Patents by Inventor Abhishek Chowdhury
Abhishek Chowdhury has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11940819Abstract: Embodiments of fast gas exchange (FGE) manifolds are provided herein. In some embodiments, a FGE manifold includes: a manifold housing having a plurality of inlets and a plurality of outlets for flowing a plurality of process gases therethrough, wherein the plurality of outlets correspond with a plurality of zones in the process chamber; a plurality of hybrid valves disposed in the manifold housing and fluidly coupled to the plurality of inlets; a plurality of mass flow controllers disposed in the manifold housing downstream of the plurality of hybrid valves; a plurality of mixing lines extending downstream from the plurality of mass flow controllers to a plurality of outlet lines; and a plurality of outlet valves disposed in line with corresponding ones of the plurality of outlet lines, wherein a flow path is defined between each inlet of the plurality of inlets and each outlet of the plurality of outlets.Type: GrantFiled: January 20, 2023Date of Patent: March 26, 2024Assignee: APPLIED MATERIALS, INC.Inventors: Abhishek Chowdhury, Ravikumar Patil, Arun Chakravarthy Chakravarthy, Jon Christian Farr, Saravanan Chandrabalu, Prabhuraj Kuberan
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Publication number: 20240044002Abstract: A substrate handling system includes a fixed deposition ring having a plurality of circumferentially spaced notches along an outer edge of the fixed deposition ring, the fixed deposition ring being electrically non-conductive; a moving deposition ring having a plurality of circumferentially spaced recesses formed on a lower surface of the moving deposition ring, the recesses configured to radially align with the notches of the fixed deposition ring, the moving deposition ring having an inner edge and an outer edge, the moving deposition ring being electrically non-conductive; and a plurality of electrically conductive grounding plates each having a base, an intermediate member, and a contact extending from the intermediate member and being spaced from the base, the intermediate members configured to be received in the recesses and extend between the inner edge and the outer edge of the moving deposition ring.Type: ApplicationFiled: August 4, 2022Publication date: February 8, 2024Inventors: Abhishek CHOWDHURY, Nataraj BHASKAR RAO, Edwin C. SUAREZ, Harisha SATHYANARAYANA, Diego Ramiro PUENTE SOTOMAYOR, Qanit TAKMEEL, Mohammad Kamruzzaman CHOWDHURY, Arun Chakravarthy CHAKRAVARTHY
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Patent number: 11881375Abstract: Embodiments of a lift apparatus for use in a substrate processing chamber are provided herein. In some embodiments, a lift apparatus includes: a plurality of first lift pin assemblies configured to raise or lower a substrate having a given diameter when disposed thereon, wherein each of the first lift pin assemblies includes a first lift pin disposed on a first bellows assembly; a plurality of second lift pin assemblies arranged in a circle having a diameter greater than the given diameter and configured to raise or lower an annular chamber component, wherein each of the second lift pin assemblies includes a second lift pin disposed on a second bellows assembly; an actuator; and a lift assembly coupled to the actuator and configured to raise or lower each of the first lift pin assemblies and the second lift pin assemblies by movement of the actuator.Type: GrantFiled: April 15, 2021Date of Patent: January 23, 2024Assignee: APPLIED MATERIALS, INC.Inventors: Abhishek Chowdhury, Nataraj Bhaskar Rao, Siqing Lu, Ravikumar Patil
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Patent number: 11581213Abstract: Apparatus and methods for vacuum chucking a substrate to a susceptor. The susceptor comprises one or more angularly spaced pockets are positioned around a center axis of the susceptor, the one or more angularly spaced pockets having an inner pocket and an outer pocket. The susceptor can be configured as an intermediate chuck having one or more pucks positioned within the inner pocket or as a distributed chuck having one or more pucks positioned within the outer pocket. The one or more pucks has a center hole, at least one radial channel and at least one circular channel having chuck holes for vacuum chucking a substrate.Type: GrantFiled: September 23, 2020Date of Patent: February 14, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Abhishek Chowdhury, Vijayabhaskara Venkatagiriyappa, Mihaela A. Balseanu, Jyoti Prakash Deo, Srinivas Ramakrishna, Keiichi Tanaka, Mandyam Sriram, Francis Kanyiri Mungai, Mario D. Silvetti, Sriharish Srinivasan
