Abstract: The present invention provides an apparatus and method for cleaning substrates such as semiconductor wafers by sinking the substrates into cleaning fluids such as cleaning chemicals or rinsing liquids and then drying the substrates. The substrate clean and dry apparatus of present invention includes a process chamber comprising a cleaning chamber that carries the cleaning fluid and discharges at bottom the cleaning fluid; and a drying chamber above the cleaning chamber. The process chamber further includes a discharge device for evacuating the gas from the drying chamber, the gas supplied into the drying chamber. The discharge device is located between the cleaning chamber and the drying chamber, and evacuates the gas by force such that the gas is driven down vertically in the drying chamber.

Abstract: An apparatus for rinsing an article includes a tank having an upper portion, the upper portion including a rim; a discharge pipe connected to the tank; a generally cylindrical spray assembly disposed in a middle portion of the tank; a second tank; a source of rinse fluid connected to the second tank and to the spray assembly through a valve, the valve being operable to open to both the second tank and the spray assembly when a level of rinse fluid in the second tank is decreasing and operable to close to both the second tank and the spray assembly when the level in the second tank is at a full level; a fluid connection between the second tank and the rim of the tank; and a second valve disposed in the fluid connection and operable to open to allow rinse fluid to flow from the second tank to the rim of the tank and operable to close to allow refilling of the second tank.

Abstract: A coupling apparatus includes an inner shaft rotatably driven about a longitudinal axis of rotation, an outer shaft concentric with the inner shaft for selective rotation about the longitudinal axis, a coupling element movable between a first position engaging the inner shaft to the outer shaft for rotation therewith, and a second position disengaging the inner shaft from the outer shaft for relative rotation therebetween, and an actuating element connected to the coupling element and operable to move the coupling element between the first position and the second position.

Abstract: An apparatus for cleaning and decontaminating an air distribution system includes a sources separately containing a first fluid and a second fluid, a pressurizing system for separately pressurizing the first and second fluids, a distribution subsystem for separately conveying the first and second fluids to a plurality of injectors that convert the first and second fluids into a foam-like substance before injecting the foam-like substance into the air distribution system. The apparatus includes a control system for controlling the pressure and flow rate of the first and second fluids, and a system for removing the foam-like substance from the air distribution system after the foam-like substance has cleaned and decontaminated the air distribution system. A method for cleaning and decontaminating an air distribution system is also disclosed.

Abstract: A blocking plate 3 is disposed opposing a substrate W which is held by plural chuck pins 17 and a processing liquid is supplied from a processing liquid nozzle 5 to a space SP between the front surface Wf of the substrate and an opposed surface 3a of the blocking plate 3, whereby the processing liquid attains the liquid-tight state. While the liquid-tight state with the processing liquid is maintained, the substrate W and the blocking plate 3 rotate. In this condition, a liquid (pure water) to which ultrasonic vibration has propagated is injected from an ultrasonic nozzle 7 approximately perpendicular to a side wall surface 3b of the blocking plate 3. While the ultrasonic vibration spreads inside the blocking plate 3 along the horizontal direction, some vibrational waves spread uniformly and widely from the opposed surface 3a to the processing liquid attaining the liquid-tight state and vibrate the processing liquid.

Abstract: Provided is an apparatus for controlling a washing flow of a dishwasher that can perform an upper washing, a lower washing, an alternate washing of upper and lower sides, and a concurrent washing of upper and lower sides for effective washing.

Abstract: A drawer-type dishwasher includes a pump system which functions to pump and filter washing fluid in the dishwasher. The pump system includes a sump having an inlet passage, a recirculation passage, a drain passage, a coarse article collection chamber, a filter assembly that is divided into a filter chamber and a washing fluid manifold, and a stationary hub that rotatably supports a wash arm for spraying washing fluid onto dishware supported in the dishwasher. The filter chamber includes a fine particle collection chamber having a valve that selectively opens to allow particles trapped in the filter chamber and fine particle collection chamber to flow to the drain passage. The filter assembly includes a cover having a plurality of radial spaced openings over the filter chamber, as well as a central opening that receives a stationary hub member which rotatably supports a wash arm.

Abstract: A fabric steam pocket attachment for a steam cleaner having a replaceable fabric pocket that fits snugly over a flat frame having an interior steam nozzle is provided. The frame includes two arms extending outwardly from a base with inwardly projecting fingers to form a rectangular shape. The arms are biased outwardly and may be pressed towards each other to allow for easy placement of the steam pocket on the frame.

Abstract: Clothes washing machine comprising: a common water-distribution manifold, a plurality of electromagnetic valves provided downstream of said water-distribution manifold and connected on respective outlet conduits, a plurality of chambers supplied via a respective one of said outlet conduits, a further chamber supplied with a water flow generated by the intersection of said outlet conduits, wherein a nozzle lodged in a bellows is supplied with a water flow in a fifth conduit having a respective air-gap and starting upstream of said intersection; the initial portions of said outlet conduits and of the fifth conduit, upstream the air-gaps, are a single enbloc body, which is connected to the assembly of the water flat conveyors and of said fifth conduit downstream the air-gaps.

Abstract: An apparatus for cleaning and decontaminating an air distribution system includes a sources separately containing a first fluid and a second fluid, a pressurizing system for separately pressurizing the first and second fluids, a distribution subsystem for separately conveying the first and second fluids to a plurality of injectors that convert the first and second fluids into a foam-like substance before injecting the foam-like substance into the air distribution system. The apparatus includes a control system for controlling the pressure and flow rate of the first and second fluids, and a system for removing the foam-like substance from the air distribution system after the foam-like substance has cleaned and decontaminated the air distribution system. A method for cleaning and decontaminating an air distribution system is also disclosed.

