Patents Examined by Wael Fabrny, Jr.
  • Patent number: 6500706
    Abstract: A method for forming a stack DRAM cell with CUB wherein coupling noise is eliminated is described. Bit-lines are formed according to one of three methods. In a first method, a first pair of bit-lines is fabricated in a first metal layer and a second pair of bit-lines is fabricated in a second metal layer separated from the first metal layer by an insulating layer wherein the first pair of bit-lines is horizontally spaced from the second pair of bit-lines. In a second method, a first of each pair of bit-lines is fabricated in a first metal layer and a second of each pair of bit-lines is fabricated in a second metal layer separated from the first metal layer by an insulating layer wherein the first of each pair of bit-lines is horizontally spaced from the second of each pair of bit-lines. In a third method, each bit-line is divided into segments.
    Type: Grant
    Filed: March 19, 2001
    Date of Patent: December 31, 2002
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventor: Min-Hwa Chi