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Patent number: 11577946Abstract: Apparatus and methods for lifting loads are described. The load lift includes a support frame and a lift assembly with main cylinder and at least one standby cylinder connecting a rotatable cross beam with a clamp plate. A rotary actuator assembly is connected to the lift beam to move the lift assembly out of the way while not in use by rotating the lift assembly from a lift position to a standby position.Type: GrantFiled: August 8, 2020Date of Patent: February 14, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Abhishek Chowdhury, Kevin Griffin, Kenneth Brian Doering, Santhoshkumar Doddegowdanapalya Nanjundegowda, Somashekhar Kosthi, Abhijit Ghosh
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Publication number: 20220336182Abstract: Embodiments of a lift apparatus for use in a substrate processing chamber are provided herein. In some embodiments, a lift apparatus includes: a plurality of first lift pin assemblies configured to raise or lower a substrate having a given diameter when disposed thereon, wherein each of the first lift pin assemblies includes a first lift pin disposed on a first bellows assembly; a plurality of second lift pin assemblies arranged in a circle having a diameter greater than the given diameter and configured to raise or lower an annular chamber component, wherein each of the second lift pin assemblies includes a second lift pin disposed on a second bellows assembly; an actuator; and a lift assembly coupled to the actuator and configured to raise or lower each of the first lift pin assemblies and the second lift pin assemblies by movement of the actuator.Type: ApplicationFiled: April 15, 2021Publication date: October 20, 2022Inventors: Abhishek CHOWDHURY, Nataraj BHASKAR RAO, Siqing LU, Ravikumar PATIL
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Publication number: 20220285133Abstract: Methods and apparatus for processing a substrate are provided herein. For example, an apparatus for processing a substrate comprises a top delivery gas nozzle configured to direct process gas toward a substrate support surface of a substrate support and a side delivery gas nozzle configured to direct the process gas toward a side surface of the substrate support, a first gas line connected to the top delivery gas nozzle, a second gas line connected to the side delivery gas nozzle, and a plurality of valves connected to the first gas line and the second gas line for providing process gas to the processing volume of the processing chamber, and a first orifice flow restrictor or a first needle valve connected to the first gas line or a second orifice flow restrictor or a second needle valve connected to the second gas line.Type: ApplicationFiled: March 2, 2021Publication date: September 8, 2022Inventors: Abhishek Chowdhury, Jon Christian Farr, Ravikumar Patil, Eller Juco, Yi Zheng, Siqing Lu
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Publication number: 20220157635Abstract: Embodiments of process kits for use in a process chamber are provided herein. In some embodiments, a cover ring for use in a process chamber includes: an annular body that includes an upper surface and a lower surface, an inner lip extending radially inward and downward from the annular body, and a plurality of protrusions extending downward from the inner lip and disposed at regular intervals along the inner lip, wherein lowermost surfaces of the plurality of protrusions together define a planar substrate contact surface.Type: ApplicationFiled: November 18, 2020Publication date: May 19, 2022Inventors: Abhishek CHOWDHURY, Harisha SATHYANARAYANA, Edwin C. SUAREZ, Siqing LU, Nataraj BHASKAR RAO
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Publication number: 20220157572Abstract: Embodiments of process kits for use in a process chamber are provided herein. In some embodiments, a process kit for use in a process chamber includes: a deposition ring including a first portion having an first inner ledge and a second portion having a second inner ledge, wherein in a first position, the first portion is spaced from the second portion, and wherein in a second position, the second portion is configured to engage the first portion so that the first inner ledge is aligned with the second inner ledge along a common plane to form a clamping surface.Type: ApplicationFiled: November 18, 2020Publication date: May 19, 2022Inventors: Abhishek CHOWDHURY, Edwin C. SUAREZ, Harisha SATHYANARAYANA, Nataraj BHASKAR RAO, Siqing LU
