Patents by Inventor Aaron M. Hunter
Aaron M. Hunter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11945045Abstract: A thermal processing apparatus and method in which a first laser source, for example, a CO2 emitting at 10.6 ?m is focused onto a silicon wafer as a line beam and a second laser source, for example, a GaAs laser bar emitting at 808 nm is focused onto the wafer as a larger beam surrounding the line beam. The two beams are scanned in synchronism in the direction of the narrow dimension of the line beam to create a narrow heating pulse from the line beam when activated by the larger beam. The energy of GaAs radiation is greater than the silicon bandgap energy and creates free carriers. The energy of the CO2 radiation is less than the silicon bandgap energy so silicon is otherwise transparent to it, but the long wavelength radiation is absorbed by the free carriers.Type: GrantFiled: November 5, 2020Date of Patent: April 2, 2024Assignee: Applied Materials, Inc.Inventors: Dean Jennings, Haifan Liang, Mark Yam, Vijay Parihar, Abhilash J. Mayur, Aaron Muir Hunter, Bruce E. Adams, Joseph M. Ranish
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Patent number: 11942381Abstract: Embodiments of the present invention provide apparatus and method for reducing non uniformity during thermal processing. One embodiment provides an apparatus for processing a substrate comprising a chamber body defining a processing volume, a substrate support disposed in the processing volume, wherein the substrate support is configured to rotate the substrate, a sensor assembly configured to measure temperature of the substrate at a plurality of locations, and one or more pulse heating elements configured to provide pulsed energy towards the processing volume.Type: GrantFiled: August 10, 2020Date of Patent: March 26, 2024Assignee: Applied Materials, Inc.Inventors: Wolfgang R. Aderhold, Aaron Muir Hunter, Joseph M. Ranish
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Patent number: 9564349Abstract: Methods and apparatus for rapid thermal processing of a planar substrate including axially aligning the substrate with a substrate support or with an empirically determined position are described. The methods and apparatus include a sensor system that determines the relative orientations of the substrate and the substrate support.Type: GrantFiled: October 19, 2012Date of Patent: February 7, 2017Assignee: Applied Materials, Inc.Inventors: Khurshed Sorabji, Joseph M. Ranish, Wolfgang Aderhold, Aaron M. Hunter, Blake R. Koelmel, Alexander N. Lerner, Nir Merry
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Patent number: 9449858Abstract: The present invention generally relates to methods and apparatus for processing substrates. Embodiments of the invention include apparatuses for processing a substrate comprising a ceramic reflector plate, which may be optically transparent. The reflector plate may include a reflective coating and be part of a reflector plate assembly in which the reflector plate is assembled to a baseplate.Type: GrantFiled: July 18, 2011Date of Patent: September 20, 2016Assignee: Applied Materials, Inc.Inventors: Blake R. Koelmel, Aaron M. Hunter, Alexander N. Lerner
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Patent number: 9390950Abstract: Methods and apparatus for rapid thermal processing of a planar substrate including axially aligning the substrate with a substrate support or with an empirically determined position are described. The methods and apparatus include a sensor system that determines the relative orientations of the substrate and the substrate support.Type: GrantFiled: October 31, 2014Date of Patent: July 12, 2016Assignee: Applied Materials, Inc.Inventors: Khurshed Sorabji, Joseph M. Ranish, Wolfgang Aderhold, Aaron M. Hunter, Blake R. Koelmel, Alexander N. Lerner, Nir Merry
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Publication number: 20150050118Abstract: Methods and apparatus for rapid thermal processing of a planar substrate including axially aligning the substrate with a substrate support or with an empirically determined position are described. The methods and apparatus include a sensor system that determines the relative orientations of the substrate and the substrate support.Type: ApplicationFiled: October 31, 2014Publication date: February 19, 2015Inventors: Khurshed Sorabji, Joseph M. Ranish, Wolfgang Aderhold, Aaron M. Hunter, Blake R. Koelmel, Alexander N. Lerner, Nir Merry
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Patent number: 8900889Abstract: Methods and apparatus for rapid thermal processing of a planar substrate including axially aligning the substrate with a substrate support or with an empirically determined position are described. The methods and apparatus include a sensor system that determines the relative orientations of the substrate and the substrate support.Type: GrantFiled: October 19, 2012Date of Patent: December 2, 2014Assignee: Applied Materials, Inc.Inventors: Khurshed Sorabji, Joseph M. Ranish, Wolfgang Aderhold, Aaron M. Hunter, Blake R. Koelmel, Alexander N. Lerner, Nir Merry
