Patents Examined by Tung X Le
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Patent number: 11973269Abstract: A tera-sample-per-second waveform generator comprising: a first transmission line having a terminated end and an output end; an anti-reflection load coupled to the terminated end of the first transmission line; a plurality of current sources, wherein each current source is configured to inject current into the first transmission line; and a second transmission line configured to feed the first transmission line with a seed signal through the plurality of current sources such that the second transmission line has a different time delay between current sources than the first transmission line, wherein the seed signal triggers the current sources to inject current into the first transmission line in order to generate an output waveform.Type: GrantFiled: April 21, 2022Date of Patent: April 30, 2024Assignee: United States of America as represented by the Secretary of the NavyInventor: Paul D. Swanson
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Patent number: 11968773Abstract: A charged particle emission control technique where slow extraction of a charged particle beam from a synchrotron can be stably performed even in a state where beam adjustment has not been performed or completed. A charged particle emission control device includes a first receiver configured to receive a first detection signal obtained by detecting a current value of charged particles orbiting in a synchrotron; an arithmetic processor configured to time-differentiate the first detection signal and output a beam-intensity equivalent-value; and an emission controller configured to output a control signal for emitting a charged particle beam from the synchrotron to a beam transport system in such a manner that the beam intensity-equivalent value matches a target value.Type: GrantFiled: January 3, 2022Date of Patent: April 23, 2024Assignee: TOSHIBA ENERGY SYSTEMS & SOLUTIONS CORPORATIONInventors: Kohei Kotaki, Munemichi Matsumoto, Takuji Furukawa, Kota Mizushima
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Patent number: 11961717Abstract: An electrode for a plasma reactor, the electrode comprising an elongate body having an inlet end and an opposed outlet end, a reaction region extending along a portion of the elongate body, a first sealing region located between the reaction region and the inlet end of the elongate body and a second sealing region located between the reaction region and the outlet end of the elongate body, wherein the first sealing region and the second sealing region each comprise a plurality of receiving portions adapted to receive a sealing member therein, and wherein a barrier member adapted to reduce or eliminate the flow of fluid between the receiving portions provided between each of the plurality of receiving portions.Type: GrantFiled: December 20, 2019Date of Patent: April 16, 2024Assignee: OZONE 1 PTY LTDInventor: John Lionel Brauer
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Patent number: 11963280Abstract: An illumination light adjusting system according to the present disclosures includes a color vision characteristics storage configured to store color vision characteristics of a user, and a wavelength characteristics changing unit configured to change wavelength characteristics of illumination light based on the color vision characteristics stored in the color vision characteristics storage.Type: GrantFiled: December 2, 2020Date of Patent: April 16, 2024Assignees: IRIS COMMUNICATION KABUSHIKI KAISHA, NICO CORPORATIONInventor: Masafumi Yano
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Patent number: 11956883Abstract: A method and apparatus for controlling RF plasma attributes is disclosed. Some embodiments of the disclosure provide RF sensors within processing chambers operable at high temperatures. Some embodiments provide methods of measuring RF plasma attributes using RF sensors within a processing chamber to provide feedback control for an RF generator.Type: GrantFiled: December 23, 2022Date of Patent: April 9, 2024Assignee: APPLIED MATERIALS, INC.Inventors: Zheng John Ye, Daemian Raj Benjamin Raj, Shailendra Srivastava, Nikhil Sudhindrarao Jorapur, Ndanka O. Mukuti, Dmitry A. Dzilno, Juan Carlos Rocha
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Patent number: 11955707Abstract: An antenna module includes first to third radiators and a ground radiator. The first radiator includes first and second sections and excites at a first frequency band. An extension direction of the first section, including a feeding end, is not parallel to an extension direction of the second section. The second radiator includes third and fourth sections. The third section extends from an intersection of the first and second sections. The third section excites at a second frequency band. The third radiator is disposed beside the first radiator and away from the second radiator. The ground radiator is disposed on one side of the first, second, and third radiators, and includes a ground end. The fourth section of the second radiator is connected to the third section and the ground radiator. The third radiator is connected to the ground end.Type: GrantFiled: April 19, 2022Date of Patent: April 9, 2024Assignee: PEGATRON CORPORATIONInventors: Chao-Hsu Wu, Hau Yuen Tan, Chien-Yi Wu, Shih-Keng Huang, Cheng-Hsiung Wu, Ching-Hsiang Ko
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Patent number: 11955324Abstract: A high-power pulsed surface processing system includes insulated-gate bipolar transistors (IGBT) to replicate desirable pulse structures with high precision, at low cost, and with high reliability within a single system. The pulsed surface processing system includes a power supply, an anode and a cathode, a dual gate driver supplying power to one or more IGBT gates, and one or more capacitor banks. Pulse formation software controls the timing and duration of electrical pulses to the electrodes. A freewheeling diode protects the system from an abrupt reduction of current in the circuit. The high-power pulsed surface processing system may be used to control versatile and complex pulse structures while with precise control of instantaneous pulse powers, pulse timing, and process control. The inclusion of dual gate drivers also offers the ability for multiple pulsers to be created and “slaved” together for a wide variety of custom processes.Type: GrantFiled: October 6, 2021Date of Patent: April 9, 2024Assignee: JEFFERSON SCIENCE ASSOCIATES, LLCInventors: Hui Tian, John C. Musson, Matthew Creed Burton, Anne-Marie Valente-Feliciano, Larry Phillips