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Publication number: 20220093443Abstract: Apparatus and methods for vacuum chucking a substrate to a susceptor. The susceptor comprises one or more angularly spaced pockets are positioned around a center axis of the susceptor, the one or more angularly spaced pockets having an inner pocket and an outer pocket. The susceptor can be configured as an intermediate chuck having one or more pucks positioned within the inner pocket or as a distributed chuck having one or more pucks positioned within the outer pocket. The one or more pucks has a center hole, at least one radial channel and at least one circular channel having chuck holes for vacuum chucking a substrate.Type: ApplicationFiled: September 23, 2020Publication date: March 24, 2022Applicant: Applied Materials, Inc.Inventors: Abhishek Chowdhury, Vijayabhaskara Venkatagiriyappa, Mihaela A. Balseanu, Jyoti Prakash Deo, Srinivas Ramakrishna, Keiichi Tanaka, Mandyam Sriram, Francis Kanyiri Mungai, Mario D. Silvetti, Sriharish Srinivasan
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Publication number: 20220041413Abstract: Apparatus and methods for lifting loads are described. The load lift includes a support frame and a lift assembly with main cylinder and at least one standby cylinder connecting a rotatable cross beam with a clamp plate. A rotary actuator assembly is connected to the lift beam to move the lift assembly out of the way while not in use by rotating the lift assembly from a lift position to a standby position.Type: ApplicationFiled: August 8, 2020Publication date: February 10, 2022Applicant: Applied Materials, Inc.Inventors: Abhishek Chowdhury, Kevin Griffin, Kenneth Brian Doering, Santhoshkumar Doddegowdanapalya Nanjundegowda, Somashekhar Kosthi, Abhijit Ghosh
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Publication number: 20210210312Abstract: Plasma source assemblies comprising a housing with an RF hot electrode having a body and a plurality of source electrodes extending vertically from the RF hot electrode toward the opening in a front face of the housing are described. Processing chambers incorporating the plasma source assemblies and methods of using the plasma source assemblies are also described.Type: ApplicationFiled: December 29, 2020Publication date: July 8, 2021Inventors: Anantha K. Subramani, Farzad Houshmand, Philip A. Kraus, Abhishek Chowdhury, John C. Forster, Kallol Bera
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Patent number: 10879042Abstract: Plasma source assemblies comprising a housing with an RF hot electrode having a body and a plurality of source electrodes extending vertically from the RF hot electrode toward the opening in a front face of the housing are described. Processing chambers incorporating the plasma source assemblies and methods of using the plasma source assemblies are also described.Type: GrantFiled: January 24, 2017Date of Patent: December 29, 2020Assignee: Applied Materials, Inc.Inventors: Anantha K. Subramani, Farzad Houshmand, Philip A. Kraus, Abhishek Chowdhury, John C. Forster, Kallol Bera
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Patent number: 10121655Abstract: Plasma source assemblies comprising a housing with an RF hot electrode and a return electrode are described. The housing includes a gas inlet and a front face defining a flow path. The RF hot electrode includes a first surface oriented substantially parallel to the flow path. The return electrode includes a first surface oriented substantially parallel to the flow path and spaced from the first surface of the RF hot electrode to form a gap. Processing chambers incorporating the plasma source assemblies and methods of using the plasma source assemblies are also described.Type: GrantFiled: November 16, 2016Date of Patent: November 6, 2018Assignee: APPLIED MATERIALS, INC.Inventors: Anantha K. Subramani, Kaushal Gangakhedkar, Abhishek Chowdhury, John C. Forster, Nattaworn Nuntaworanuch, Kallol Bera, Philip A. Kraus, Farzad Houshmand
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Publication number: 20170213701Abstract: Plasma source assemblies comprising a housing with an RF hot electrode having a body and a plurality of source electrodes extending vertically from the RF hot electrode toward the opening in a front face of the housing are described. Processing chambers incorporating the plasma source assemblies and methods of using the plasma source assemblies are also described.Type: ApplicationFiled: January 24, 2017Publication date: July 27, 2017Inventors: Anantha K. Subramani, Farzad Houshmand, Philip A. Kraus, Abhishek Chowdhury, John C. Forster, Kallol Bera
