Abstract: Disclosed herein are systems and methods of obtaining a derivative Raman spectrum using an excitation or Raman pump beam whose wavelength is modulated in any suitable manner such as, for example, stochastically. Shifting the wavelength of the input excitation by a small amount in approaches like SERDS can isolate the Raman scatter from other spectral artifacts and reduce the false detection rate. For example, an input excitation sequence can be correlated with the response of an individual pixel of a detector. From this, pixels that have captured Raman scattered photons can be separated from pixels capturing non-Raman photons. These techniques can be expanded to other fields and/or types of spectroscopies that utilize a dispersive element detector with time-dependent spectral features.

Abstract: A displacement measurement device 10 is provided with: a laser light source 11 for emitting laser light to a measurement area R of a measurement target object S; a focusing optical system (the beam splitter 151, the first reflecting mirror 1521, the condenser lens 155) having a front focal point in the measurement area R and a rear focal point on a predetermined imaging surface (the detection surface 1561); a non-focusing optical system (the beam splitter 151, the diffuser 153, the second reflecting mirror 1522, and the condenser lens 155) in which light from a measurement area R of a correspondence point in the measurement area corresponding to each point of the imaging surface with respect to the focusing optical system is incident on the point of the imaging surface; and a photodetector (image sensor 156) configured to detect light intensity on the imaging surface for each point.

Abstract: An inspection device includes an image acquisition unit configured to acquire images obtained by imaging, under at least two illumination conditions with different brightness, solder normally printed on a substrate, and an image processing unit configured to specify a shape of the solder based on a difference in brightness between the images acquired by the image acquisition unit, and generate, based on the shape of the solder, inspection data used for inspecting a state of the solder printed on the substrate.

Abstract: A measurement method of receiving an emission light output from an optical semiconductor element on an incident end surface of an optical probe, shifts a relative position between the optical semiconductor element and the optical probe on a plane surface intersecting with an optical axis of the emission light, measures an incident intensity of the emission light at several positions, and obtains an incident intensity pattern showing a relationship between a change in the relative position and the respective incident intensities.

Abstract: An electronic device includes a housing that houses a movable member inside the housing, and a shock absorbing member that reduces a shock to the movable member. The shock absorbing member holds the housing on an inner side of the shock absorbing member and includes at least one of a protrusion protruding in a direction along a movable direction of the movable member or a depression depressed in a direction along the movable direction on an outer side of the shock absorbing member.

Abstract: Second Harmonic Generation (SHG) can be used to interrogate a surface of a sample such as a layered semiconductor structure. The SHG based sample interrogation systems may simultaneously collect different polarization components of the SHG signal at a time to provide different types of information. SHG imaging systems can provide SHG images or maps of the distribution of SHG signals over a larger area of a sample. Some such SHG imaging systems employ multiple beams and multiple detectors to capture SHG signals over an area of the sample. Some SHG imaging systems employ imaging optics to image the sample onto a detector array to form SHG images.

Abstract: Disclosed is a plane grating calibration system, comprising an optical subsystem, a frame, first vibration isolator, a vacuum chuck, a workpiece stage, second vibration isolator, a base platform and a controller; the optical subsystem is mounted on the frame, and the frame is isolated from vibration by the first vibration isolator; the vacuum chuck is rotatably mounted on the workpiece stage, the workpiece stage is positioned on the base platform, and the base platform is isolated from vibration by the second vibration isolator. A displacement interferometer is integrated into the optical subsystem, and the entire optical subsystem adopts a method of sharing a light source, thereby avoiding the problems of low wavelength precision and poor coherence of separate light sources.

Abstract: A method comprising at least one light source configured to generate a light of at least one wavelength and project the light over an optical path, a sample device, the device containing a sample obtained from exhalation of a person, a vortex mask configured to receive the light after the light passes through at least a portion of the sample device, the vortex mask including a series of concentric circles etched in a substrate, the vortex mask configured to provide destructive interference of coherent light received from the at least one light source, a detector configured to detect and measure wavelength intensities from the light in the optical path, the wavelength intensities being impacted by the light passing through the sample, the detector receiving the light that remained after passing through the vortex mask, and a processor configured to provide measurement results based on the wavelength intensities.

Abstract: Provided is a sensor apparatus including: a laser ranging device that scans a predetermined scan range with a laser light such that at least a part of the emitted laser light passes through a region including a predetermined detection region; and a reflection mirror that reflects at least a part of the laser light to a direction not parallel to an incident direction and is provided so that the laser light occurring after reflection passes through the detection region.

Abstract: A Fourier spectrophotometer includes: a light source; an interferometer configured to obtain first and second interferograms whose intensity distributions are inverted from each other from the light emitted from light source; a multiplexing optical system configured to multiplex the first and second interferograms to irradiate the sample with a resultant interferogram; a demultiplexing optical system configured to demultiplex the first and second interferograms contained in the light passing through the sample; a light receiver configured to output a first light reception signal obtained by receiving the demultiplexed first interferogram and a second light reception signal obtained by receiving the demultiplexed second interferogram; and a signal processing device configured to perform processing for obtaining a noise-removed spectrum of the wavelength component in the analysis wavelength band by using the first and second light reception signals.

