Abstract: In one embodiment, a fluid delivery apparatus includes a vessel body having a first chamber and a second chamber disposed therein, a plurality of first delivery lines fluidly coupled to the first chamber, a dispense nozzle fluidly coupled to the second chamber, a second delivery line fluidly coupled to the second chamber, and a valve disposed between the first and second chambers. Here, fluid communication between the first chamber and the second chamber is controlled by the valve disposed therebetween. Polishing fluid components are flowed into the first chamber through the plurality of first delivery lines fluidly coupled thereto to form a batch of polishing fluid. Once formed, the batch of polishing fluid is transferred to the second chamber by opening the valve.

Abstract: A surface cleaning apparatus has a cyclone and a dirt collection chamber wherein the dirt collection chamber has a dirt collection chamber portion which is located axially spaced from the cyclone chamber and the dirt collection chamber portion has a transverse section in a plane transverse to the longitudinal axis of the cyclone that is annular.

Abstract: An all-purpose, multi-use touchup tool designed for home, office, and general construction work for producing a pleasant, show-quality finish to the construction project. The system generally includes a multitool having up to ten functional touch-up tasks capable of being performed thereby, including multiple blade edges, brushes, and measuring elements. A holder element can be joined with the multitool to expand the functionality of each. The system could include other touchup tools and elements such as a storage cup, wipes, and additional brushes and sanding elements.

Abstract: A surface cleaning apparatus has a surface cleaning head and an upper portion moveably mounted to the surface cleaning head between a storage position and a floor cleaning position, the upper portion has upper portion laterally extending members. An above floor cleaning wand is removably receivable in air flow communication with the upper portion. The wand has wand laterally extending members, wherein, when the wand is received in air flow communication with the upper portion and the upper portion is in the storage position, the wand has a lower end and an upper end spaced from the lower end along a wand axis and the wand laterally extending members are positioned above the upper portion laterally extending members.

Abstract: A chemical mechanical planarization apparatus includes a multi-zone platen comprising a plurality of individually controlled concentric toroids. The rotation direction, rotation speed, applied force, relative height, and temperature of each concentric toroid is individually controlled. Concentric polishing pads are affixed to an upper surface of each of the individually controlled concentric toroids. The chemical mechanical planarization apparatus includes a single central slurry source or includes individual slurry sources for each individually controlled concentric toroid.

Abstract: An upright surface cleaning apparatus is has a portable surface cleaning unit removably mounted to an upper portion that is pivotally mounted to a surface cleaning head. The surface cleaning apparatus is operable in a floor cleaning mode in which the portable surface cleaning unit is mounted to the upper portion and the above floor cleaning wand is inserted in an open upper end of the upper portion. The surface cleaning apparatus is also operable in an above floor cleaning mode in which the portable surface cleaning unit is mounted to the upper portion and the above floor cleaning wand is removed from the open upper end of the upper portion. When the surface cleaning apparatus is in the floor cleaning mode, the first mounting members of the portable surface cleaning unit engage the wand mounting members.

Abstract: A chemical mechanical polishing apparatus includes a platen having a top surface to hold a polishing pad, a carrier head to hold a substrate against a polishing surface of the polishing pad during a polishing process, and a temperature monitoring system. The temperature monitoring system includes a non-contact thermal sensor positioned above the platen that has a field of view of a portion of the polishing pad on the platen. The sensor is rotatable by the motor around an axis of rotation so as to move the field of view across the polishing pad.

Abstract: A device for lifting a wheel and rolling the wheel on a surface includes an elongated rigid plate having a top side, a bottom side, a peripheral edge, a pedal portion at a rear end of the rigid plate, and a wheel portion at a forward end of the rigid plate. A roller is fixed with the bottom side of the rigid plate and the peripheral edge of the wheel portion at the forward end of the rigid plate is bent upward to form a tire-tread engaging lip, at least a portion of which engages a tread of the wheel. In use, with the wheel resting on the wheel portion, the pedal portion may be pressed downwardly to pivot the rigid plate about the roller to lift the wheel. The lifting device is then rolled on the surface to place the wheel at a desired position.

Abstract: To change the direction of water flowing toward a painted surface so as to flow toward the center side of a hood, a water deflecting member is provided that extends toward the center side of the hood while extending toward the painted surface as seen in a state where automatic wet sanding is performed. Thus, water bouncing off the painted surface is less likely to scatter over a wide area of the painted surface, and sanding dust is also less likely to scatter over a wide area of the painted surface. As a result, it is possible to eliminate the need for the troublesome task of wiping off sanding dust remaining on the painted surface, and to achieve a quality finish on the painted surface.

Abstract: An evacuation station for a mobile floor cleaning robot comprises a stationary base portion having an upper surface and an air treatment assembly that is rotatable from an in-use position to a removable position in which all of the air treatment assembly is removable from the stationary base portion.

