Abstract: A particle portal imaging (PPI) system and method are provided that can be used to provide a “beam's eye view” of a patient's anatomy as a charged particle beam is delivered to a target region of the patient's body. The PPI system is capable of performing real-time image acquisition and in-situ dose monitoring using at least exit neutrons generated within the patient. The PPI system can perform charged particle treatment (PT) monitoring to monitor the particle beam being used for PT.

Abstract: A device (10) for pasteurizing and/or sterilizing particulate material. The device (10) includes: an outer housing (40); a material inlet (43); a material outlet (44); a material guide channel (41) for guiding the material through the device (10) to the material outlet (44); at least one electron source (20) for generating an electron beam; and a treatment zone (19), located in the material guide channel (41), for pasteurizing and/or sterilizing while the material is free falling. The device (10) has at least one inner shielding section (51, 52) disposed within the outer housing (40) and enclosing the material guide channel (41) for shielding off radiation produced during treatment. A method for pasteurizing and/or sterilizing particulate material using such a device (10) is also disclosed which includes: a) generating an electron beam, and b) pasteurizing and/or sterilizing the material, while the material is free falling in the treatment zone (19).

Abstract: A multi-beam apparatus for multi-beam inspection with an improved source conversion unit providing more beamlets with high electric safety, mechanical availability and mechanical stabilization has been disclosed. The source-conversion unit comprises an image-forming element array having a plurality of image-forming elements, an aberration compensator array having a plurality of micro-compensators, and a pre-bending element array with a plurality of pre-bending micro-deflectors. In each of the arrays, adjacent elements are placed in different layers, and one element may comprise two or more sub-elements placed in different layers. The sub-elements of a micro-compensator may have different functions such as micro-lens and micro-stigmators.

Abstract: High-energy optical disinfection systems inside a commercial airplane using highly efficient, flexible, and durable side-emitting optical fibers optically coupled to high-energy UV-C laser diodes to destroy submicroscopic infectious agents and inactivate microorganisms inside the airplane. With the high-energy UV-C laser diodes optically coupled to the side-emitting optical fibers, which can be easily routed to different areas inside the airplane, the high-energy UV-C laser light emitted from the side of the optical fiber will disinfect the airplane along a wide or long swath continuously without interruption.

Abstract: The invention relates to a charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets. The charged particle beam device comprises a specimen holder for holding a specimen; a source for producing a beam of charged particles; and an illuminator for converting said beam of charged particles into a plurality of charged particle beamlets and directing said plurality of charged particle beamlets onto said specimen. According to the disclosure, the illuminator comprises a multi-aperture lens plate having a plurality of apertures for defining the corresponding plurality of charged particle beamlets; as well as at least a first electrode for generating an electrical field at a surface of the multi-aperture lens plate. The apertures in said multi-aperture lens plate have a noncircular cross-sectional shape to correct for neighbouring aperture induced aberrations. This allows for decreased spot size, and with this imaging resolution of the device is increased.

Abstract: In one embodiment, a data generation method includes generating a plurality of parametric elements by dividing, at positions of an extremum and an inflection point, a parametric curve that expresses a shape of a writing pattern and is defined by a plurality of control points arranged in order in a predetermined direction, generating a polygon by extracting, for each of the parametric elements, one or some of the plurality of control points and connecting the extracted control points in order in the predetermined direction, calculating a coverage by the polygon in each of a plurality of rectangular segmented regions obtained by dividing a target to be irradiated with a charged particle beam into a predetermined size, and calculating a coverage of each segmented region in a peripheral part of the writing pattern by finding intersections of each of the plurality of parametric elements and four sides of each of the plurality of segmented regions.

Abstract: A new scanning electrochemical microscopy tip positioning method that allows topography and surface activity to be resolved independently is presented. A SECM tip is oscillated relative to the surface of interest. Changes in the oscillation amplitude, caused by the intermittent contact of the SECM tip with the surface of interest, are used to detect the surface of interest, and as a feedback signal for various types of imaging.

