Patents by Inventor Abdullah Alikhan
Abdullah Alikhan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230384694Abstract: Systems, apparatuses, and methods are provided for manufacturing a substrate table. An example method can include forming a vacuum sheet including a plurality of vacuum connections and a plurality of recesses configured to receive a plurality of burls disposed on a core body for supporting an object such as a wafer. Optionally, at least one burl can be surrounded, partially or wholly, by a trench. The example method can further include using the vacuum sheet to mount the core body to an electrostatic sheet including a plurality of apertures configured to receive the plurality of burls. Optionally, the example method can include using the vacuum sheet to mount the core body to the electrostatic sheet such that the plurality of recesses of the vacuum sheet line up with the plurality of burls of the core body and the plurality of apertures of the electrostatic sheet.Type: ApplicationFiled: December 2, 2021Publication date: November 30, 2023Applicant: ASML Netherlands B.V.Inventors: Abdullah ALIKHAN, Tammo UITTERDIJK, Johannes Bernardus Charles ENGELEN, Daniel KAMIENIECKI, Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN, Thomas POIESZ, Leon Martin LEVASIER, Jim Vincent OVERKAMP, Johannes Adrianus Cornelis Maria PIJNENBURG, Koos VAN BERKEL, Gregory James DIGUIDO, Anthony C. SOCCI, JR., Iliya SIGAL, Bram Antonius Gerardus LOMANS, Michel Ben Isel HABETS
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Patent number: 9977351Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: GrantFiled: July 13, 2017Date of Patent: May 22, 2018Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
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Publication number: 20170307986Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: ApplicationFiled: July 13, 2017Publication date: October 26, 2017Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William EBERT, Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
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Patent number: 9766557Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: GrantFiled: February 21, 2017Date of Patent: September 19, 2017Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
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Publication number: 20170160652Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: ApplicationFiled: February 21, 2017Publication date: June 8, 2017Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William EBERT, Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
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Patent number: 9632434Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.Type: GrantFiled: April 29, 2015Date of Patent: April 25, 2017Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Jr., Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame, Thomas Venturino
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Patent number: 9632433Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.Type: GrantFiled: October 21, 2013Date of Patent: April 25, 2017Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Jr., Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
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Publication number: 20150301456Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.Type: ApplicationFiled: October 21, 2013Publication date: October 22, 2015Applicants: ASML Holding N.V., ASML Neherlands B.V.Inventors: Earl William EBERT, JR., Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
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Publication number: 20150241796Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.Type: ApplicationFiled: April 29, 2015Publication date: August 27, 2015Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William EBERT, JR., Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME, Thomas VENTURINO
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Patent number: 8446570Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: GrantFiled: September 15, 2010Date of Patent: May 21, 2013Assignee: ASML Holding N.V.Inventors: Santiago Del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olsen, Jonathan H. Feroce
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Publication number: 20130010277Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: ApplicationFiled: September 14, 2012Publication date: January 10, 2013Applicant: ASML Holding N.V.Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olsen, Jonathan H. Feroce
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Publication number: 20110001955Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: ApplicationFiled: September 15, 2010Publication date: January 6, 2011Applicant: ASML Holding N.V.Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olson, Jonathan H. Feroce
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Patent number: 7830497Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: GrantFiled: April 18, 2007Date of Patent: November 9, 2010Assignee: ASML Holding N.V.Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olsen, Jonathan H. Feroce
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Patent number: 7304720Abstract: A system and method are used to protect a mask from being contaminated by airborne particles. They include coupling a reticle and a cover to protect the reticle. The cover includes a frame and a movable panel that moves to allow direct access of light to the reticle during an exposure process. The reticle and cover are moved to a stage using a robot gripper. The reticle and cover may be coupled to a baseplate before being moved. Corresponding alignment devices are coupled to the frame and the panel, the gripper and the panel, and the baseplate and the panel. The stage and the frame can have corresponding attachment devices. A pre-alignment device can be used to align the reticle before transporting it to a stage. The pre-alignment device and the frame can have corresponding alignment devices that can be used to perform the pre-alignment. Predetermined areas of the reticle can be hardened or shaped, such that less particles are produced during contact with the reticle.Type: GrantFiled: February 20, 2003Date of Patent: December 4, 2007Assignee: ASML Holding N.V.Inventors: Santiago del Puerto, Eric R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olson, Jonathan H. Feroce
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Publication number: 20070258061Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: ApplicationFiled: April 18, 2007Publication date: November 8, 2007Applicant: ASML Holding N.V.Inventors: Santiago Puerto, Erik Loopstra, Andrew Massar, Duane Kish, Abdullah Alikhan, Woodrow Olson, Jonathan Feroce
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Patent number: 7209220Abstract: A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: GrantFiled: December 13, 2005Date of Patent: April 24, 2007Assignee: ASML Holding N.V.Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olson, Jonathan H. Feroce
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Publication number: 20060087639Abstract: A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: ApplicationFiled: December 13, 2005Publication date: April 27, 2006Applicant: ASML Holding N.V.Inventors: Santiago Puerto, Erik Loopstra, Andrew Massar, Duane Kish, Abdullah Alikhan, Woodrow Olson, Jonathan Feroce
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Patent number: 6906783Abstract: A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: GrantFiled: February 20, 2003Date of Patent: June 14, 2005Assignee: ASML Holding N.V.Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olson, Jonathan H. Feroce
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Publication number: 20030227605Abstract: A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: ApplicationFiled: February 20, 2003Publication date: December 11, 2003Applicant: ASML Netherlands B.V.Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olson, Jonathan H. Feroce
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Publication number: 20030218728Abstract: A system and method are used to protect a mask from being contaminated by airborne particles. They include coupling a reticle and a cover to protect the reticle. The cover includes a frame and a movable panel that moves to allow direct access of light to the reticle during an exposure process. The reticle and cover are moved to a stage using a robot gripper. The reticle and cover may be coupled to a baseplate before being moved. Corresponding alignment devices are coupled to the frame and the panel, the gripper and the panel, and the baseplate and the panel. The stage and the frame can have corresponding attachment devices. A pre-alignment device can be used to align the reticle before transporting it to a stage. The pre-alignment device and the frame can have corresponding alignment devices that can be used to perform the pre-alignment. Predetermined areas of the reticle can be hardened or shaped, such that less particles are produced during contact with the reticle.Type: ApplicationFiled: February 20, 2003Publication date: November 27, 2003Applicant: ASML Netherlands B.V.Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olson, Jonathan H. Feroce