Patents Examined by Zia R. Hashmi
  • Patent number: 7435959
    Abstract: The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by calculating, and displaying on the screen, the dislocation vector that represents the relationship in position between the detected patterns on the surface and at the bottom of the photoresist. Furthermore, dislocation vectors between the microstructured patterns at multiple positions in a single-chip or single-shot area or on one wafer are likewise calculated, then the sizes and distribution status of the dislocation vectors at each such position are categorized as characteristic quantities, and the corresponding tendencies are analyzed. Thus, stepper or wafer abnormality is detected.
    Type: Grant
    Filed: May 14, 2007
    Date of Patent: October 14, 2008
    Assignee: Hitachi, Ltd.
    Inventors: Fumihiro Sasajima, Osamu Komuro, Fumio Mizuno
  • Patent number: 7408151
    Abstract: A device for dynamically biasing an ion optic element, for example, in a mass spectrometer. The device includes a voltage source, a first ion optical element coupled with the voltage source, a second ion optical element resistively coupled with the first ion optical element; and a pulse generator capacitively coupled with the second ion optical element. The pulse generator is configured to apply a series of pulses to the second ion optical element. In steady state operation, a dynamic voltage bias is generated between the first ion optical element and the second ion optical element. The dynamic voltage bias is controllable by controlling the characteristics of the applied pulses, such as the pulse width, pulse amplitude, and pulse repetition rate of the applied pulses.
    Type: Grant
    Filed: June 30, 2005
    Date of Patent: August 5, 2008
    Assignee: Bio-Rad Laboratories, Inc.
    Inventor: Craig A. Keller
  • Patent number: 7385209
    Abstract: Ion beam lithography technique wherein a higher amount of radiation energy is deposited to predetermined regions in the bulk if a suitable substrate. By selecting the radiation nature, its energy and the irradiation parameters a structure can be created in the bulk of the material leaving the surface essentially untouched.
    Type: Grant
    Filed: October 24, 2005
    Date of Patent: June 10, 2008
    Assignee: Haute Ecole Arc Ne-Be-Ju
    Inventors: Samuel Jaccard, Serguei Mikhailov, Frans Munnik
  • Patent number: 7381946
    Abstract: The present invention provides a mass spectrometry capable of high-efficiency and high-throughput ECD. An electron source and a two-dimensional combined ion trap in which a magnetic field along and generally parallel to a central axis is applied are used, thereby to achieve the foregoing object. First, precursor ions are trapped. By adopting the two-dimensional combined ion trap, it is possible to obtain a high ion trapping efficiency upon being injected and trapping. Subsequently, electrons are made incident thereon in such a manner as to be wound along the central axis to which no radio frequency is applied by using a magnetic field. For this reason, it is possible to allow energy-controlled electrons to reach the precursor ions. It is possible to implement a mass spectrometer capable of avoiding heating due to a radio frequency electric field, and effecting high-throughput/high-efficiency ECD.
    Type: Grant
    Filed: November 29, 2006
    Date of Patent: June 3, 2008
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takashi Baba, Yuichiro Hashimoto
  • Patent number: 7375320
    Abstract: A virtual ion trap that uses electric focusing fields instead of machined metal electrodes that normally surround the trapping volume, wherein two opposing surfaces include a plurality of uniquely designed and coated electrodes, and wherein the electrodes can be disposed on the two opposing surfaces using plating techniques that enable much higher tolerances to be met than existing machining techniques.
    Type: Grant
    Filed: May 24, 2007
    Date of Patent: May 20, 2008
    Assignee: Brigham Young University
    Inventors: Edgar D. Lee, Alan L. Rockwood, Randall Waite, Stephen A. Lammert, Milton L. Lee
  • Patent number: 7372021
    Abstract: A time-of-flight mass spectrometer which has an iron source, an evacuated tube proximate the ion source and adapted to receive ions from the ion source, and a detector disposed at an end of the evacuated tube opposite an end proximate the ion source. The ion source is constructed to generate an electric field that changes non-linearly as a function of position along a path from the ion source to the detector. The ion source is constructed to generate an electric field that changes as a function of time, the electric field being provided to accelerate ions from the ion source to the detector.
    Type: Grant
    Filed: February 13, 2006
    Date of Patent: May 13, 2008
    Assignee: The Johns Hopkins University
    Inventors: Robert James Cotter, Benjamin D. Gardner, John F Holland
  • Patent number: 7372028
    Abstract: The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges.
    Type: Grant
    Filed: May 8, 2006
    Date of Patent: May 13, 2008
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Ezumi, Yoichi Ose, Akira Ikegami, Hideo Todokoro, Tatsuaki Ishijima, Takahiro Sato, Ritsuo Fukaya, Kazunari Asao
  • Patent number: 7372054
    Abstract: Radiation module for thermal or UV irradiation processing procedures with a large number of radiation sources essentially adjacent and parallel to one another for electromagnetic radiation whose main effective range is in the UV spectrum, visible spectrum, and/or near infrared (NIR) part of the spectrum, particularly at wavelengths between 250 nm and 1.5 ?m, whereby each of the radiation sources possesses an elongated central section, two bent ends, and two bent sections connecting the ends with the central section, and a reflector and cooler body bearing the radiation sources, whereby the reflector and cooler body possesses two end reflector sections assigned to the bent sections of the radiation source from the straight elongated main section to the ends formed as one piece.