Abstract: This disclosure includes a description of a sanitizing system for sanitizing a mobile electronic device comprising: a housing; a sanitizer contained within the housing configured to emit radiation with a sanitizing effect; and an entry system with a default closed position, the entry system being configured to permit a mobile electronic device to pass through the entry system and then automatically return to the default closed position, the entry system comprising a first outer enclosure and a second inner obstruction; wherein the entry system blocks radiation emitted within the sanitizing system to a level acceptable for consumer use, or wherein the second inner obstruction provides more radiation attenuation than the first outer enclosure, and/or wherein the combination of the first outer enclosure and the second inner obstruction provides more radiation attenuation than the first outer enclosure by itself. Disclosed are internal reflectors to help distribute sanitizing radiation generally evenly.

Abstract: The present invention relates to a microplastic detection device and method based on a pyrolysis-mass spectrometry technology. The microplastic detection device based on a pyrolysis-mass spectrometry technology provided by the present invention is substantially a sealed gas path device system formed connected via pipelines. The device includes a working gas source, a pyrolysis device, a filter and a mass spectrometer which are connected in sequence. After a microplastic sample is placed into the pyrolysis device, the microplastic sample is decomposed in the pyrolysis device, and pyrolysis products from the microplastic sample driven by a carrier gas of the working gas source enter the mass spectrometer for detection and analysis after being filtered by the filter. Furthermore, the present invention provides a microplastic detection method based on a pyrolysis-mass spectrometry. The present invention is widely applied to the field of a microplastic detection technology.

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes a blanking aperture array substrate provided with a plurality of blankers configured to respectively perform blanking deflection on a plurality of charged particle beams included in a multi-beam, and a first shield member which is disposed downstream of the blanking aperture array substrate with respect to a travel direction of the multi-beam, has a cylindrical part in which the multi-beam passes through, and is composed of a high magnetic permeability material.

Abstract: A method of generating a layout pattern includes determining a first energy density indirectly exposed to a first feature of one or more features of a layout pattern on an energy-sensitive material when the one or more features of the layout pattern on the energy-sensitive material are directly exposed by a charged particle beam. The method also includes adjusting a second energy density exposed the first feature when the first feature is directly exposed by the charged particle beam. A total energy density of the first feature that comprises a sum of the first energy density from the indirect exposure and the second energy density from the direct exposure is maintained at about a threshold energy level to fully expose the first feature in the energy-sensitive material.

Abstract: Provided herein are systems, devices, articles of manufacture, and methods for generating neutrons employing a high energy ion beam target (HEM target) and a target backing configured to be in contact with the bottom surface of the HEIB target (e.g., to generate an ion beam target assembly). In certain embodiments, the HEM target has a thickness that is less than the penetration depth of protons or deuterons in the high energy ion beam that strikes the target. In certain embodiments, the target backing comprises a high hydrogen diffusion metal (e.g., palladium), has open spaces dispersed throughout for reduced proton diffusion distances, and has a shape and thickness such that all, or virtually all, of the protons or deuterons that pass through the HEIB target are stopped. Also provided herein are systems, devices, and methods for changing targets in an ion beam accelerator system.

Abstract: In one embodiment, a multi-charged-particle-beam writing method includes performing a tracking operation such that, while a substrate placed on a stage moving continuously is being irradiated with multiple beams including a plurality of charged particle beams, deflection positions of the multiple beams follow movement of the stage, and applying the multiple beams to the substrate having a writing area including a plurality of rectangular regions arranged in a mesh during the tracking operation such that each of the plurality of rectangular regions is irradiated with the multiple beams. Each rectangular region includes a plurality of pixels each having a predetermined size and arranged in a mesh. At least one subset of the plurality of pixels is irradiated with the multiple beams in a first shot order and is then irradiated with the multiple beams in a second shot order different from the first shot order.

Abstract: Aspects of the disclosure provide a method of preparing a focused ion beam (FIB) sample and analyzing the sample in an electron microscope system. The method can include forming, over a substrate, a target film having a thickness of less than a threshold corresponding to a limit for FIB requirements, and forming a supporting film over the target film. The method can also include obtaining a FIB sample that includes a portion of the target film and a portion of the supporting film and. The method can further include analyzing the obtained portion of the target film in an electron microscope system.

