Patents Examined by Shane Fang
  • Patent number: 11584826
    Abstract: An interpenetrating network (IPN) polymer membrane material includes a soft polyurethane interspersed with a crosslinked conducting polymer. The material can be reversibly “switched” between its oxidized and reduced states by the application of a small voltage, ˜1 to 4 volts, thus modulating its diffusivity.
    Type: Grant
    Filed: March 24, 2022
    Date of Patent: February 21, 2023
    Assignee: The Government of the United States of America, as represented by the Secretary of the Navy
    Inventors: Brett D. Martin, Jawad Naciri, Banahalli R. Ratna
  • Patent number: 11584825
    Abstract: Water-soluble photoactive polymers, included polymer tandem dyes, as described as well as methods for their preparation and use. The photoactive polymers can be prepared by direct modification of core polymers (e.g., violet excitable polymers) with dyes or other functional groups. Methods of detecting analytes using the polymers are also described.
    Type: Grant
    Filed: December 11, 2019
    Date of Patent: February 21, 2023
    Assignee: Beckman Coulter, Inc.
    Inventors: Arunkumar Easwaran, Sergei Gulnik, Massimiliano Tomasulo
  • Patent number: 11578208
    Abstract: An aromatic polysulfone resin having a repeating unit represented by Formula (I) and a repeating unit represented by Formula (II), in which a ratio (m:n) of a molar content (m) of the repeating unit represented by Formula (I) to a molar content (n) of the repeating unit represented by Formula (II) is 1:2,000 to 1:200. wherein hydrogen atoms of phenylene groups of Formulae (I) and (II) may be each independently substituted with an alkyl group, an aryl group, or a halogen atom.
    Type: Grant
    Filed: November 29, 2018
    Date of Patent: February 14, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Yusaku Kohinata
  • Patent number: 11572443
    Abstract: Poly(aryl ether sulfones) (PAES) polymers (P1) which are functionalized with reactive functional groups on at least one end of the PAES polymer, a process for preparing the PAES polymers (P1), a process for preparing block copolymers (P2) using the functionalized poly(aryl ether sulfones) (PAES) polymers (P1) and the block copolymers (P2) obtainable by such process
    Type: Grant
    Filed: January 18, 2019
    Date of Patent: February 7, 2023
    Assignee: SOLVAY SPECIALTY POLYMERS USA, LLC
    Inventors: Stéphane Jeol, Joel Pollino
  • Patent number: 11572351
    Abstract: A chemical formulation having at least one solvent and a chemical having the structure of Formula (I): where R includes at least one aromatic moiety, and X and X? may both or independently include an aromatic moiety, an aliphatic moiety, or a hydrogen.
    Type: Grant
    Filed: May 27, 2021
    Date of Patent: February 7, 2023
    Assignee: Systima Technologies, Inc.
    Inventors: Richard D. Hreha, Tat H. Tong
  • Patent number: 11566035
    Abstract: A compound having a formula: Formula I useful as emitters in OLEDs is disclosed.
    Type: Grant
    Filed: June 30, 2021
    Date of Patent: January 31, 2023
    Assignee: Universal Display Corporation
    Inventors: Hsiao-Fan Chen, Mingjuan Su
  • Patent number: 11552249
    Abstract: A polyimide luminescent material, a preparation method, and a used thereof are disclosed; the polyimide luminescent material includes a polyimide resin and a rare earth complex distributed in the polyimide resin, wherein the polyimide resin is a condensation polymer of an aromatic diamine containing a bidentate chelate ligand and an aromatic dianhydride, and the rare earth complex and the bidentate chelate ligand are connected by a chemical bond. The luminescent material has enhanced fluorescence intensity, thermal stability, and mechanical properties. The preparation method is simple and easy, and is suitable for industrial production.
    Type: Grant
    Filed: January 20, 2020
    Date of Patent: January 10, 2023
    Assignee: Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
    Inventor: Yamin Wang
  • Patent number: 11549011
    Abstract: A method for synthesizing a poly(phenylene) with high ion selectivity comprises dissolving an alkyl halide poly(phenylene) in a polar aprotic solvent to form a nonaqueous solution and adding an anhydrous nucleophile to the nonaqueous solution to replace the halide of the alkyl halide poly(phenylene) with a cationic group of the nucleophile. The poly(phenylene) can be used in anion exchange membranes.
    Type: Grant
    Filed: January 6, 2022
    Date of Patent: January 10, 2023
    Assignee: National Technology & Engineering Solutions of Sandia, LLC
    Inventor: Cy Fujimoto
  • Patent number: 11548983
    Abstract: A fluorine-containing polybenzimidazole containing a repeating unit represented by the following formula (1): wherein Rf is —SO2—, —O—, —CO—, an alkylene group optionally containing a substituent, or a group represented by the following: wherein two Xs are each individually a hydrogen atom or a monovalent organic group; and R1 is a divalent organic group. Also disclosed is a polybenzimidazole precursor polyamide, a polybenzimidazole production method, film, flexible wiring board, printed circuit board, and polymer electrolyte membrane.