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Publication number: 20130043632Abstract: Methods and apparatus for rapid thermal processing of a planar substrate including axially aligning the substrate with a substrate support or with an empirically determined position are described. The methods and apparatus include a sensor system that determines the relative orientations of the substrate and the substrate support.Type: ApplicationFiled: October 19, 2012Publication date: February 21, 2013Inventors: Khurshed Sorabji, Joseph M. Ranish, Wolfgang Aderhold, Aaron M. Hunter, Blake R. Koelmel, Alexander N. Lemer, Nir Merry
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Publication number: 20130043235Abstract: Methods and apparatus for rapid thermal processing of a planar substrate including axially aligning the substrate with a substrate support or with an empirically determined position are described. The methods and apparatus include a sensor system that determines the relative orientations of the substrate and the substrate support.Type: ApplicationFiled: October 19, 2012Publication date: February 21, 2013Inventors: Khurshed Sorabji, Joseph M. Ranish, Wolfgang Aderhold, Aaron M. Hunter, Blake R. Koelmel, Alexander N. Lerner, Nir Merry
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Patent number: 8367983Abstract: Methods and apparatus for processing substrates and measuring the temperature using radiation pyrometry are disclosed. A reflective layer is provided on a window of a processing chamber. A radiation source providing radiation in a first range of wavelengths heats the substrate, the substrate being transparent to radiation in a second range of wavelengths within the first range of wavelengths for a predetermined temperature range. Radiation within the second range of wavelength is reflected by the reflective layer.Type: GrantFiled: June 12, 2009Date of Patent: February 5, 2013Assignee: Applied Materials, Inc.Inventors: Joseph M. Ranish, Aaron M. Hunter, Blake R. Koelmel, Bruce E. Adams
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Patent number: 8314371Abstract: Methods and apparatus for rapid thermal processing of a planar substrate including axially aligning the substrate with a substrate support or with an empirically determined position are described. The methods and apparatus include a sensor system that determines the relative orientations of the substrate and the substrate support.Type: GrantFiled: November 4, 2009Date of Patent: November 20, 2012Assignee: Applied Materials, Inc.Inventors: Khurshed Sorabji, Joseph M. Ranish, Wolfgang Aderhold, Aaron M. Hunter, Blake R. Koelmel, Alexander N. Lerner, Nir Merry
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Patent number: 8283607Abstract: Methods and apparatus for processing substrates and measuring the temperature using radiation pyrometry are disclosed. A reflective layer is provided on a window of a processing chamber. A radiation source providing radiation in a first range of wavelengths heats the substrate, the substrate being transparent to radiation in a second range of wavelengths within the first range of wavelengths for a predetermined temperature range. Radiation within the second range of wavelength is reflected by the reflective layer.Type: GrantFiled: April 9, 2008Date of Patent: October 9, 2012Assignee: Applied Materials, Inc.Inventors: Joseph M. Ranish, Aaron M. Hunter, Blake R. Koelmel
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Patent number: 8254767Abstract: Embodiments of the invention are directed to methods and apparatus for rapid thermal processing of a substrate over an extended temperature range, including low temperatures. Systems and methods for using an extended temperature pyrometry system employing a transmitted radiation detector system are disclosed. Systems combining transmitted radiation detector systems and emitted radiation detector systems are also described.Type: GrantFiled: August 26, 2009Date of Patent: August 28, 2012Assignee: Applied Materials, Inc.Inventors: Aaron M. Hunter, Jiping Li, Rajesh S. Ramanujam, Thomas Haw
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Publication number: 20120070136Abstract: The present invention generally relates to methods and apparatus for processing substrates. Embodiments of the invention include apparatuses for processing a substrate comprising a ceramic reflector plate, which may be optically transparent. The reflector plate may include a reflective coating and be part of a reflector plate assembly in which the reflector plate is assembled to a baseplate.Type: ApplicationFiled: July 18, 2011Publication date: March 22, 2012Applicant: Applied Materials, Inc.Inventors: Blake R. Koelmel, Aaron M. Hunter, Alexander N. Lerner
