Abstract: A memory device including a first structure; and a second structure on the first structure, wherein the first structure includes a first substrate; a peripheral circuit on the first substrate; a first insulating layer covering the first substrate and the peripheral circuit; and a first bonding pad on the first insulating layer, the second structure includes a second substrate; a memory cell array on a first surface of the second substrate; a second insulating layer covering the first surface of the second substrate and the memory cell array; a conductive pattern at least partially recessed from a second surface of the second substrate; and a second bonding pad on the second insulating layer, the first bonding pad is in contact with the second bonding pad, and the conductive pattern is spaced apart from the second insulating layer.

Abstract: The present disclosure provides an organic light-emitting diode display substrate. The organic light-emitting diode display substrate includes: a light-emitting layer, a light modulation layer, and a color conversion layer, in which the light-emitting layer is configured to emit first color light, the light modulation layer and the color conversion layer are arranged on different light-exiting paths of the light-emitting layer, the color conversion layer is configured to convert first color light into second color light and third color light, and the light modulation layer is configured to modulate an emergent direction of first color light.

Abstract: A semiconductor device assembly is provided. The assembly comprises a package substrate, a first stack of semiconductor dies having a first set of planform dimensions disposed over a first location on the substrate, a second stack of semiconductor dies having a second set of planform dimensions different from the first set disposed over a second location on the substrate, and an encapsulant at least partially encapsulating the substrate, the first stack and the second stack. The first stack of semiconductor dies has a first planform area, the second stack of semiconductor dies has a second planform area, and a sum of the first and second planform areas can be at least 50%, 67%, 75% or even more of an area of the package substrate.

Abstract: There are provided a semiconductor memory device and a manufacturing method thereof. The semiconductor memory device includes: a gate stack structure including interlayer insulating layers and conductive patterns, which are alternately stacked in a vertical direction on a substrate; a plurality of channel structures penetrating the gate stack structure, each of the plurality of channel structures with one end portion protruding past a boundary of the gate stack structure; and a source layer formed on the gate stack structure. The protruding end portion of each of the plurality of channel structures extends into the source layer. The protruding end portion of each of the plurality of channel structures has a flat section.

Abstract: An object is to provide a semiconductor device with a novel structure. The semiconductor device includes a first wiring; a second wiring; a third wiring; a fourth wiring; a first transistor having a first gate electrode, a first source electrode, and a first drain electrode; and a second transistor having a second gate electrode, a second source electrode, and a second drain electrode. The first transistor is provided in a substrate including a semiconductor material. The second transistor includes an oxide semiconductor layer.

Abstract: A method for preparing a semiconductor device includes: providing a semiconductor substrate, in which a trench is formed on the semiconductor substrate, a filling layer is formed in the trench, and a void is formed in the filling layer; removing a portion of the filling layer to expose the void; forming a plug, in which the plug is configured to plug the void and extends into the void by at least a preset distance; and removing a portion of the filling layer and remaining the plug with at least a preset height until the filling layer reaches a preset thickness to form a contact hole.

Abstract: Aspects of the disclosure provide a semiconductor device. The semiconductor device includes a stack of layers. The stack of layers includes a common source layer, gate layers and insulating layers disposed on a substrate. The gate layers and insulating layers are stacked alternatingly. Then, the semiconductor device includes an array of channel structures formed in an array region. The channel structure extends through the stack of layers and forms a stack of transistors in a series configuration. The channel structure includes a channel layer that is in contact with the common source layer. The common source layer extends over the array region and a staircase region. The semiconductor device includes a contact structure disposed in the staircase region. The contact structure forms a conductive connection with the common source layer.

Abstract: A combined semiconductor device package includes a first semiconductor device package having a first semiconductor chip housed within a first enclosure, and a first substrate coupled to the first enclosure. The first substrate includes first solder balls and second solder balls, each in electrical communication with the first semiconductor chip. The first semiconductor device further includes conductive pads directly coupled to the first substrate. The conductive pads are in electrical communication with the first and second solder balls. The combined semiconductor device package further includes a second semiconductor device package having a second semiconductor chip housed within a second enclosure, and third solder balls in electrical communication with the second semiconductor chip, and coupled to the conductive pads of the first semiconductor device package.

Abstract: A semiconductor device with a large storage capacity per unit area can be provided. A memory cell including a first transistor, a second transistor, a third transistor, a fourth transistor, a first capacitor, and a second capacitor includes a stack including a first conductor, a first insulator over the first conductor, a second conductor over the first insulator, a second insulator over the second conductor, and a third conductor over the second insulator; a first oxide arranged in a ring-like shape on a side surface of an opening portion of the second conductor; a fourth conductor arranged in a ring-like shape in contact with an inner wall of the first oxide; a cylindrical third insulator arranged to penetrate the stack, the first oxide, and the fourth conductor; and a second oxide arranged in contact with an inner wall of the third insulator.