    Type: Grant
    Filed: September 14, 2018
    Date of Patent: January 10, 2023
    Assignees: DAIKIN INDUSTRIES, LTD., NATIONAL UNIVERSITY CORPORATION, IWATE UNIVERSITY
    Inventors: Yoshiyuki Oishi, Tsuyoshi Noguchi, Tadashi Kanbara
  • Patent number: 11542364
    Abstract: The present disclosure provides a curing agent comprising a polyetheramine, a tertiary amine substantially free of an aromatic tertiary amine and glycerin. The curing agent may be combined with an epoxy resin to form a curable composition which is capable of being applied to a substrate and cured to form a cured article.
    Type: Grant
    Filed: February 5, 2018
    Date of Patent: January 3, 2023
    Inventors: Wei-Yang Su, Hui Zhou
  • Patent number: 11535712
    Abstract: A polythioether prepolymer including functional groups capable of being obtained by the reaction: of at least one compound T having a number f of thiol functional group number selected from 2, 3, 4 and 6, with at least one compound E having a number g of epoxy functional groups number selected from 2 and 3. Also, a method of preparation for this prepolymer, a composition including this prepolymer and an oligomer as well as its use as a mastic and a polythioether polymer obtained from this polythioether prepolymer with an oligomer.
    Type: Grant
    Filed: July 6, 2020
    Date of Patent: December 27, 2022
    Assignee: SOCOMORE
    Inventors: Sébastien Genty, Germain Fauquet, Philippe Tingaut
  • Patent number: 11535701
    Abstract: Solvent-linked porous covalent organic polymers (COPs) and a method of preparing the same are described. The porous covalent organic polymers are linked by a solvent and are thus suitable for the transportation and storage of natural gas. A method of preparing the porous covalent organic polymers by conducting alkylation polymerization between an aromatic monomer and a chlorine-based solvent in the presence of a Lewis acid catalyst is described. Porous stretchable covalent organic polymers having pores with various sizes can be synthesized simply and quickly at room temperature and atmospheric pressure without a heating or purification step. The covalent organic polymers have very high natural gas storage capacity due to the flexible porous network structure thereof and thus are suitable for storage and transportation of natural gas and useful as a natural gas adsorbent.
    Type: Grant
    Filed: March 4, 2020
    Date of Patent: December 27, 2022
    Assignee: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Cafer T. Yavuz, Vepa Rozyyev, Joo Sung Lee
  • Patent number: 11525018
    Abstract: This invention provides a polymer, which is preferably a polyether polymer. The polymer may be uses in coating compositions. Containers and other articles comprising the polymer and methods of making such containers and other articles are also provided. The invention further provides compositions including the polymer (e.g., powder coatings), which have utility in a variety of coating end uses, including, for example, valve and pipe coatings.
    Type: Grant
    Filed: August 16, 2020
    Date of Patent: December 13, 2022
    Inventors: Jeffrey Niederst, Robert M. O'Brien, Kevin Romagnoli, Mark S. Von Maier, Lan Deng, Richard H Evans, David J. Santure, Benoit Prouvost
  • Patent number: 11518845
    Abstract: The present disclosure provides a curing agent comprising a polyetheramine, a tertiary amine and an alkanolamine. The curing agent may be combined with an epoxy resin to form a curable composition which is capable of being applied to a substrate and cured to form a cured article.
    Type: Grant
    Filed: February 5, 2018
    Date of Patent: December 6, 2022
    Assignee: Huntsman Petrochemical LLC
    Inventors: Wei-Yang Su, Hui Zhou
  • Patent number: 11518839
    Abstract: Compositions, methods, and resins using alkyl aldehydes and phenols are provided herein. In one embodiment, a composition comprising an alkylphenol resin can be prepared by condensing at least one phenolic monomer selected from the group consisting of phenol, cresol, resorcinol, xylenol, ethyl phenol, alkylresorcinols, and combinations thereof; and at least one alkyl aldehyde having from 5 to 12 carbon atom alkyl groups. The alkylphenol resins of the application are free of octylphenol or nonylphenol monomers. In one embodiment, the alkylphenol resins may be prepared using formaldehyde, and alternatively, in another embodiment, the alkylphenol resins may be prepared without the use of formaldehyde. The process to make these new alternative alkylphenol resins is a cost effective process and easy to scale-up.
