Abstract: A method for forming a stack DRAM cell with CUB wherein coupling noise is eliminated is described. Bit-lines are formed according to one of three methods. In a first method, a first pair of bit-lines is fabricated in a first metal layer and a second pair of bit-lines is fabricated in a second metal layer separated from the first metal layer by an insulating layer wherein the first pair of bit-lines is horizontally spaced from the second pair of bit-lines. In a second method, a first of each pair of bit-lines is fabricated in a first metal layer and a second of each pair of bit-lines is fabricated in a second metal layer separated from the first metal layer by an insulating layer wherein the first of each pair of bit-lines is horizontally spaced from the second of each pair of bit-lines. In a third method, each bit-line is divided into segments.
Type:
Grant
Filed:
March 19, 2001
Date of Patent:
December 31, 2002
Assignee:
Taiwan Semiconductor Manufacturing Company