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Patent number: 11946878Abstract: A device for unidirectional propagation of microwaves comprises a resonant microwave structure arranged to transmit microwaves between two ports and a magnetic source arranged to provide a generally static magnetic field and to have a resonant frequency distinct from that of the microwave structure, which is disposed adjacent the microwave structure so as to be located in presence of electromagnetic fields emanating from the transmitted microwaves such that the magnetic field interacts with the electromagnetic fields of the microwaves so as to form a set of hybridized resonant frequencies at which zero intrinsic damping exists, one of the set of hybridized resonant frequencies being a real eigenvalue providing the unidirectional propagation from one of the first and second ports to the other. A related method comprises arranging the magnetic source at a prescribed position where the real eigenvalue matches the frequency of an input signal applied at a selected port.Type: GrantFiled: December 10, 2020Date of Patent: April 2, 2024Assignee: University of ManitobaInventors: Can-Ming Hu, Yi-Pu Wang, Yongsheng Gui, Mun Kim
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Patent number: 11942307Abstract: A method for plasma processing includes: sustaining a plasma in a plasma processing chamber, the plasma processing chamber including a first radio frequency (RF) electrode and a second RF electrode, where sustaining the plasma includes: coupling an RF source signal to the first RF electrode; and coupling a bias signal between the first RF electrode and the second RF electrode, the bias signal having a bipolar DC (B-DC) waveform including a plurality of B-DC pulses, each of the B-DC pulses including: a negative bias duration during which the pulse has negative polarity relative to a reference potential, a positive bias duration during which the pulse has positive polarity relative to the reference potential, and a neutral bias duration during which the pulse has neutral polarity relative to the reference potential.Type: GrantFiled: October 15, 2021Date of Patent: March 26, 2024Assignee: Tokyo Electron LimitedInventors: Zhiying Chen, Barton Lane, Yun Han, Peter Lowell George Ventzek, Alok Ranjan
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Patent number: 11923177Abstract: A plasma processing apparatus includes: a processing container having a vertical tubular shape and an opening formed in a side wall of the processing container, the processing container configured to accommodate a plurality of substrates in multiple stages; a plasma partition wall airtightly provided on an outer wall of the processing container and configured to cover the opening and define a plasma generation space; a plasma electrode provided along the plasma partition wall; and a processing gas supplier provided outside the plasma generation space and configured to supply a plasma generation gas.Type: GrantFiled: July 6, 2021Date of Patent: March 5, 2024Assignee: TOKYO ELECTRON LIMITEDInventors: Keiji Tabuki, Yamato Tonegawa, Kazumasa Igarashi, Kazuo Yabe
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Patent number: 11924938Abstract: An illuminator includes: a light emitter including a light-emitting diode; a temperature sensor configured to detect a current temperature of the light emitter; and an illumination controller configured to adjust a drive voltage being supplied to the light emitter in accordance with the current temperature. The illumination controller includes a reference temperature storage in which a reference temperature is stored in advance and is configured to adjust the drive voltage by detecting the current temperature from the temperature sensor on a constant time cycle and comparing the current temperature with the reference temperature.Type: GrantFiled: June 13, 2022Date of Patent: March 5, 2024Assignee: MITUTOYO CORPORATIONInventors: Tadashi Yamazaki, Yuto Konno, Hideki Morita, Nobuya Kaneko, Satoru Hirasawa
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Patent number: 11924939Abstract: A power converter circuit may include a control circuit configured to generate a drive signal for rendering a semiconductor switch conductive and non-conductive to generate a bus voltage across a bus capacitor. The control circuit may adjust a minimum operating period of the drive signal to a first value when an output power of the power converter circuit is greater than a first threshold and to a second value when the output power is less than a second threshold. The control circuit may comprise a comparator that generates the drive signal in response to a sense voltage and a threshold voltage. When operating in a standby mode, the control circuit may adjust a magnitude of the threshold voltage based on an instantaneous magnitude of an alternating-current line voltage received by the power converter circuit, such that an input current drawn by the power converter circuit is sinusoidal.Type: GrantFiled: December 27, 2022Date of Patent: March 5, 2024Assignee: Lutron Technology CompanyInventors: Ryan M. Bocock, Quinn Brogan
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Patent number: 11923624Abstract: An antenna device includes a first and second antennas. The first antenna includes a coupling element, a phase adjuster, and first and second radiating elements. The phase adjuster is provided to adjust a phase difference between signals of the first radiating element and the second radiating element in a communication band of the second antenna to be about 180°±45°.Type: GrantFiled: June 24, 2021Date of Patent: March 5, 2024Assignee: MURATA MANUFACTURING CO., LTD.Inventor: Shinya Tachibana
