Abstract: Resists can be removed while metal contamination of wafers, etc. and generation of particles, and growth of oxide films are suppressed. A substrate processing method comprises feeding a processing gas, such as ozone gas, into a processing vessel to pressurize an atmosphere surrounding a substrate. A solvent gas, such as steam, is fed into the processing vessel while the processing gas is fed into the processing vessel, whereby a resist of the substrate can be removed with the solvent gas and the processing gas while metal corrosion, etc. can be prevented.

Abstract: An improved method for flushing the residue from internal surfaces of cavities in, for example, turbine blades. In accordance with one aspect of the invention, provision is made for simultaneously flushing the internal cavities of a plurality of turbine blades, with each blade having a plurality of cavities therein.

Abstract: In a cleaning step of a substrate-processing device, vacuum drawing is made for the space between an inner chamber and an outer chamber that receives the inner chamber. Temperature of the inner chamber is set higher than the temperature of the inner chamber during substrate processing and set lower than the temperature of a substrate support member. After that, a cleaning gas containing hexafluoroacetylaceton (Hhfac) is supplied in the inner chamber, and substances to be cleaned off adhering inside the inner chamber are removed.

Abstract: A method for cleaning a substrate surface using ultrasonic energy includes an array of ‘N’ transducer elements. Electrical signals, Sn, having signal parameters including a voltage, VN, and phase, ?N, are provided to drive each transducer element and generate respective ultrasonic waves. A computer sub-system is used to control the signal parameters to establish a substantially uniform cavitation energy at a plurality of locations on the substrate surface. The signal parameters can be established to focus or steer the ultrasonic energy from the array to each location. To calculate the electrical signal parameters, the computer sub-system can use some or all of the following as inputs; the arrangement and inter-element spacing of the transducer elements, characteristics of the fluid medium, and the coordinates of the locations requiring cleaning.

Abstract: A pre-moistened towelette wipes a compact disc clean without leaving a visible residue thereon. An ultra-pure tissue, free of binders, fillers and dyes, is permeated with a liquid cleaning preparation comprised of a highly concentrated solution of ultra-pure alcohol, a non-ionic, ultra-pure surfactant, and ultra-pure water.

Abstract: The present invention relates to a composition and a method of cleaning lubricated surfaces subject to residual buildup such as large mill gears, shovels and draglines. The composition comprises at least one terpene being capable of dissolving or softening hardened lubricants and residuals, hydrocarbon solvent, an extreme pressure lubricant and surfactants. The method for cleaning mill gears comprises applying a solution comprising at least one terepene being capable of dissolving or softening soils containing grease or oil, aliphatic hydrocarbon solvent, biodegradable surfactants, an extreme pressure lubricant and thickeners to the area to be cleaned, continuously applying the solution to contact the surface and penetrate and dissolve the surface grease, and thereafter rinsing the surface to remove the dissolved surface greases and the cleaning composition. The initial spraying is carried out during use of the mill gear whereas the rinsing is carried out as the mill gear is inched.

Abstract: A method of enchancing the cleanability and facilitating the removal of algae and other microorganisms from surfaces prone to biofouling by immobilizing on said surfaces and bonding thereto a coating of organosilanes, forming on the coated surfaces a layer of dead cells of the algae and other microorganisms, utilizing the layer of dead cells and inherent release characteristics of silicone surface as a release medium to facilitate removal of succeeding layers of algae and other microorganisms that accumulate thereon, and cleaning the surfaces by dislodging the accumulated layers from the release medium layer.