    Type: Grant
    Filed: April 1, 2004
    Date of Patent: May 13, 2008
    Assignee: Advanced Photonics Technologies AG
    Inventors: Gunther Gesell, Torsten Berge, Rolf Wirth
  • Patent number: 7372029
    Abstract: A scanning transmission electron microscope for scanning a primary electron beam on a sample, detecting a transmitted electron from the sample by a detector, and forming an image of the transmitted electron. The scanning transmission electron microscope includes an electron-optics system which enables switching back the transmitted electron beam to the optical axis by a predetermined quantity, and a determining unit for determining the quantity based on a displacement of the transmitted electron with respect to the detector caused by the scanning of the primary electron beam.
    Type: Grant
    Filed: May 30, 2007
    Date of Patent: May 13, 2008
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Ruriko Tsuneta, Masanari Koguchi, Takahito Hashimoto, Kuniyasu Nakamura
  • Patent number: 7368740
    Abstract: In a complex, multi-processor software controlled system, such as proton beam therapy system (PBTS), it may be important to provide treatment configurable parameters that are easily modified by an authorized user to prepare the software controlled systems for various modes of operation. This particular invention relates to a configuration management system for the PBTS that utilizes a database to maintain data and configuration parameters and also to generate and distribute system control files that can be used by the PBTS for treatment delivery. The use of system control files reduces the adverse effects of single point failures in the database by allowing the PBTS to function independently from the database. The PBTS accesses the data, parameters, and control settings from the database through the system control files, which insures that the data and configuration parameters are accessible when and if single point failures occur with respect to the database.
    Type: Grant
    Filed: July 28, 2006
    Date of Patent: May 6, 2008
    Assignee: Loma Linda University Medical Center
    Inventors: Alexandre V. Beloussov, Michael A. Baumann, Howard B. Olsen, Dana Salem
  • Patent number: 7365311
    Abstract: Methods, systems and mediums are disclosed for aligning mass spectrometry data before the analysis of the mass spectrometry data. The mass spectrometry data may be received from a mass spectrometry machine, and re-sampled using a smooth warping function. To estimate the warping function, a synthetic signal is build using, for example, Gaussian pulses centered at a set of reference peaks. The reference peaks may be designated by users or calculated after observing a group of spectrograms. The synthetic signal is shifted and scaled so that the cross-correlation between the mass spectrometry data and the synthetic signal reaches its maximum value.
    Type: Grant
    Filed: September 8, 2005
    Date of Patent: April 29, 2008
    Assignee: The MathWorks, Inc.
    Inventor: Lucio Cetto
  • Patent number: 7365320
    Abstract: Systems and methods for process monitoring based upon X-ray emission induced by a beam of charged particles such as electrons or ions include a system and method for process monitoring that analyze a cavity before being filled and then analyze emitted X-rays from the cavity after the cavity has been filled with a conductive material. Also included are system and methods for process monitoring that apply a quantitative analysis correction technique on detected X-ray emissions.
    Type: Grant
    Filed: October 8, 2003
    Date of Patent: April 29, 2008
    Assignee: Applied Materials Israel, Ltd.
    Inventor: Dror Shemesh
  • Patent number: 7365316
    Abstract: Method and apparatus for chromatographic high field asymmetric waveform ion mobility spectrometry, including a gas chromatographic analyzer section intimately coupled with an ionization section, an ion filter section, and an ion detection section, in which the sample compounds are at least somewhat separated prior to ionization, and ion filtering proceeds in a planar chamber under influence of high field asymmetric periodic signals, with detection integrated into the flow path, for producing accurate, real-time, orthogonal data for identification of a broad range of chemical compounds.
    Type: Grant
    Filed: July 27, 2005
    Date of Patent: April 29, 2008
    Assignee: The Charles Stark Draper Laboratory
    Inventors: Raanan A. Miller, Erkinjon G. Nazarov, Gary A. Eiceman, Evgeny Krylov, Boris Tadjikov
  • Patent number: 7365322
    Abstract: In order to provide an imaging-recipe arranging or creating apparatus and method adapted so that selection rules for automatic arrangement of an imaging recipe can be optimized by teaching in a SEM apparatus or the like, the imaging-recipe arranging or creating apparatus in this invention that arranges an imaging recipe for SEM-observing a semiconductor pattern using a scanning electron microscope includes a database that receives and stores layout information of the above semiconductor pattern in a low-magnification field, and an imaging-recipe arranging unit which, on the basis of the database-stored semiconductor pattern layout information, arranges the imaging recipe automatically in accordance with the automatic arrangement algorithm that includes teaching-optimized selection rules for selecting an imaging point(s).