Abstract: A method and apparatus for dispensing polishing fluids and onto a polishing pad within a chemical mechanical polishing (CMP) system are disclosed herein. In particular, embodiments herein relate to a CMP system with a first fluid delivery arm and a second fluid delivery arm disposed over the polishing pad to dispense liquid, such as a polishing fluid or water. The first fluid delivery arm is disposed over at least 50% of the radius of the polishing pad, while the second fluid delivery arm is disposed over less than 50% of the radius of the polishing pad. The second fluid delivery arm is configured to dispense either a polishing fluid or a water onto the polishing pad to effect the polishing rate at the edge of the substrate.

Abstract: A method of conditioning a polishing pad includes receiving information on a roughness of the polishing pad from a first sensor. The method further includes conditioning the polishing pad using a conditioner. The method further includes detecting the roughness of the polishing pad following the conditioning. The method further includes repeating the conditioning in response to the detected roughness of the polishing pad being outside of a threshold roughness range.

Abstract: A vacuum chuck is provided, comprising: a vacuum buffer in fluid communication with a vacuum source, the vacuum buffer being an enclosed volume in the vacuum chuck; a top plate, defining surface features on a first side, and an internal network of distribution channels open to the first side via through holes; and a flow valve configured to control fluid communication between the network of distribution channels and the vacuum buffer. By opening the flow valve, negative pressure is applied from between a substrate disposed on the first side of the top plate through the through holes into the vacuum buffer, thereby flattening the substrate against at least part of the first side of the top plate.

Abstract: Systems and methods for providing a vacuum cleaner with sliding vacuum head assembly. The vacuum head assembly comprises, for example, a vacuum motor, a dust bin, and a fan. The vacuum clean is configured for cleaning high and low surfaces based on a position of the vacuum head assembly along the vacuum tube.

Abstract: A vacuum cleaner has an upright support structure pivotally mounted to a cleaning head. A portable surface cleaning unit is removably mounted to the upright support structure. The portable surface cleaning unit has a cyclone chamber, a dirt collection chamber exterior to the cyclone chamber and a suction motor. When the portable surface cleaning unit is mounted to the upright support structure and the upright support structure extends upwardly from the cleaning head, the upper end wall of the dirt collection chamber and the cyclone chamber end wall are an openable upper wall of the portable surface cleaning unit.

Abstract: In an automatic wet sanding apparatus including a disc and a cushion pad, a disc center hole is formed at a central portion of the disc and a pad center hole is formed at a central portion of the cushion pad. Water having been supplied to an introduction space inside a skirt is stirred as an eccentric head rotates eccentrically and thereby pushed out toward a painted surface via the disc center hole and the pad center hole with enhanced pressure. Thus, sanding dust resulting from automatic wet sanding can be washed away toward an outer circumferential side by the water that is pushed out toward the outer circumferential side, so that the likelihood of clogging due to sanding dust can be reduced and high sanding efficiency can be maintained.

Abstract: A chemical mechanical polishing apparatus includes a rotatable platen to hold a polishing pad, a rotatable carrier to hold a substrate against a polishing surface of the polishing pad during a polishing process, a polishing liquid supply port to supply a polishing liquid to the polishing surface, a thermal control system including a movable nozzle to spray a medium onto the polishing surface to adjust a temperature of a zone on the polishing surface, an actuator to move the nozzle radially relative to an axis of rotation of the platen, and a controller configured to coordinate dispensing of the medium from the nozzle with motion of the nozzle across the polishing surface.

Abstract: A sealing portion on a lower end of a cover portion of a spindle cover has an upper side surface and a lower side surface that are inclined toward an outer circumferential surface of a spindle. A larger-diameter disk and the outer circumferential surface of the spindle define therebetween a second gap that is narrower than a first gap defined between the spindle and the cover portion. The second gap is effective to prevent a processing waste liquid from entering between the spindle and the spindle cover to prevent a solid waste contained in the processing waste liquid from sticking to the spindle. The spindle is thus prevented from becoming less liable to rotate smoothly due to solid waste deposits.

Abstract: A precision locating fastening device for securing a part. The device includes a drive screw, a base member, and a stop member. The drive screw has a gripping surface. The base member houses the drive screw and has a precision locating surface. The part is retained and located adjacent the precision locating surface relative to a fixture plate. The drive screw has one or more keyed ends. The stop member is replaceable to maintain precision and accuracy while locating and retaining the part. The device is incorporated in a system where a first keyed end of a first fastening device, a second key of the first fastening device, or the keyed end of a drive screw of a second fastening device is adjusted from either the first side of the fixture plate, the second side of fixture plate, or both to retain and locate the part on the fixture plate.

Abstract: A polishing pad conditioning apparatus according to an example embodiment of the present inventive concept includes an apparatus body, a pivot arm provided on the apparatus body and including a housing having an internal space and provided at a distal end portion of the pivot arm and a head unit disposed at the distal end portion of the pivot arm. The head unit includes: a rotary motor provided in the internal space of the housing, the rotary motor including a rotary shaft; a foreign material blocking member connected to the rotary shaft; a disk holder connected to the rotary shaft; and a conditioning disk coupled to the disk holder. The foreign material blocking member includes a fluid flow groove configured to guide a movement of fluid for preventing foreign objects from entering the housing on an outer surface of the foreign material blocking member.