Abstract: PROBLEM: To provide a large device and a method which is advantageous for forming a large-area amorphous film. SOLUTION: A device of the invention sprays a flame including a particulate material with a spraying machine toward a substrate, melts the material with the flame, and cools the material and flame by cooling gas before they reach the substrate to form an amorphous film. The spraying machine has particulate material spraying ports and flame spraying ports such that the flame including the material has an oblong cross section. Inert gas spraying ports are successively placed on both sides across the ports of the material and flame. Mist spraying ports are successively placed on both sides across the ports for the material, flame and inert gas. A skirt is attached/detached depending on a combustion gas or a film width to restrain film width narrowing and increase of film thickness deviation.

Abstract: An installation for hot dip coating a metal strip is provided. The installation includes a device for moving the metal strip along a path, a pot for containing a melt bath and a wiping system including at least two nozzles placed on either side of the path downstream the pot. The wiping system has a box with a lower confinement part confining an atmosphere around the metal strip upstream of said nozzles and an upper confinement part confining the atmosphere around the metal strip downstream of the nozzles, first moving means for vertically moving the lower confinement part with respect to the pot and second moving means for vertically moving the upper confinement part with respect to both the pot and the lower confinement part. The nozzles are vertically movable relative to the pot.

Abstract: A dispensing and ultraviolet (UV) curing system is disclosed with low backscatter. The system includes a dispenser for dispensing an ultraviolet (UV) curable material onto a substrate and a UV radiation source assembly coupled to the dispenser and operable to facilitate curing the UV curable material that has been dispensed onto the substrate. The UV radiation source assembly has a UV radiation source with a first optical axis and an optical element with a second optical axis. The second optical axis is different than the first optical axis. The optical element is configured such that, during operation, UV radiation from the UV radiation source passes through the optical element.

Abstract: The present invention relates to an apparatus of manufacturing an aerogel sheet. The apparatus of manufacturing the aerogel sheet includes: a fixing vessel into which a blanket is inserted; and an impregnation device putting a silica sol precursor into the blanket inserted into the fixing vessel to impregnate and gelate the silica sol precursor, wherein the impregnation device includes a rotation roller moving from one end to the other end of a top surface of the blanket while rotating to put the stored silica sol precursor into the blanket and thereby to impregnate and gelate the silica sol precursor.

Abstract: A method for thinning a wafer is provided. The method includes placing a wafer on a support assembly and securing an etching mask to a backside of the wafer. The etching mask covers a peripheral portion of the wafer. The method further includes performing a wet etching process on the backside of the wafer to form a thinned wafer, and the thinned wafer includes peripheral portions having a first thickness and a central portion having a second thickness smaller than the first thickness. A system for forming the thinned wafer is also provided.

Abstract: Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A modular hydraulic unit houses the elongate bladder and hydraulic fluid in contact with an exterior surface of the bladder. When pressurized process fluid is in the elongate bladder, hydraulic controls can selectively reduce pressure on the bladder to cause expansion, and then selectively increase hydraulic pressure to assist with a dispense action.

Abstract: A device for processing a strip guided along a running direction may include a roller holder disposed on a base frame so as to be pivotable about a pivot axis oriented substantially parallel to a strip running surface. A first processing roller may be disposed on the roller holder in the running direction and at a distance from the pivot axis perpendicular to the running direction and offset from the pivot axis such that by pivoting the roller holder, the first processing roller is moved toward the strip and the processing roller is moved away from the strip. A first counter-processing roller may be disposed transversely to the running direction at a further distance from the pivot axis than the first processing roller such that the first processing and counter-processing rollers interact to guide the strip if the first processing roller is moved toward the strip.

Abstract: The present disclosure relates to a substrate processing apparatus, and more particularly, to a substrate processing apparatus capable of blocking particles falling from a lower portion of a substrate to a surface of a lower substrate. The substrate processing apparatus in accordance with an exemplary embodiment may include a substrate boat including a plurality of hollow plates coupled to a plurality of rods in a multistage manner, wherein a plurality of substrates are respectively loaded on the plurality of hollow plates, a reaction tube having an accommodation space in which the substrate boat is accommodated, a gas supply part configured to supply a process gas into the reaction tube from one side of the reaction tube, and an exhaust part configured to exhaust a process residue in the reaction tube from the other side of the reaction tube. Each of the hollow plates may include an edge portion defining a hollow portion vertically passing therethrough.

Abstract: The support pin has a head supporting a substrate and a support cylinder supporting the head. Through-holes through which a coupling member for coupling the head and the support cylinder is inserted are respectively provided in the head and the support cylinder. The support pin is disposed in a reaction chamber of the film deposition device forming a film on the substrate. The head has a placing part on which the substrate is placed and an insertion part protruding from the placing part and inserted into an end of the support cylinder. The insertion part has a pair of first portions that are received by end portions of a pair of grooves of the support cylinder and a second portion that is located inside the support cylinder and is continuous with the pair of first portions.