Abstract: The present application relates to an unloading and temporary storage device. The unloading and temporary storage device includes a stock bin, a stock bin external member, a stock bin internal member, a shielding module and a loading module; the stock bin includes a barrel and a tank body; the stock bin external member includes a cooling water jacket; the stock bin internal member includes a straight bin, an inclined bin and an unloading bin that communicate sequentially; the shielding module includes an external shield and a neutron shield; the loading module includes a loading body; and sphere inlet passages are provided in the loading body. The unloading and temporary storage device can perform the functions of receiving, temporarily storing, atmosphere switching, and unloading of spherical elements, and also has the safety functions of ensuring geometrical integrity of the spherical elements, radiological protection and residual heat removal.

Abstract: A method of processing a region of a sample, the method comprising: positioning a sample within a vacuum chamber; generating an ion beam with a focused ion beam (FIB) column; focusing the ion beam on the sample and scanning the focused ion beam across the region of the sample thereby generating secondary electrons that are ejected from a surface of the sample within the region; and during the scanning, applying a negative bias voltage to an electrically conductive structure proximate the region to alter a trajectory of the secondary electrons and repel the secondary electrons back to the sample surface, wherein the electrically conductive structure is one of a gas injection nozzle, a voltage pin or a nano-manipulator.

Abstract: Processing an object using a material processing device with a particle beam apparatus includes determining a region of interest of the object on or in a first material region of the object, ablating material from a second material region adjoining the first material region using an ablation device, and recognizing a geometric shape of the first material region. The geometric shape has a center. Processing the object also includes ablating material from a second portion of the first material region adjoining a first portion using a particle beam, the first portion having a first subregion and a second subregion, the region of interest being arranged in the first subregion, recognizing a further geometric shape of the first material region, positioning the object such that the first position corresponds to a center of the further geometric shape, and ablating material from the second subregion using the particle beam.

Abstract: At the time of superimposing and aligning a stained image and a mass spectrometric (MS) image obtained for the same sample, an image display processor displays, on the superimposed images, grid lines (62) at the spacing corresponding to an operation of a grid spacing adjustment slider (63). When an operator depresses an image deformation range “SET” button (64), specifies an arbitrary area on the superimposed images with a mouse, and then depresses a “SELECT” button (65), an image deformation range specification receiving section determines an image deformation range. When the operator selects an intersection (grid point) of the grid lines (62) within the image deformation range and performs an operation of moving the intersection point to an arbitrary position, an image deformation processor deforms an image included in the image deformation range in accordance with the operation.

Abstract: The invention generally relates to electrophoretic mass spectrometry probes and systems and methods of uses thereof. In certain aspects, the invention provides a mass spectrometry probe having a hollow body with a distal tip, an electrically conductive hollow conduit, and an electrode. The electrically conductive hollow conduit may be operably coupled to a reservoir and a power source, and the electrically conductive hollow conduit may be configured to transport a liquid sample into the hollow body and polarize the liquid sample as it flows through the electrically conductive hollow conduit and into in the hollow body. The electrode and the electrically conductive hollow conduit are disposed within the hollow body (e.g., at different heights within the hollow body).

Abstract: Various embodiments of the present technology generally relate to devices and methods for generating and directing energetic electrons toward a target. More specifically, some embodiments relate to devices, systems, and methods for generating and directing energetic electrons based in the photoelectric effect and directing electric field-focused beams of the energetic electrons toward a target. Electron guns according to the present technology include one or more light sources to stimulate electron transmission, and a series of differentially charged stages to provide a hollow path allowing electrons generated by the photoelectric effect of the light irradiated on interior surfaces defining the path through the stages to travel to an exit of the electron gun. Each of the differentially charged stages have a different potential, thereby providing electrons having two or more different and tunable energy levels exiting as a beam from the electron gun.