed from a liquid arrival position R of the cleaning liquid are moved from the central portion side toward a peripheral portion side. A rotation number of the substrate is varied such that rotation number in a period during which the liquid arrival position R moves in the second region becomes smaller than a maximum rotation number in a period during which the liquid arrival position moves in the first region.Type: GrantFiled: September 24, 2018Date of Patent: November 22, 2022Assignee: TOKYO ELECTRON LIMITEDInventors: Akiko Kai, Kouichirou Tanaka, Hiroshi Ichinomiya, Masahiro Fukuda