Abstract: A garment for enhancing neuroarthromyofascial performance in an individual includes fabric tension lines positioned within the garment in order to align with certain muscle groups of the individual wearing the garment. The fabric tension lines have an elasticity that imparts a force from one end of the fabric tension line to the other. This force transfers to the garment as a whole, and subsequently to the individual. The force pulls one or more joints of the individual into an abnormal alignment, causing a neurological cue in the individual to recruit targeted muscles that restore the proper alignment of the joint. The strength and performance of the targeted muscles is thereby improved. The garment may additionally have compressive properties that have a therapeutic effect on the individual. Methods for making the garment and for using the garment in a physical therapy environment are also disclosed.

Abstract: Various embodiments of the present invention relate to bi-directional communication between an Integrated Circuit (IC) layout editor and various generic layout and/or pattern data viewers. Further, the present invention provides a bi-directional control between the IC layout editor and the various generic layout and/or pattern data viewers and allows substantially simultaneous display of an IC design in various IC mask layout data formats. The IC layout editor and the various generic layout and/or pattern data viewers include various tools. The bi-directional communication connects these tools to form connected tools. Subsequently, the actions performed by a connected tool in response to user interactions are synchronized with the actions performed by other connected tools.

Abstract: Double patterning is achieved with a single reticle while maintaining the integrity of in-scribe patterns and without blading the reticle. In-scribe structures may or may not be double patterning. For example, elements such as electrical test structures might have features that are so closely spaced that double pattering is desired. However, elements such as optical alignment marks might not require double patterning. For those elements for which double patterning is not desired, a first sub-array of the reticle has a pattern for the element, whereas the corresponding location in a second sub-array has a blank. By the corresponding location, it is meant the location on the reticle that would be exposed to the same target region to which the element would be exposed if the reticle were used for double patterning. Thus, the blank prevents target region from being exposed more than once.

Abstract: Double patterning is achieved with a single reticle while maintaining the integrity of in-scribe patterns and without blading the reticle. In-scribe structures may or may not be double patterning. For example, elements such as electrical test structures might have features that are so closely spaced that double pattering is desired. However, elements such as optical alignment marks might not require double patterning. For those elements for which double patterning is not desired, a first sub-array of the reticle has a pattern for the element, whereas the corresponding location in a second sub-array has a blank. By the corresponding location, it is meant the location on the reticle that would be exposed to the same target region to which the element would be exposed if the reticle were used for double patterning. Thus, the blank prevents target region from being exposed more than once.