Patents by Inventor Abbas Torabi

Abbas Torabi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11545566
    Abstract: A High Electron Mobility Transistor structure having: a GaN buffer layer disposed on the substrate; a doped GaN layer disposed on, and in direct contact with, the buffer layer, such doped GaN layer being doped with more than one different dopants; an unintentionally doped (UID) GaN channel layer on, and in direct contact with, the doped GaN layer, such UID GaN channel layer having a 2DEG channel therein; a barrier layer on, and in direct contact with, the UID GaN channel layer. One of the dopants is beryllium and another one of the dopants is carbon.
    Type: Grant
    Filed: December 26, 2019
    Date of Patent: January 3, 2023
    Assignee: Raytheon Company
    Inventors: Abbas Torabi, Brian D. Schultz, John Logan
  • Publication number: 20210202729
    Abstract: A High Electron Mobility Transistor structure having: a GaN buffer layer disposed on the substrate; a doped GaN layer disposed on, and in direct contact with, the buffer layer, such doped GaN layer being doped with more than one different dopants; an unintentionally doped (UID) GaN channel layer on, and in direct contact with, the doped GaN layer, such UID GaN channel layer having a 2DEG channel therein; a barrier layer on, and in direct contact with, the UID GaN channel layer. One of the dopants is beryllium and another one of the dopants is carbon.
    Type: Application
    Filed: December 26, 2019
    Publication date: July 1, 2021
    Applicant: Raytheon Company
    Inventors: Abbas Torabi, Brian D. Schultz, John Logan
  • Patent number: 9419125
    Abstract: A semiconductor structure having a Group III-N buffer layer and a Group III-N barrier layer in direct contact to form a junction between the Group III-V buffer layer the Group III-N barrier layer producing a two dimensional electron gas (2DEG) channel, the Group III-N barrier layer having a varying dopant concentration. The lower region of the Group III-N barrier layer closest to the junction is void of intentionally introduced dopant and a region above the lower region having intentionally introduced, predetermined dopant with a predetermined doping concentration above 1×1017 atoms per cm3.
    Type: Grant
    Filed: June 16, 2015
    Date of Patent: August 16, 2016
    Assignee: RAYTHEON COMPANY
    Inventors: Brian D. Schultz, Abbas Torabi, Eduardo M. Chumbes, Shahed Reza, William E. Hoke
  • Patent number: 8895925
    Abstract: A detector structure having a sensor for detecting energy impinging on the structure in the infrared and/or optical frequency band; an electronics section disposed behind the sensor for processing electrical signal produced by the sensor in response to the sensor detecting the infrared and/or optical energy; and an electrically conductive layer for inhibiting electromagnetic energy outside of the visible and infrared portions of the spectrum, such electrically conductive layer being disposed between impinging energy and the electronics section, such layer having a transmissivity greater than 90 percent in the visible and infrared portions of the spectrum and being reflective and/or dissipative to portions of the impinging energy outside of the visible and infrared portions of the spectrum. In one embodiment an electrically conductive layer having a substantially constant absorptivity to electromagnetic energy within the visible and infrared portions of the spectrum. In one embodiment, the layer is graphene.
    Type: Grant
    Filed: February 24, 2012
    Date of Patent: November 25, 2014
    Assignee: Raytheon Company
    Inventor: Abbas Torabi
  • Publication number: 20130320356
    Abstract: A semiconductor structure having: a doped silicon carbide heat spreader; a semi-insulating silicon carbide layer disposed over the doped silicon carbide heat spreader; and a nitride (such as GaN, Indium nitride, Aluminum nitride) semiconductor layer disposed on the semi-insulating silicon carbide layer.
    Type: Application
    Filed: June 1, 2012
    Publication date: December 5, 2013
    Applicant: Raytheon Company
    Inventors: Abbas Torabi, Alan Bielunis, Todd Southard
  • Publication number: 20130221219
    Abstract: A detector structure having a sensor for detecting energy impinging on the structure in the infrared and/or optical frequency band; an electronics section disposed behind the sensor for processing electrical signal produced by the sensor in response to the sensor detecting the infrared and/or optical energy; and an electrically conductive layer for inhibiting electromagnetic energy outside of the visible and infrared portions of the spectrum, such electrically conductive layer being disposed between impinging energy and the electronics section, such layer having a transmissivity greater than 90 percent in the visible and infrared portions of the spectrum and being reflective and/or dissipative to portions of the impinging energy outside of the visible and infrared portions of the spectrum. In one embodiment an electrically conductive layer having a substantially constant absorptivity to electromagnetic energy within the visible and infrared portions of the spectrum. In one embodiment, the layer is graphene.
    Type: Application
    Filed: February 24, 2012
    Publication date: August 29, 2013
    Applicant: Raytheon Company
    Inventor: Abbas Torabi