    Type: Grant
    Filed: January 12, 2006
    Date of Patent: April 29, 2008
    Assignee: Hitachi, Ltd.
    Inventors: Atsushi Miyamoto, Wataru Nagatomo, Ryoichi Matsuoka, Hidetoshi Morokuma, Takumichi Sutani
  • Patent number: 7361909
    Abstract: A method and apparatus for correcting drift of the beam irradiation position during automated FIB (focused ion beam) processing with a reference image-setting unit, an image read-in unit for reading in images of the reference image region during the FIB processing, an arithmetic-and-control unit for finding the direction and amount of image deviation between the subsequent images, and a beam deflection system-adjusting unit for correcting the beam deflection system by correcting the image deviation based on the deviation in response to the output from the arithmetic-and-control unit. The arithmetic-and-control unit optimizes the brightness or contrast of the reference image.
    Type: Grant
    Filed: November 23, 2005
    Date of Patent: April 22, 2008
    Assignee: Jeol Ltd.
    Inventors: Ryoichi Ichikawa, Akihiko Haraguchi, Yuji Hasegawa, Naohito Inoue, Kazutomo Shimizu
  • Patent number: 7361916
    Abstract: A coupled nano-resonating structure includes a plurality of a nano-resonating substructures constructed and adapted to couple energy from a beam of charged particles into said nano-resonating structure and to transmit the coupled energy outside said nano-resonating structure. The nano-resonant substructures may have various shapes and may include parallel rows of structures. The rows may be symmetric or asymmetric, tilted, and/or staggered.
    Type: Grant
    Filed: December 14, 2005
    Date of Patent: April 22, 2008
    Assignee: Virgin Islands Microsystems, Inc.
    Inventors: Jonathan Gorrell, Mark Davidson, Michael E. Maines
  • Patent number: 7358486
    Abstract: A method, system, and mixture for simultaneously cleaning and reconditioning at least a part of a sampling pathway of an inline automated mass spectrometry system are disclosed. A sampling pathway including a probe or a nebulizer, in one example, may be simultaneously reconditioned and cleaned by mixing an isotopically enriched species and/or natural abundant species with a cleaning solution, and then cleaning the sampling pathway with the spiked cleaning solution through various means and procedures.
    Type: Grant
    Filed: December 30, 2005
    Date of Patent: April 15, 2008
    Assignee: Metara, Inc.
    Inventor: Ye Han
  • Patent number: 7358507
    Abstract: For irradiating a layer (3) a radiation beam (7) is directed and focused to a spot (11) on the layer (3), relative movement of the layer (3) relative to the optical element (59) is caused so that, successively, different portions of the layer (3) are irradiated and an interspace (53) between a surface of the optical element (59) nearest to the layer (3) is maintained. Furthermore, at least a portion of the interspace (53) through which the radiation irradiates the spot (11) on the layer (3) is maintained filled with a liquid (91). By directing a gas flow (71-73) to a surface zone (74) of the layer (3), liquid (91) is reliably prevented from passing that surface zone (74), without causing damage to the layer (3). The liquid (91) is drawn away from the layer (3) in the vicinity of the surface zone (74).
    Type: Grant
    Filed: November 14, 2003
    Date of Patent: April 15, 2008
    Assignee: Koninklijke Philips Electronics N.V.
    Inventor: Helmar Van Santen
  • Patent number: 7358513
    Abstract: The present invention provides for a method of producing an optical device by means of electron beam lithography and including the step of varying the characteristics of the electron beam spot during formation of the device and also an apparatus for producing diffractive optical devices and/or holographic devices by means of electron beam lithography and including an electron beam lithograph, controlling and processing means, means for varying the characteristics of the electron beam spot during formation of the device, and wherein the processing means is arranged for compiling and pre-processing data and for providing optimization and allocation control and to optical devices such as those produced thereby.
    Type: Grant
    Filed: July 16, 2002
    Date of Patent: April 15, 2008
    Assignee: Optaglio Ltd.
    Inventors: Zbynek Ryzi, Kenneth John Drinkwater, Frantisek Matejka
  • Patent number: RE40425
    Abstract: An optical interface devices (OID) routes signals entering each of its ports to all other ports. The OID passively routes the optical signals and performs no conversion of the signals into the electrical domain. In addition to signal routing, the OID also performs bi-directional amplification of the optical signals to compensate for splitting losses, coupling losses, signal variations, and to provide additional gain. As a result, the power level of a signal entering one port is the same power level at which corresponding signals exit all other ports of the OID. The OID is useful in a number of network topologies, including but not limited to bus, point-to-point, star, ring, broken ring, hub, and a tree-like topology. The OID enables signal quality to be maintained throughout the network which is especially beneficial in the transmission of Radio Frequency and other analog signals.
    Type: Grant
    Filed: October 24, 2005
    Date of Patent: July 8, 2008
    Assignee: Lockheed Martin Corporation
    Inventors: G. Allan Whittaker, Wilber A. Williams