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Patent number: 11923179Abstract: A plasma processing apparatus for semiconductor processing includes an injector holder configured to removably mate with a structure defining an interior chamber of a plasma processing apparatus. The injector holder defines a first opening. A sleeve is configured to be received within the first opening, and the sleeve defines a second opening. A gas injector is configured to be received within the second opening of the sleeve.Type: GrantFiled: July 7, 2021Date of Patent: March 5, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITEDInventor: Pei-Yu Lee
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Patent number: 11917738Abstract: The present disclosure provides a dummy load control circuit and a lighting device. The dummy load control circuit and a dummy load module are connected in parallel with a power supply input end and the dummy load control circuit includes a first switch circuit having a first switch control module so the first switch is controlled to be turned off when the power supply input end is connected to a triac dimmer, and turned on when the power supply input end is not connected to the triac dimmer, a second switch circuit having a second switch control module controlling on/off of the second switch, and a constant voltage source providing a constant voltage so the dummy load module is turned on when the first switch and the second switch are turned off, and turned off when the first switch and/or the second switch are turned on.Type: GrantFiled: November 29, 2022Date of Patent: February 27, 2024Assignee: SAVANT TECHNOLOGIES LLCInventors: Pan Yao, Weihu Chen, Aijun Wang, Yao Fu, Zhiyong Wang
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Patent number: 11910502Abstract: An LED driver for an LED lamp, which also comprises an LED load. The LED driver is adapted to connect to an input source at a first and second terminal. The LED driver comprises a switching arrangement configured to enable a controller to control at least a magnitude and phase of the voltage between the first and second terminals. The phase of the voltage between the first and second terminals may be defined to control an amount of power that flows from the input source to power the LED lamp.Type: GrantFiled: October 20, 2020Date of Patent: February 20, 2024Assignee: SIGNIFY HOLDING B.V.Inventors: Paul Robert Veldman, Jie Fu, Haimin Tao, Gang Wang, Zhiquan Chen, Jian Longqui
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Patent number: 11908663Abstract: Provided is a plasma processing apparatus capable of suppressing abnormal discharge. The plasma processing apparatus includes: an upper electrode and a lower electrode which are disposed inside a processing container so as to face each other inside the processing container; and a dielectric shower for gas introduction disposed below the upper electrode, wherein the plasma processing apparatus generates plasma in a space between the upper electrode and the lower electrode. The upper electrode includes: at least one slot configured to introduce VHF waves into the processing container; and a gas flow path provided independently of the at least one slot and in communication with the dielectric shower.Type: GrantFiled: November 26, 2019Date of Patent: February 20, 2024Assignee: Tokyo Electron LimitedInventors: Taro Ikeda, Toshifumi Kitahara
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Patent number: 11903106Abstract: A circuit for driving a light-emitting diode (LED) load and a direct current to direct current (DC-DC) converter includes a first sampling sub-circuit, a driving circuit. The first sampling sub-circuit is configured to generate a current signal representing a load current of the LED load. The driving circuit is configured to receive a brightness adjustment signal and a frequency adjustment signal; generate a first control signal, based on the current signal and the brightness adjustment signal, for controlling an output current of the DC-DC converter; and generate a second control signal, based on the frequency adjustment signal, for controlling a switching frequency of the LED load.Type: GrantFiled: January 13, 2022Date of Patent: February 13, 2024Assignee: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.Inventors: Qiang Ye, Yongjun Fang, Chengze Yao
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Patent number: 11893868Abstract: A method of configuring a white LED light with a tunable diffused light color temperature, includes using a light-emitting unit configured with a first LED load emitting light with a first color temperature between 1800K and 3000K and a second LED load emitting light with a second color temperature between 4000K and 6500K, electrically connected in parallel; using a light diffuser to cover the first LED load and the second LED load to create a diffused light with a diffused light color temperature; using two semiconductor switching devices working in conjunction with a controller to respectively control a first electric power delivered to the first LED load and a second electric power delivered to the second LED load such that a total electric power of the light-emitting unit remains unchanged; and using at least one external control device to activate a selection of the diffused light color temperature.Type: GrantFiled: October 24, 2022Date of Patent: February 6, 2024Assignee: Vaxcel International Co., Ltd.Inventor: Chia-Teh Chen
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Patent number: 11894606Abstract: A radome structure for a multilayered broadband radome structure is described. The radome structure may include a central core layer comprising a first dielectric constant, an interior intermediate core layer adjacent to an interior side of the central core layer, comprising a second dielectric constant less than the first dielectric constant, an exterior intermediate core layer adjacent to an exterior side of the central core layer, comprising a third dielectric constant less than the first dielectric constant, and an interior outside core layer adjacent to an interior side of the interior intermediate core layer, comprising a fourth dielectric constant less than the second dielectric constant. In some examples of the radome structure described above may further include an exterior outside core layer adjacent to an exterior side of the exterior intermediate core layer, comprising a low dielectric constant.Type: GrantFiled: March 9, 2023Date of Patent: February 6, 2024Assignee: General Atomics Aeronautical Systems, Inc.Inventor: Matthew W. Pieratt