Abstract: A method of measuring a flatness of a chamfering table includes the steps of positioning a substrate on the chamfering table, chamfering an edge of the substrate a plurality of times with a chamfering wheel while varying a relative height of the chamfering wheel with respect to a height of the substrate, locating symmetric chamfered points where the chamfered edge is top-bottom symmetric, matching values of the relative height of the chamfering wheel to the found symmetric chamfered points, and obtaining the flatness of the chamfering table from the values of the relative height of the chamfering wheel that are matched to the symmetric chamfered points.

Abstract: A differential scanning calorimeter apparatus includes reference and sample cells and controlled temperature shields. The temperature of the shields is controlled such that baseline curvature is reduced by eliminating heat flow from the furnaces to their surroundings (quasi adiabatic conditions) and by controlling heat flow through a well defined solid state heat resistance between the furnaces and a temperature controlled heat sink. The temperature of each shield can be controlled independently to reduce differential heat flow over the whole temperature range of the scan, or maintained at a constant temperature for conventional power compensated DSC operation. The temperature/time profile for each shield can be controlled according to actual furnace temperature, obtained from an empty run, or stored in the computer memory and recalled for sample measurements.