Patents Examined by Thori Chea
  • Patent number: 7615337
    Abstract: A cap may be formed anisotropically over a photoresist feature. For example, a material, such as a polymer, may be coated over the photoresist feature. If the coated material is photoactive, the cap may be grown preferentially in the vertical direction, creating high aspect ratio structures in some embodiments of the present invention.
    Type: Grant
    Filed: August 27, 2004
    Date of Patent: November 10, 2009
    Assignee: Intel Corporation
    Inventors: Robert P. Meagley, Michael McSwiney, Michael D. Goodner, Robert Leet, Manish Chandhok
  • Patent number: 6482582
    Abstract: Disclosed in an image recording material comprising, on a support, a photosensitive silver halide, a reducing agent, a binder and a compound represented by the following Formula (1): wherein, in Formula (1), R1 and R2 each independently represent a substituent, R1 and R2 may be bonded to each other to form a ring, X represents a halogen atom, L represents a methylene group, m represents an integer of 0-7, Y represents a divalent bridging group, n represents 0 or 1 and Z represents a residue derived from a photographically useful compound. This image recording material exhibits high sensitivity, low fog and good storage stability, and is stable against fluctuation of development conditions.
    Type: Grant
    Filed: July 24, 2001
    Date of Patent: November 19, 2002
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Katsuyuki Watanabe, Masaru Takasaki
  • Patent number: 5804365
    Abstract: A thermally processable imaging element comprises a support bearing an imaging layer comprising a hydrophobic binder and a boron compound of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are the same or different and are selected from substituted or unsubstituted alkyl groups, and substituted or unsubstituted aryl groups.
    Type: Grant
    Filed: March 7, 1997
    Date of Patent: September 8, 1998
    Assignee: Eastman Kodak Company
    Inventors: Charles L. Bauer, Ralph B. Nielsen, Ronald Di Felice, Gordon D. Young
  • Patent number: 5230972
    Abstract: A method for manufacturing a color filter including the steps of: coating a photosensitive resin subject to dyeing on a substrate; forming a pattern on the photosensitive resin layer; dyeing the resultant patterned layer with a coloring matter; forming a condenser lens with transparent and dyeing resistant resin on the surface of the dyed pattern layer; and repeating the above processes at least two times eventually to form at least three colored pattern layers. By the method, since the entire thickness of the color filter is reduced and the layer construction is simplified, light transmittance is increased, the sensitivity of the photocell is enhanced as well as materials curtailed.
    Type: Grant
    Filed: April 21, 1992
    Date of Patent: July 27, 1993
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang-gi Jeong, Han-su Park
  • Patent number: 4999275
    Abstract: A silver halide photographic light-sensitive material is described, comprising a support, at least one light-sensitive silver halide emulsion layer on the support, and at least one light-insensitive top layer provided on the emulsion layer, wherein at least one of the emulsion layer and other constituent layers contains a compound represented by the general formula (I)R.sup.1 --NHNH--G--R.sup.2 (I)wherein R.sup.1 is a substituted or unsubstituted aryl group, R.sup.2 is a hydrogen atom, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, or a substituted or unsubstituted aryloxy group, and G is a carbonyl group, a sulfonyl group, a sulfoxy group, a phosphoryl group, or an N-substituted or unsubstituted imino group and wherein said at least one light-insensitive top layer is hardened so as to have a melting time at least 50 seconds longer than that of the emulsion layer.
    Type: Grant
    Filed: October 15, 1986
    Date of Patent: March 12, 1991
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yasuo Kasama, Nobuaki Inoue
  • Patent number: 4987057
    Abstract: A photoinitiator composition comprising (1) an aminobenzylidene carbonyl compound and (2) an N-aryl-.alpha.-amino acid is suitable for use in a photo-polymerizable composition comprising (a) an addition-polymerizable compound having a boiling point of 100.degree. C. or higher at an atmospheric pressure and (b) said photoinitiator composition.
    Type: Grant
    Filed: May 22, 1989
    Date of Patent: January 22, 1991
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Makoto Kaji, Nobuyuki Hayashi