Abstract: A method for cleaning a substrate is provided. The method includes providing foam to a surface of the substrate, brush scrubbing the surface of the substrate, providing pressure to the foam, and channeling the pressured foam to produce jammed foam, the channeling including channeling the pressured foam into a gap, the gap being defined by a space between a surface of a brush enclosure and the surface of the substrate. The brush scrubbing of the surface of the substrate and the channeling of the pressured foam across the surface of the substrate facilitate particle removal from the surface of the substrate.

Abstract: The invention provides probe washing cups and methods. A probe washing cup has a washing well and a waste cup. A drying section is disposed between an open end of the probe washing cup and an inlet plane of the washing well. The drying section has a channel that is aligned with the washing well. The channel has an opening for receiving the probe therethrough.

Abstract: A dishwasher includes a filter chamber having a pressure relief system. The filter chamber preferably includes two drain ports, a first that leads to a drain line through a drain pump, and a second that leads directly to the drain line for over-pressure relief. The drain line is formed with a loop that establishes a pressure head. In the event that the filter chamber becomes clogged, a pressure build-up will occur. If the pressure in the filter chamber exceeds the pressure head in the drain line, a siphoning action will be automatically triggered that evacuates the washing fluid from the filter chamber. In this manner, the filter chamber can be purged through operation of the drain pump or, in the event of a clog resulting in an over-pressure condition, by siphoning the wash fluid directly into the drain line.

Abstract: A method of cleaning a reaction chamber using a substrate having a metal catalyst thereon is disclosed. The method includes preparing a substrate having a catalyst layer to activate a cleaning gas. The substrate is introduced into the reaction chamber. Next, a cleaning gas is introduced into the reaction chamber. Contaminations in the reaction chamber are exhausted. The substrate having a metal catalyst layer is also disclosed.

Abstract: An apparatus and method are disclosed in which a semiconductor substrate having a surface containing contaminants is cleaned or otherwise subjected to chemical treatment using a foam. The semiconductor wafer is supported either on a stiff support (or a layer of foam) and foam is provided on the opposite surface of the semiconductor wafer while the semiconductor wafer is supported. The foam contacting the semiconductor wafer is pressurized using a form to produce a jammed foam. Relative movement between the form and the semiconductor wafer, such as oscillation parallel and/or perpendicular to the top surface of the semiconductor wafer, is then induced while the jammed foam is in contact with the semiconductor wafer to remove the undesired contaminants and/or otherwise chemically treat the surface of the semiconductor wafer using the foam.

Abstract: A lid assembly for a washing machine is provided. The lid assembly is rotatably attached to a case of the washing machine so as to cover/uncover an opening for loading/unloading the laundry. The lid assembly includes an upper lid, a lower lid provided under the upper lid, and a hinge installed between the upper lid and the lower lid and rotatably connected to the case of the washing machine. The upper and lower lids and the hinge are securely fixed with a fixing member. The upper and lower lids disperse and absorb a shock generated when the lid assembly covers an opening of the case.

Abstract: Provided is a dishwasher that is convenient in use. The dishwasher includes: a tub having therein a space for washing dishes; a top rack including at least one receiving container in which the dishes are received; a top rack guide disposed at an inner ceiling of the tub such that the top rack is received; and a fixing unit for fixing the top rack guide to the inner ceiling of the tub.

Abstract: A process for cleaning all types of contact lenses by placing each contact lens in individual compartments of a liquid impermeable lens storage container filled with an aqueous medium such as sterile saline or sterile lens cleaning solution, floating the liquid impermeable storage container in an ultrasonic device operating at a frequency of 50-60 Hz and a wattage of 20-117 watts.