    Type: Grant
    Filed: August 13, 2020
    Date of Patent: December 6, 2022
    Inventors: Ashok T. Reddy, Justyne Marie Willman
  • Patent number: 11512199
    Abstract: The present invention provides a resin composition which is highly sensitive and exhibits high chemical resistance even in the case of being baked at a low temperature of 250° C. or less and can suppress the generation of outgas after curing. The present invention is a resin composition which contains (a) an alkali-soluble resin containing polyimide, polybenzoxazole, polyamide-imide, a precursor of any one of these compounds and/or a copolymer of these compounds and (b) an alkali-soluble resin having a monovalent or divalent group represented by the following general formula (1) in a structural unit and in which the modification rate of a phenolic hydroxyl group in the alkali-soluble resin (b) is 5% to 50%. (In general formula (1), O represents an oxygen atom. R1 represents a hydrogen atom or a hydrocarbon group which has 1 to 20 carbon atoms and may be substituted and R2 represents an alkyl group having 1 to 5 carbon atoms. s and t each independently represent an integer from 0 to 3.
    Type: Grant
    Filed: October 31, 2017
    Date of Patent: November 29, 2022
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Yusuke Komori, Kazuto Miyoshi
  • Patent number: 11515489
    Abstract: A compound of Formula I: wherein ring A is a 5-membered or 6-membered aromatic ring; wherein RA, RB, and RC each independently represent mono to the maximum allowable substitution, or no substitution; wherein Y1 is absent or present, and when present is selected from the group consisting of a direct bond, O, S, Se, CRR?, NR, SiRR?, and BR; wherein each X1-X3 is N or CR; wherein at least one of X1-X3 is N; wherein each A1-A5 is independently C or N; wherein the maximum number of N atoms that can connect to each other within each ring is two; wherein each R1, R2, R3, and R4 is independently selected from the group consisting of alkyl, cycloalkyl, heteroalkyl, heterocycloalkyl, aryl, heteroaryl, and combinations thereof; wherein each R, R?, RA, RB, and RC is independently a hydrogen or a substituent selected from the group consisting of deuterium, halogen, alkyl, cycloalkyl, heteroalkyl, heterocycloalkyl, arylalkyl, alkoxy, aryloxy, amino, silyl, alkenyl, cycloalkenyl, heteroalkenyl, alkynyl, aryl, heteroa
    Type: Grant
    Filed: November 14, 2019
    Date of Patent: November 29, 2022
    Assignee: Universal Display Corporation
    Inventors: Peter Wolohan, Tyler Fleetham, Jason Brooks, Rasha Hamze, Nicholas J. Thompson
  • Patent number: 11512169
    Abstract: A semicrystalline polyphenylsulfone, has the structure Formula (I) wherein n and R are defined herein. The semicrystalline polyphenylsulfone, which exhibits a crystalline melting point in a range of 215 to 270° C., can be prepared from amorphous polyphenylsulfone using a solvent-induced crystallization method. An additive manufacturing method utilizing particles of the semicrystalline polyphenylsulfone is described.
    Type: Grant
    Filed: June 26, 2019
    Date of Patent: November 29, 2022
    Assignee: SHPP GLOBAL TECHNOLOGIES B.V.
    Inventors: Elena Miloskovska, Bruke Jofore, Robert Russell Gallucci
  • Patent number: 11505653
    Abstract: A composition comprising at least one terminally-unsaturated diarylsulfide compound represented by the formula: wherein each R represents an allyl group or a propargyl group. The composition may further comprise an organic polythiol, and optionally a free-radical initiator, and may be formulated as a two-part polymerizable composition. Methods of polymerizing the compositions are also disclosed.
    Type: Grant
    Filed: July 17, 2018
    Date of Patent: November 22, 2022
    Assignee: 3M Innovative Properties Company
    Inventors: Wayne S. Mahoney, Saswata Chakraborty, Guy D. Joly, Jonathan A. Anim-Addo
  • Patent number: 11506980
    Abstract: Provided are: a resist underlayer film formation composition combining high etching resistance, high heat resistance, and excellent coating properties; a resist underlayer film in which the resist underlayer film formation composition is used and a method for manufacturing the resist underlayer film; a method for forming a resist pattern; and a method for manufacturing a semiconductor device. The resist underlayer film formation composition is characterized by including the compound represented by Formula (1), or a polymer derived from the compound represented by Formula (1) (where: AA represents a single bond or a double bond; X1 represents —N(R1)—; X2 represents —N(R2)—; X3 represents —CH(R3)—; X4 represents —CH(R4)— etc.; R1, R2, R3, and R4 represent hydrogen atoms, C1-20 straight chain, branched, or cyclic alkyl groups, etc.; R5, R6, R9, and R10 represent hydrogen atoms, hydroxy groups, alkyl groups, etc.; R7 and R8 represent benzene rings or naphthalene rings; and n and o are 0 or 1).
    Type: Grant
    Filed: April 20, 2018
    Date of Patent: November 22, 2022
    Assignee: NISSAN CHEMICAL CORPORATION
    Inventors: Hikaru Tokunaga, Keisuke Hashimoto, Rikimaru Sakamoto