Abstract: The present application discloses a semiconductor device including a substrate; a first semiconductor stack having a first threshold voltage and comprising a first insulating stack positioned on the substrate; a second semiconductor stack having a second threshold voltage and comprising a second insulating stack positioned on the substrate; and wherein the first threshold voltage is different the second threshold voltage; a thickness of the first insulating stack is different from a thickness of the second insulating stack.

Abstract: A semiconductor device having favorable characteristics is provided. A semiconductor device having stable electrical characteristics is provided. An island-shaped insulating layer containing an oxide is provided in contact with a bottom surface of a semiconductor layer containing a metal oxide that exhibits semiconductor characteristics. The insulating layer containing an oxide is provided in contact with a portion of the semiconductor layer to be a channel formation region and is not provided under portions to be low-resistance regions.

Abstract: A method for manufacturing a semiconductor structure includes the following operations. A first conductive layer, a second conductive layer and a passivation layer are successively formed on a semiconductor substrate. The passivation layer and the second conductive layer are patterned to form a primary gate pattern. A portion of the first conductive layer that is not covered by the primary gate pattern, is exposed. The primary gate pattern is subjected with plasma treatment to form a first protective layer. A dielectric layer is formed. The exposed portion of the first conductive layer is removed to retain a portion of the first conductive layer covered by the primary gate pattern. A second protective layer is formed on a side wall of the exposed portion of the first conductive layer.

Abstract: A microelectronic device comprises a first microelectronic device structure comprising a stack structure comprising conductive structures vertically alternating with insulative structures, a staircase structure within the stack structure, and vertical stacks of memory cells. Each vertical stack of memory cells individually comprises a vertical stack of capacitor structures, transistor structures each individually neighboring a capacitor structure of the capacitor structures, and a conductive pillar structure vertically extending through the transistor structures.

Abstract: An object is to provide a semiconductor device with a novel structure. The semiconductor device includes a first wiring; a second wiring; a third wiring; a fourth wiring; a first transistor having a first gate electrode, a first source electrode, and a first drain electrode; and a second transistor having a second gate electrode, a second source electrode, and a second drain electrode. The first transistor is provided in a substrate including a semiconductor material. The second transistor includes an oxide semiconductor layer.

Abstract: An apparatus, comprising a substrate comprising a dielectric, a conductor, comprising a via embedded within the dielectric, the via has a first end and a second end, and substantially vertical sidewalls between the first end and the second end, and a conductive structure extending laterally from the first end of the via over the dielectric, wherein the via and the conductive structure have a contiguous microstructure.

Abstract: A semiconductor package includes a first semiconductor device and a second semiconductor device. The first semiconductor device includes a first alignment pattern having a plurality of first scale patterns arranged in a first direction. The second semiconductor device is mounted over the first semiconductor device and includes a second alignment pattern having a plurality of second scale patterns arranged in a second direction parallel to the first direction, and a scale pitch of the first scale patterns is different from a scale pitch of the second scale patterns.

Abstract: A display substrate and a manufacturing method thereof, and a compensating method for wire load are provided. The display substrate includes a display region and a peripheral region. The display region has an opening, and the peripheral region includes an opening peripheral region at least partially in the opening; at least one wire is provided in the display region and the opening peripheral region. Each of the at least one wire includes two portions, a first portion is spaced apart and insulated from the semiconductor pattern and the conductive pattern, to provide at least one first compensation unit, and a second portion is spaced apart and insulated from one of the semiconductor pattern and the conductive pattern, to provide at least one second compensation unit.

Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a substrate and a resistive element over the substrate. The semiconductor device structure also includes a thermal conductive element over the substrate. A direct projection of the thermal conductive element on a main surface of the resistive element extends across a portion of a first imaginary line and a portion of a second imaginary line of the main surface. The first imaginary line is perpendicular to the second imaginary line, and the first imaginary line and the second imaginary line intersect at a center of the main surface.

Abstract: A three-dimensional (3D) memory device includes a core array region and a staircase region adjacent to the core array region. The core array region includes a memory stack having a plurality of conductor layers and a plurality of dielectric layers stacked alternatingly, a first semiconductor layer disposed over the memory stack, and a channel structure extending through the memory stack and the first semiconductor layer. The staircase region includes a staircase structure, a supporting structure disposed over the staircase structure, and a plurality of contacts contacting the plurality of conductor layers in the staircase structure. The first semiconductor layer overlaps the core array region in a plan view of the 3D memory device and the supporting structure overlaps the staircase region in the plan view of the 3D memory device.

Abstract: An organic light-emitting device and display apparatus, the device including a first electrode; a second electrode facing the first electrode; an emission layer between the first and second electrode; a hole control layer between the first electrode and the emission layer; and an electron control layer between the emission layer and the second electrode, wherein the emission layer includes a plurality of sub-emission layers to emit light having different wavelengths, at least portions of the plurality of sub-emission layers do not overlap one another, the plurality of sub-emission layers include: a first sub-emission layer including a first color light-emitting dopant, and a second sub-emission layer including a second color light-emitting dopant, the first and second sub-emission layers each include a hole-transporting and electron-transporting host which form an exciplex, and a triplet energy of the exciplex is equal to or greater than triplet energies of the first and second color light-emitting dopant.