Abstract: An apparatus for accumulating cross-aligned fiber in an electrospinning device, comprising a multiple segment collector including at least a first segment, a second segment, and an intermediate segment, the intermediate segment positioned between the first and second segment to collectively present an elongated cylindrical structure; at least one electrically chargeable edge conductor circumferentially resident on the first segment and circumferentially resident on the second segment; a connection point on the first segment and on the second segment, the connection points usable for mounting the elongated cylindrical structure on a drive unit to rotate around a longitudinal axis; the elongated cylindrical structure holding electrospun fiber substantially aligned with the longitudinal axis when the edge conductors are excited with a charge of opposite polarity relative to charged fiber, and attracting electrospun fiber on to its surface around the longitudinal axis at least when the edge conductors are absent

Abstract: An apparatus for collecting cross-aligned fiber threads, comprising an elongated assembly having a plurality of segments including at least a first segment, a second segment, and an intermediate segment, the first segment positioned at one end of the intermediate segment and the second segment positioned at an opposite end of the intermediate segment, each segment being electrically chargeable; an electrically chargeable emitter for electrospinning nanoscale fiber streams comprising charged fiber branches, the emitter having a tip positioned offset and between an edge of the first segment and an edge of the second segment; a support structure for rotating the elongated assembly about a longitudinal axis and applying an electrical charge to at least the edges of the first and second segment; at least one electrically chargeable steering electrode for attracting fiber streams, the at least one steering electrode chargeable with an electrical polarity opposing a charge applied to the emitter.

Abstract: A substrate processing apparatus includes: a process chamber in which a substrate is processed; a substrate support configured to support the substrate in the process chamber; a plurality of reaction gas supply holes formed in a wall of the process chamber opposite to a substrate mounting surface of the substrate support; a reaction gas supply pipe that is fixed to the process chamber and communicates to each of the reaction gas supply holes; a plurality of reaction gas suppliers, each including a plasma generator installed on an upstream side of the reaction gas supply pipe; a plasma controller that is connected to the plasma generator and is configured to individually control a plurality of plasma generators; and a controller configured to control the substrate support, the plurality of reaction gas suppliers, and the plasma controller.

Abstract: Spray booth (21) for applying paint on basically flat parts (22), said spray booth having a plenum (24) and comprising a conveying system (25) for conveying the flat parts (22) to be painted, at least a device (23) for applying paint on said moving parts, and at least a suction system, wherein the plenum (24) of the spray booth has a semi-cylindrical shape, having its axis perpendicular to the direction of the advancing part (22).

Abstract: A plating apparatus includes a processing bath configured to store a processing liquid therein, a transporter configured to immerse a substrate holder, holding a substrate, in the processing liquid, raise the substrate holder out of the processing bath, and transport the substrate holder in a horizontal direction, and a gas flow generator configured to generate a clean gas flow forward of the substrate with respect to a direction in which the substrate holder is transported. The transporter moves the gas flow generator together with the substrate holder in the horizontal direction while transporting the substrate holder in the horizontal direction.

Abstract: A spin coater that can be used to apply multiple coating compositions over an optical substrate, is described. The spin coater includes, a coater bowl configured to collect excess coating material expelled from an optical substrate being coated, a rotatable chuck configured to receive and rotate the optical substrate in the bowl during coating, a plurality of coating reservoirs, each containing a coating material, and an indexable coating reservoir platform containing the plurality of reservoirs and configured to index a selected reservoir into a dispensing position above the coater bowl. The spin coater can include or have associated therewith at least one curing station, in which each curing station is independently configured to cure at least partially at least one applied coating material. Each curing station can include at least one of a thermal curing station, a UV curing station, and/or an IR curing station.

Abstract: A method of pretinning a guidewire core made of shape memory alloy and having an elongate axis, comprising: placing a ball of solder in a pocket in a soldering block; melting the ball of solder; holding a guidewire core over the ball of solder; lowering the guidewire core into the ball of solder; removing the guidewire from the ball of solder.

Abstract: A mask assembly for thin film deposition includes: a mask frame including an opening, the mask frame disposed surrounding the opening; and a mask unit including: first masks mounted on the mask frame, the first masks extending in a first direction; a second mask disposed on the first masks, the second mask including: one open hole; and at least one foreign substance discharge hole; and a third mask disposed on the second mask, the third mask extending in a second direction and including deposition holes, wherein the second direction crosses the first direction, and wherein a substrate is disposed on the third mask.

Abstract: A mask frame, a mask body, a mask and a method for manufacturing the same are provided in the embodiments of the disclosure. The mask frame includes a loop shaped frame body comprising an outer boundary and an inner boundary, the inner boundary defining a space for receiving a mask body. The mask frame also includes a forced side and a non-forced side, the forced side being subjected to a pulling force of the mask body, the non-forced side being free from the force of the mask body. A width between the outer boundary of the forced side of the mask frame and the inner boundary corresponding to the outer boundary decreases gradually in a direction from a middle position on the forced side toward the non-forced side.

Abstract: An apparatus for preventing a cover from being drawn into a joint of a paint robot includes a circular ring member mounted to the paint robot proximate the joint. The circular ring member may include first and second blocking members. The paint robot includes first and second portions rotatable relative to one another about an axis of the joint. The circular ring member circumferentially surrounds the first portion of the paint robot such that the axis of the joint passes through the circular ring member.

Abstract: A patterning apparatus is provided. The patterning apparatus includes a plurality of liquid jet units arranged in one or more groups and configured to jet an anti-etching liquid onto a surface of a substrate. The patterning apparatus also includes a plurality of exposure units configured to expose light on the anti-etching liquid jetted on the surface of the substrate to heat and cure the jetted anti-etching liquid to form anti-etching patterns on the surface of the substrate. Further, the patterning apparatus includes a control unit configured to control motion status and jetting status of the plurality of liquid jet units and motion status and exposure status of the plurality of exposure units, so as to form the anti-etching patterns at a predetermined line width and thickness.