Abstract: A drive unit for dish washing machines includes solid waste chambers with bottom surfaces that are stepped. One of the solid waste chambers has an inlet/outlet port. The solid waste chambers are inclined downward toward the inlet/outlet port. Consequently, filtering capacity is increased, and discharge of solid waste is facilitated.

Abstract: A cleaning and drying apparatus is provided for a substrate holder chuck equipped with a holding members 31 (32, 33) having a plurality of holding grooves 31a (32a, 33a) for holding a plurality of wafers W respectively. The apparatus includes a atomize nozzle 50 for spraying N2-gas and deionized water to the holding grooves 31a of the holding member 31 of the chuck 30, a cleaning-liquid nozzle 60 for spraying deionized water to a side face 31b of the holding member 31 and an air cylinder 300 for causing relative movement between the atomize nozzle 50/the cleaning-liquid nozzle 60 and the holding member 31 of the chuck 30, along the longitudinal direction of the holding member 31 and horizontally. Due to driving of the air cylinder 300, the atomize nozzle 50 is constructed so as to spray N2-gas and deionized water to the holding grooves 31a of the holding member 31 in advance of the cleaning-liquid nozzle 60.

Abstract: A substrate processing apparatus and a substrate processing method is provided for performing a chemical liquid process, a cleaning process, a drying process, or the like while rotating a substrate such as a semiconductor wafer or a liquid crystal substrate. A substrate holding apparatus is provided for holding and rotating a substrate. The substrate processing apparatus for processing a substrate while supplying a fluid to the substrate includes a substrate holder for holding and rotating the substrate, and a holder suction unit for sucking the fluid from the substrate holder. The substrate holding apparatus includes a plurality of rollers which are brought into contact with an edge portion of a substrate so as to hold and rotate the substrate, and at least one moving mechanism for moving the rollers.

Abstract: Impurities can be eluted simultaneously from a plurality of local areas of a surface layer of a semiconductor substrate. A supporting unit supports the substrate, and a sample plate is disposed on the surface of the substrate. The sample plate has a plurality of holes that expose the local areas of the surface of the substrate. Eluant is provided onto the local areas of the surface layer of the substrate through the holes in the sample plate. The impurities are thus dissolved by the eluant to produce a sample. A nozzle transfers the sample from the local areas of the surface of the substrate to a plurality of sample cups. Therefore, samples from the surface layer of the substrate may be produced in a short amount of time.

Abstract: A basket (6) for loading the laundry in a washing machine, washer-drier, drier and the like comprises a innerly hollow body with a longitudinal axis (X) being the basket (6) rotation axis, wherein said body has at least one shaped length (12) the radial distance (r, r14, r15) thereof from the longitudinal axis (X) is increased towards the rear wall (8) such that the barycentre of the inner volume (10) being defined by the hollow body is displaced towards the rear wall (8), wherein in the shaped length (12) there are formed one or more steps (13) extending along a circumpherential direction to the longitudinal axis (X) each providing an increase in the radial distance (r, r14, r15) of the shaped length (12) from the longitudinal axis (X) and wherein the step defines at least two portions (14, 15) having different radial distances (r, r14, r15) from the longitudinal axis (X).

Abstract: The present invention provides a washer and washing cycle control method thereof, by which a laundry amount of a laundry can be measured prior to a water supply despite a dry state of the laundry and by which the waste of power consumption and unnecessary use of water can be prevented. The present invention includes a drum holding a laundry therein, a motor rotating the drum, and a control unit executing a sub-routine for measuring a laundry amount of the laundry prior to a water supply to the drum.

Abstract: An apparatus and method for switching a power transmission mode of a washing machine id disclosed, to prevent malfunction and damages of the washing machine by switching the power transmission mode stably in which the method includes: (a) rotating the cam (600) by driving the clutch motor (60); (b) counting the number of pulses of power supplied to the clutch motor (60); and (c) maintaining the rotation of the cam (600) until the ounted number of pulses is equal to, or greater than a preset number of pulses.

Abstract: A method for cleansing used reaction cuvettes so that whenever certain assays are to be or have been performed in the reaction cuvette, the cuvette is automatically subjected to an additional cleaning operation by providing a number of washing and drying manifolds, each of which is independently selectively activated to perform or not perform a cleaning operation.

Abstract: A stop log slot/guide cleaning method and apparatus is disclosed as a frame with attached scraping or scrubbing devices attached in locations that will contact and shear off attached marine life or debris. A flushing system that using water or compressed air or both attached and located on the frame pushes the removed or loose debris off of the stop log slot/guide seating surfaces as the frame is lowered into or removed from the slot leaving clean flat sealing surfaces for the stop log seals to seal against.

Abstract: A wash fluid containment system includes an elevated, fluid impervious surface upon which items to be washed are placed for washing. The surface is configured to cause wash fluid to flow to an edge of the surface and off of the surface to prevent buildup of wash fluid on the surface. A collecting trough is positioned in fluid flow communication with the edges of the surface to which the fluid flows to catch and collect the fluid as it flows from the surface. Used wash fluid is taken from the collecting trough for disposal or recycling and solids and debris can be easily removed from the trough.