Patents Examined by Robert M Kumemund
  • Atomic layer deposited titanium-doped indium oxide films
    Patent number: 7582161
    Abstract: An apparatus and methods of forming the apparatus include a film of transparent conductive titanium-doped indium oxide for use in a variety of configurations and systems. The film of transparent conductive titanium-doped indium oxide may be structured as one or more monolayers. The film of transparent conductive titanium-doped indium oxide may be formed using atomic layer deposition.
    Type: Grant
    Filed: April 7, 2006
    Date of Patent: September 1, 2009
    Assignee: Micron Technology, Inc.
    Inventors: Kie Y. Ahn, Leonard Forbes