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Publication number: 20170148626Abstract: Plasma source assemblies comprising a housing with an RF hot electrode and a return electrode are described. The housing includes a gas inlet and a front face defining a flow path. The RF hot electrode includes a first surface oriented substantially parallel to the flow path. The return electrode includes a first surface oriented substantially parallel to the flow path and spaced from the first surface of the RF hot electrode to form a gap. Processing chambers incorporating the plasma source assemblies and methods of using the plasma source assemblies are also described.Type: ApplicationFiled: November 16, 2016Publication date: May 25, 2017Inventors: Anantha K. Subramani, Kaushal Gangakhedkar, Abhishek Chowdhury, John C. Forster, Nattaworn Nuntaworanuch, Kallol Bera, Philip A. Kraus, Farzad Houshmand
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Patent number: 9279344Abstract: A poppet element of a valve is provided. The poppet element is movable relative to a valve seat of the valve and includes a balance chamber wall defining a balance chamber with a center body partially fixed relative to the valve seat, an upper head, a balance chamber holder having a coefficient of thermal expansion (CTE) that is matched with that of the upper head and a fastening element disposed to fasten the balance chamber holder to the upper head. The balance chamber holder is disposed between the center body and the balance chamber wall and configured to prevent thermal loading transfer from the balance chamber wall to the fastening element.Type: GrantFiled: February 24, 2014Date of Patent: March 8, 2016Assignee: General Electric CompanyInventors: Abhishek Chowdhury, Guido Felice Forte, Jr., Senthil Kumar Vasudevan
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Patent number: 9279345Abstract: A steam turbomachine valve includes a valve body having an inlet portion, an outlet portion, and an interior portion. The interior portion includes an inner wall. A valve member is slidingly disposed within the interior portion of the valve body. The valve member includes an outer surface. A seal element is mounted to, and extends about, the outer surface of the valve member. The seal element is spaced from the inner wall by a gap. A seal assembly is mounted to the inner wall. The seal assembly spans the gap and is configured and disposed to contact the seal element of the valve member.Type: GrantFiled: January 17, 2014Date of Patent: March 8, 2016Assignee: General Electric CompanyInventor: Abhishek Chowdhury
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Publication number: 20150240666Abstract: A poppet element of a valve is provided. The poppet element is movable relative to a valve seat of the valve and includes a balance chamber wall defining a balance chamber with a center body partially fixed relative to the valve seat, an upper head, a balance chamber holder having a coefficient of thermal expansion (CTE) that is matched with that of the upper head and a fastening element disposed to fasten the balance chamber holder to the upper head. The balance chamber holder is disposed between the center body and the balance chamber wall and configured to prevent thermal loading transfer from the balance chamber wall to the fastening element.Type: ApplicationFiled: February 24, 2014Publication date: August 27, 2015Applicant: General Electric CompanyInventors: Abhishek Chowdhury, Guido Felice Forte, JR., Senthil Kumar Vasudevan
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Publication number: 20150204215Abstract: A steam turbomachine valve includes a valve body having an inlet portion, an outlet portion, and an interior portion. The interior portion includes an inner wall. A valve member is slidingly disposed within the interior portion of the valve body. The valve member includes an outer surface. A seal element is mounted to, and extends about, the outer surface of the valve member. The seal element is spaced from the inner wall by a gap. A seal assembly is mounted to the inner wall. The seal assembly spans the gap and is configured and disposed to contact the seal element of the valve member.Type: ApplicationFiled: January 17, 2014Publication date: July 23, 2015Applicant: General Electric CompanyInventor: Abhishek Chowdhury