Abstract: A method comprising at least one light source configured to generate a light of at least one wavelength and project the light over an optical path, a sample device, the device containing a sample obtained from exhalation of a person, a vortex mask configured to receive the light after the light passes through at least a portion of the sample device, the vortex mask including a series of concentric circles etched in a substrate, the vortex mask configured to provide destructive interference of coherent light received from the at least one light source, a detector configured to detect and measure wavelength intensities from the light in the optical path, the wavelength intensities being impacted by the light passing through the sample, the detector receiving the light that remained after passing through the vortex mask, and a processor configured to provide measurement results based on the wavelength intensities.

Abstract: The present disclosure relates to a novel semiconductor edge and bevel inspection tool system of a wafer comprising a first illumination setup, an imaging sensor unit, and a second illumination setup. At least a portion of the second illumination radiation is configured for interacting with at least a portion of the wafer edge and bevel region surface. The second illumination setup has different radiation parameters than the first illumination setup. The first and the second illumination radiations have substantially opposite directions.

Abstract: Raman analysis apparatus capable of real-time Raman analysis while performing an experiment under elevated temperature and pressure conditions in surface or material property analysis of a powder solid sample, a single-crystal sample, a high-concentration liquid sample, or the like may be provided.

Abstract: Embodiments are directed to an optical spectrometry method, comprising: generating a sequence of 2D Hadamard masks along the time dimension, wherein each 2D Hadamard mask is arranged with a wavelength dimension and a coefficient dimension; detecting an optical signal from light transmitted through the sequence of 2D Hadamard masks; and reconstructing a spectrum to be detected by analyzing the optical signal, wherein each 2D Hadamard mask in the sequence of 2D Hadamard masks comprises a plurality of columns along the wavelength dimension, each column corresponding to a different Hadamard coefficient, and having different respective sequency values along the time dimension.

Abstract: Imaging apparatus (22) includes a radiation source (40), which emits pulsed beams (42) of optical radiation toward a target scene (24). An array (52) of sensing elements (78) output signals indicative of respective times of incidence of photons in a first image of the target scene that is formed on the array of sensing elements. An image sensor (64) captures a second image of the target scene in registration with the first image. Processing and control circuitry (56, 58) identifies, responsively to the signals, areas of the array on which the pulses of optical radiation reflected from corresponding regions of the target scene are incident, and processes the signals from the sensing elements in the identified areas in order measure depth coordinates of the corresponding regions of the target scene based on the times of incidence, while identifying, responsively to the second image, one or more of the regions of the target scene as no-depth regions.

Abstract: An optical measurement probe for capturing a spectral response through an intervening material emitting unwanted background radiation includes: a first lens configured to receive light and collimate the light into a collimated excitation beam defining a first aperture; an objective element for focusing the collimated excitation beam to a point or region in a sample through the intervening material, wherein the objective element also receives light scattered by the sample and the intervening material and collimates the scattered light into a collimated collection beam defining a second aperture; and a blocking element within the collimated collection beam for removing the light scattered by the intervening material from the collimated collection beam received from the sample, wherein the second aperture defined by the collimated collection beam is at least two times greater than the first aperture defined by the collimated excitation beam.

Abstract: This disclosure describes an example architecture for providing a delay line for optical techniques. The delay line architecture includes a focusing element that has a focal axis disposed parallel to its length. The line of symmetry provided by the focal axis obviates path-length-dependent aberrations caused by the off-axis beam translations. The systems described herein also provide varying geometries of movable mirrors, including a galvanometer mirror and a rotating polygonal mirror. The systems and methods described herein also provide techniques for generating and detecting coherent Raman spectra using a picosecond probe pulse.

Abstract: An illumination device for a spectral optical measurement device includes arranged with respect to an optical axis of the illumination device which, during a measurement operation, extends along a normal to a center point of an area of a sample to be illuminated. One or more segments of a mirror in a shape of a ring are centered on the optical axis. The mirror has an internal reflective surface arranged such that, during the measurement operation, the internal reflective surface receives light emitted from the light source and reflects the light over the area of the sample to be illuminated. The internal reflective surface has a freeform shape in a cross-section through the internal reflective surface in a plane parallel to the optical axis (for example in which the optical axis lies), and, in a cross-section of the mirror in a plane perpendicular to the optical axis, the internal reflective surface is represented by a straight line.

Abstract: Embodiments of the disclosure include a receiver of an optical sensing system. The receiver may include a Hadamard mask configured to resonate during a scanning procedure performed by the optical sensing system. The Hadamard mask may include a frame beginning pattern corresponding to a start of a frame captured during the scanning procedure. The Hadamard mask may also include a coded pattern configured to provide sub-pixelization of the frame. The receiver may also include a photodetector array positioned on a first side of the Hadamard mask. The photodetector array may be configured to detect light that passes through the Hadamard mask during the scanning procedure to generate the frame.

Abstract: A method and system are presented for use in measuring one or more characteristics of patterned structures. The method comprises: performing measurements on a patterned structure by illuminating the structure with exciting light to cause Raman scattering of one or more excited regions of the pattern structure, while applying a controlled change of at least temperature condition of the patterned structure, and detecting the Raman scattering, and generating corresponding measured data indicative of a temperature dependence of the detected Raman scattering; and analyzing the measured data and generating data indicative of spatial profile of one or more properties of the patterned structure.