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Patent number: 8109669Abstract: Methods and systems for determining a radial differential metrology profile of a substrate heated in a process chamber is provided. Methods and systems for determining an angular or azimuthal differential metrology profile of a rotating substrate in a processing chamber are also provided. The radial and azimuthal differential metrology profiles are applied to adjust a reference metrology profile to provide a Virtual metrology of the process chamber. The virtual metrology is applied to control the performance of the process chamber.Type: GrantFiled: November 19, 2008Date of Patent: February 7, 2012Assignee: Applied Materials, Inc.Inventors: Wolfgang Aderhold, Jallepally Ravi, Balasubramanian Ramachandran, Aaron M. Hunter, Ilias Iliopoulos
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Publication number: 20110065276Abstract: Apparatus and methods for the manufacture of semiconductor devices suitable for narrow pitch applications and methods of fabrication thereof are described herein. Disclosed are various single chambers configured to form and/or shape a material layer by oxidizing a surface of a material layer to form an oxide layer; removing at least some of the oxide layer by an etching process; and cyclically repeating the oxidizing and removing processes until the material layer is formed to a desired shape. In some embodiments, the material layer may be a floating gate of a semiconductor device.Type: ApplicationFiled: March 10, 2010Publication date: March 17, 2011Applicant: Applied Materials, Inc.Inventors: Udayan Ganguly, Joseph M. Ranish, Aaron M. Hunter, Jing Tang, Christopher S. Olsen, Matthew D. Scotney-Castle, Vicky Nguyen, Swaminathan Srinivasan, Wei Liu, Johanes F. Swenberg, Shiyu Sun
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Publication number: 20110061810Abstract: Apparatus and methods for the manufacture of semiconductor devices suitable for narrow pitch applications and methods of fabrication thereof are described herein. Disclosed are various single chambers configured to form and/or shape a material layer by oxidizing a surface of a material layer to form an oxide layer; removing at least some of the oxide layer by an etching process; and cyclically repeating the oxidizing and removing processes until the material layer is formed to a desired shape. In some embodiments, the material layer may be a floating gate of a semiconductor device.Type: ApplicationFiled: March 10, 2010Publication date: March 17, 2011Applicant: Applied Materials, Inc.Inventors: Udayan Ganguly, Joseph M. Ranish, Aaron M. Hunter, Jing Tang, Christopher S. Olsen, Matthew D. Scotney-Castle, Vicky Nguyen, Swaminathan Srinivasan, Johanes F. Swenberg, Anchuan Wang, Nitin K. Ingle, Manish Hemkar, Jose A. Marin
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Publication number: 20100124249Abstract: Methods and systems for determining a radial differential metrology profile of a substrate heated in a process chamber is provided. Methods and systems for determining an angular or azimuthal differential metrology profile of a rotating substrate in a processing chamber are also provided. The radial and azimuthal differential metrology profiles are applied to adjust a reference metrology profile to provide a Virtual metrology of the process chamber. The virtual metrology is applied to control the performance of the process chamber.Type: ApplicationFiled: November 19, 2008Publication date: May 20, 2010Applicant: Applied Materials, Inc.Inventors: WOLFGANG ADERHOLD, Ravi Jallepally, Balasubramanian Ramachandran, Aaron M. Hunter, Ilias Iliopoulos
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Patent number: 7717617Abstract: A thermal processing system includes a source of laser radiation emitting at a laser wavelength, beam projection optics disposed between the reflective surface and a substrate support capable of holding a substrate to be processed, a pyrometer responsive to a pyrometer wavelength, and a wavelength responsive optical element having a first optical path for light in a first wavelength range including the laser wavelength, the first optical path being between the source of laser radiation and the beam projection optics, and a second optical path for light in a second wavelength range including the pyrometer wavelength, the second optical path being between the beam projection optics and the pyrometer. The system can further include a pyrometer wavelength blocking filter between the source of laser radiation and the wavelength responsive optical element.Type: GrantFiled: September 12, 2008Date of Patent: May 18, 2010Assignee: Applied Materials, Inc.Inventors: Bruce E. Adams, Dean Jennings, Aaron M. Hunter, Abhilash J. Mayur, Vijay Parihar, Timothy N. Thomas
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Publication number: 20100054720Abstract: Embodiments of the invention are directed to methods and apparatus for rapid thermal processing of a substrate over an extended temperature range, including low temperatures. Systems and methods for using an extended temperature pyrometry system employing a transmitted radiation detector system are disclosed. Systems combining transmitted radiation detector systems and emitted radiation detector systems are also described.Type: ApplicationFiled: August 26, 2009Publication date: March 4, 2010Applicant: Applied Materials, Inc.Inventors: Aaron M. Hunter, Jiping Li, Rajesh S. Ramanujam, Thomas Haw